公开(公告)号：US09226380B2

公开(公告)日：2015-12-29

申请号：US13666668

申请日：2012-11-01

申请人： Kenneth W. Finley

发明人： Kenneth W. Finley

IPC分类号： H05B39/00 ,  H05H1/48 ,  G05F1/46 ,  H01J37/34 ,  H05H1/46 ,  H02H9/04

CPC分类号： G05F1/46 ,  H01J37/3405 ,  H01J37/3444 ,  H02H3/087 ,  H02H9/042 ,  H05H1/46 ,  H05H1/48 ,  H05H2001/4682

摘要： This disclosure describes a non-dissipative snubber circuit configured to boost a voltage applied to a load after the load's impedance rises rapidly. The voltage boost can thereby cause more rapid current ramping after a decrease in power delivery to the load which results from the load impedance rise. In particular, the snubber can comprise a combination of a unidirectional switch, a voltage multiplier, and a current limiter. In some cases, these components can be a diode, voltage doubler, and an inductor, respectively.

摘要翻译： 本公开描述了一种非耗散缓冲电路，其被配置为在负载的阻抗快速上升之后升高施加到负载的电压。 因此，由于负载阻抗上升而导致负载的功率递减降低后，电压提升可以引起更快速的电流斜坡。 特别地，缓冲器可以包括单向开关，电压倍增器和限流器的组合。 在某些情况下，这些组件可分别是二极管，倍压器和电感。

公开(公告)号：US20150315697A1

公开(公告)日：2015-11-05

申请号：US14800198

申请日：2015-07-15

申请人： Roman Chistyakov ,  Bassam Hanna Abraham

发明人： Roman Chistyakov ,  Bassam Hanna Abraham

IPC分类号： C23C14/34 ,  C23C14/35

CPC分类号： C23C14/3414 ,  C23C14/3485 ,  C23C14/35 ,  C23C14/564 ,  H01J37/32009 ,  H01J37/32018 ,  H01J37/3408 ,  H01J37/3444 ,  H01J2237/0206

摘要： A plasma generator includes a chamber for confining a feed gas. An anode is positioned inside the chamber. A cathode assembly is positioned adjacent to the anode inside the chamber. A pulsed power supply comprising at least two solid state switches and having an output that is electrically connected between the anode and the cathode assembly generates voltage micropulses. A pulse width and a duty cycle of the voltage micropulses are generated using a voltage waveform comprising voltage oscillation having amplitudes and frequencies that generate a strongly ionized plasma.

摘要翻译： 等离子体发生器包括用于限制进料气体的室。 阳极位于室内。 阴极组件邻近室内的阳极定位。 包括至少两个固态开关并具有电连接在阳极和阴极组件之间的输出的脉冲电源产生电压微脉冲。 使用包括产生强电离等离子体的振幅和频率的电压振荡的电压波形来产生电压微脉冲的脉冲宽度和占空比。

公开(公告)号：US09123508B2

公开(公告)日：2015-09-01

申请号：US13010762

申请日：2011-01-20

申请人： Roman Chistyakov ,  Bassam Hanna Abraham

发明人： Roman Chistyakov ,  Bassam Hanna Abraham

IPC分类号： H05H1/24 ,  H05H1/46 ,  H01J7/24 ,  H01J37/32 ,  H01J37/34

CPC分类号： C23C14/3414 ,  C23C14/3485 ,  C23C14/35 ,  C23C14/564 ,  H01J37/32009 ,  H01J37/32018 ,  H01J37/3408 ,  H01J37/3444 ,  H01J2237/0206

摘要： A plasma generator includes a chamber for confining a feed gas. An anode is positioned inside the chamber. A cathode assembly is positioned adjacent to the anode inside the chamber. A pulsed power supply comprising at least two solid state switches and having an output that is electrically connected between the anode and the cathode assembly generates voltage micropulses. A pulse width and a duty cycle of the voltage micropulses are generated using a voltage waveform comprising voltage oscillation having amplitudes and frequencies that generate a strongly ionized plasma.

摘要翻译： 等离子体发生器包括用于限制进料气体的室。 阳极位于室内。 阴极组件邻近室内的阳极定位。 包括至少两个固态开关并具有电连接在阳极和阴极组件之间的输出的脉冲电源产生电压微脉冲。 使用包括产生强电离等离子体的振幅和频率的电压振荡的电压波形来产生电压微脉冲的脉冲宽度和占空比。

公开(公告)号：US09111732B2

公开(公告)日：2015-08-18

申请号：US12197902

申请日：2008-08-25

申请人： Takamichi Fujii ,  Takayuki Naono

发明人： Takamichi Fujii ,  Takayuki Naono

IPC分类号： C23C14/00 ,  H01J37/34 ,  B41J2/16 ,  C23C14/08 ,  H01L41/316

CPC分类号： H01J37/34 ,  B41J2/161 ,  B41J2/1646 ,  C23C14/088 ,  H01J37/3444 ,  H01L41/316

摘要： The sputtering apparatus includes a vacuum vessel, a sputter electrode placed within the vacuum vessel to hold a target material to be sputtered, a radio frequency power source for applying radio frequency waves to the electrode, a substrate holder which is spaced from the electrode and on which a substrate is held, a thin film being to be deposited on the substrate from components of the target material, and an impedance adjusting circuit for adjusting a first impedance of the substrate holder. The impedance adjusting circuit has a first end directly set at a ground potential and has an impedance circuit which is adjustable for adjusting the first impedance, a second impedance of the impedance circuit is adjusted to thereby adjust the first impedance and, hence, a potential of the substrate.

摘要翻译： 溅射装置包括真空容器，放置在真空容器内的溅射电极以保持待溅射的靶材料，用于向电极施加射频波的射频电源，与电极间隔开的衬底保持器 保持基板，从目标材料的部件沉积在基板上的薄膜，以及用于调整基板保持器的第一阻抗的阻抗调节电路。 阻抗调整电路具有直接设定在接地电位的第一端，并且具有可调节的阻抗电路以调整第一阻抗，调整阻抗电路的第二阻抗，从而调整第一阻抗，因此调整第一阻抗 底物。

公开(公告)号：US09103026B1

公开(公告)日：2015-08-11

申请号：US13277441

申请日：2011-10-20

申请人： Randy Dorn ,  Jason Cheng ,  Hyung Paek

发明人： Randy Dorn ,  Jason Cheng ,  Hyung Paek

IPC分类号： C23C14/34 ,  C23C14/35 ,  H01J37/34

CPC分类号： C23C14/35 ,  H01J37/3405 ,  H01J37/3444 ,  H01J37/3458

摘要： A magnetron sputtering system comprising a vacuum processing chamber having a chamber shield, a magnetron assembly, and a substrate, the magnetron assembly comprising a permanent magnetic assembly and an electromagnetic coil assembly, a first impedance circuit coupled between a power supply and the electromagnetic coil assembly, the first impedance circuit comprising a first resistor and a first capacitor, and a second impedance circuit having a second resistor and a second capacitor, and coupled between the substrate and a susceptor.

摘要翻译： 一种磁控溅射系统，包括具有室屏蔽，磁控管组件和基板的真空处理室，所述磁控管组件包括永久磁组件和电磁线圈组件，第一阻抗电路耦合在电源和电磁线圈组件之间 所述第一阻抗电路包括第一电阻器和第一电容器，以及具有第二电阻器和第二电容器的第二阻抗电路，并且耦合在所述基板和基座之间。

公开(公告)号：US09068259B2

公开(公告)日：2015-06-30

申请号：US13148154

申请日：2010-02-15

申请人： Yoshio Yanagiya

发明人： Yoshio Yanagiya

IPC分类号： C23C14/34 ,  H01J37/34 ,  H02M1/34 ,  H02M7/5387

CPC分类号： C23C14/3464 ,  C23C14/3485 ,  H01J37/34 ,  H01J37/3444 ,  H01J37/3467 ,  H02M1/34 ,  H02M7/53871 ,  H02M2001/344

摘要： There is provided an AC power supply for a sputtering apparatus in which the AC power supply can prevent the induction of an arc discharge by suppressing an overvoltage to be generated when the polarity of each electrode is reversed. A bridge circuit made up of a plurality of switching transistors SW1-SW4 is disposed between positive and negative DC current output lines from a DC electric power supply source. An inductor DCL which makes a DC output to have a constant-current characteristic is disposed in at least one of the positive and the negative DC output lines from the DC electric power supply source to the bridge circuit, and a snubber circuit is disposed in parallel with inputs of the bridge circuit.

摘要翻译： 提供一种用于溅射装置的交流电源，其中交流电源可以通过抑制当每个电极的极性反转时产生的过电压来防止电弧放电的感应。 由多个开关晶体管SW1-SW4构成的桥接电路配置在直流电源的正，负直流电流输出线之间。 使直流输出具有恒定电流特性的电感器DCL配置在从直流电源到桥接电路的正极和负极直流输出线中的至少一个中，缓冲电路并联设置 与桥接电路的输入。

公开(公告)号：US09017535B2

公开(公告)日：2015-04-28

申请号：US12727316

申请日：2010-03-19

申请人： Yoshinori Nagamine ,  Kanto Nakamura ,  Koji Tsunekawa

发明人： Yoshinori Nagamine ,  Kanto Nakamura ,  Koji Tsunekawa

IPC分类号： C23C14/00 ,  C25B9/00 ,  C25B11/00 ,  C25B13/00 ,  C23C16/00 ,  C23C14/50 ,  C23C16/458 ,  C23C14/35 ,  H01J37/34 ,  C23C14/08 ,  C23C14/22 ,  C23C14/34 ,  H01L43/12

CPC分类号： C23C14/50 ,  C23C14/081 ,  C23C14/225 ,  C23C14/345 ,  C23C14/3464 ,  C23C14/352 ,  C23C16/4586 ,  H01J37/3417 ,  H01J37/3438 ,  H01J37/3444 ,  H01L43/12

摘要： Provided is a high-quality magnetoresistive thin film by using a method of controlling self bias of a high-frequency sputtering device. In order to control the self bias for the substrate by adjusting a substrate potential, the high-frequency sputtering device according to the present invention includes: a chamber; evacuation means for evacuating the inside of the chamber; gas introduction means for supplying a gas into the chamber; a substrate holder provided with a substrate mounting table; rotation drive means capable of rotating the substrate holder; a sputtering cathode provided with a target mounting table and arranged such that the surface of the target mounting table is non-parallel to the surface of the substrate mounting table; an electrode disposed inside the substrate holder; and a variable impedance mechanism electrically connected to the electrode, for adjusting the substrate potential on the substrate holder.

摘要翻译： 通过使用控制高频溅射装置的自偏压的方法，提供了高质量的磁阻薄膜。 为了通过调整衬底电位来控制衬底的自偏压，根据本发明的高频溅射器件包括：腔室; 用于抽空腔室内部的排气装置; 气体引入装置，用于将气体供应到所述腔室中; 衬底保持器，其设置有衬底安装台; 旋转驱动装置，能够使基板保持架旋转; 设置有目标安装台的溅射阴极，并且被配置为使得所述目标安装台的表面不平行于所述基板安装台的表面; 设置在所述衬底保持器内的电极; 以及电连接到电极的可变阻抗机构，用于调节衬底保持器上的衬底电位。

公开(公告)号：US08980071B2

公开(公告)日：2015-03-17

申请号：US12870193

申请日：2010-08-27

申请人： Guido Mahnke ,  Bernhard Stock ,  Markus Hanika ,  Ferdinand Füller

发明人： Guido Mahnke ,  Bernhard Stock ,  Markus Hanika ,  Ferdinand Füller

IPC分类号： C23C14/00 ,  C25B11/00 ,  C25B13/00 ,  H01J37/34 ,  H01J37/32

CPC分类号： H01J37/3405 ,  H01J37/32935 ,  H01J37/342 ,  H01J37/3438 ,  H01J37/3444

摘要： Apparatuses for deposition of one or more layers. In one aspect, an apparatus for deposition of one or more layers includes an anode; a cathode; a vacuum chamber including the anode and the cathode; a sensor configured to detect an electric potential between a section of the at least one anode and a section of the chamber. Furthermore, methods to monitor a device for deposition of one or more layers are also described.

摘要翻译： 用于沉积一层或多层的装置。 一方面，用于沉积一层或多层的装置包括阳极; 阴极 包括阳极和阴极的真空室; 传感器，被配置为检测所述至少一个阳极的一部分与所述室的一部分之间的电位。 此外，还描述了监测用于沉积一个或多个层的装置的方法。

公开(公告)号：US20140246312A1

公开(公告)日：2014-09-04

申请号：US14263250

申请日：2014-04-28

申请人： Sputtering Components, Inc.

发明人： Daniel Theodore Crowley ,  Patrick Lawrence Morse ,  John Robert German ,  William A. Meredith, JR.

IPC分类号： H01J25/50 ,  H01J23/10 ,  C23C14/34

CPC分类号： H01J37/3455 ,  C23C14/35 ,  C23C14/52 ,  H01J37/34 ,  H01J37/3444 ,  H01J37/345 ,  H01J37/3479

摘要： A magnetron assembly for a rotary target cathode comprises an elongated support structure, a magnet bar structure movably positioned below the support structure, and a plurality of drive modules coupled to the support structure. The drive modules each include a motorized actuation mechanism operatively coupled to the magnet bar structure. A controller and battery module is coupled to the support structure and is in operative communication with the drive modules. The controller and battery module includes an electronic controller and at least one rechargeable battery. The battery is configured to energize each motorized actuation mechanism and the electronic controller. One or more power generation modules is coupled to the support structure and in electrical communication with the battery, such that electrical energy output from the power generation modules recharges the battery.

摘要翻译： 用于旋转靶阴极的磁控管组件包括细长的支撑结构，可移动地定位在支撑结构下方的磁棒结构以及耦合到支撑结构的多个驱动模块。 驱动模块各自包括可操作地联接到磁棒结构的电动致动机构。 控制器和电池模块耦合到支撑结构并与驱动模块进行操作性通信。 控制器和电池模块包括电子控制器和至少一个可充电电池。 电池被配置成为每个电动致动机构和电子控制器通电。 一个或多个发电模块耦合到支撑结构并与电池电连通，使得从发电模块输出的电能为电池充电。

公开(公告)号：US20140183037A1

公开(公告)日：2014-07-03

申请号：US14142605

申请日：2013-12-27

申请人： Silevo, Inc.

发明人： Zhigang Xie ,  Wei Wang ,  Zheng Xu ,  Jianming Fu

IPC分类号： H01L31/18

CPC分类号： H01J37/3414 ,  C23C14/3407 ,  C23C14/351 ,  H01J37/32082 ,  H01J37/32091 ,  H01J37/32137 ,  H01J37/3405 ,  H01J37/3417 ,  H01J37/342 ,  H01J37/3423 ,  H01J37/3438 ,  H01J37/3444 ,  H01J37/345 ,  H01J37/3452 ,  H01J37/347 ,  H01L31/02168 ,  H01L31/1876 ,  H01L31/1884 ,  Y02E10/50

摘要： One embodiment of the present invention provides a sputtering system for large-scale fabrication of solar cells. The sputtering system includes a reaction chamber, a rotary target situated inside the reaction chamber which is capable of rotating about a longitudinal axis, and an RF power source coupled to at least one end of the rotary target to enable RF sputtering. The length of the rotary target is between 0.5 and 5 meters.

摘要翻译： 本发明的一个实施例提供了一种用于大规模制造太阳能电池的溅射系统。 溅射系统包括反应室，位于反应室内部的能够围绕纵向轴线旋转的旋转靶，以及耦合到旋转靶的至少一端以实现RF溅射的RF电源。 旋转靶的长度在0.5到5米之间。