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    SYSTEMS AND METHODS FOR FORMING A LAYER OF SPUTTERED MATERIAL
    1.
    发明申请
    SYSTEMS AND METHODS FOR FORMING A LAYER OF SPUTTERED MATERIAL 审中-公开
    用于形成溅射材料层的系统和方法

    公开(公告)号：US20120080309A1

    公开(公告)日：2012-04-05

    申请号：US12899752

    申请日：2010-10-07

    申请人： Marcus BENDER ,  Markus HANIKA ,  Evelyn SCHEER ,  Fabio PIERALISI ,  Guido MAHNKE

    发明人： Marcus BENDER ,  Markus HANIKA ,  Evelyn SCHEER ,  Fabio PIERALISI ,  Guido MAHNKE

    IPC分类号： C23C14/34

    CPC分类号： C23C14/352 ,  C23C14/35 ,  H01J37/34 ,  H01J37/3473

    摘要： The present disclosure describes a method of coating a substrate, the method including forming a layer of sputtered material on the substrate. Forming the layer of sputtered material may include: sputtering material from at least one target over the substrate; varying the relative position between the at least one target and the substrate to a first position (I), which first position is maintained for a predetermined first time interval; and varying the relative position between the at least one target and the substrate to a second position (II), which second position is maintained for a predetermined second time interval. The present disclosure further describes a system for coating a substrate.

    摘要翻译： 本公开描述了一种涂覆基底的方法，该方法包括在基底上形成溅射材料层。 形成溅射材料层可以包括：从衬底上的至少一个靶溅射材料; 将所述至少一个目标和所述基板之间的相对位置改变到第一位置（I），该第一位置被维持预定的第一时间间隔; 并且将所述至少一个目标和所述基板之间的相对位置改变到第二位置（II），所述第二位置被维持预定的第二时间间隔。 本公开进一步描述了用于涂覆基底的系统。

    METHOD FOR COATING A SUBSTRATE AND COATER
    4.
    发明申请
    METHOD FOR COATING A SUBSTRATE AND COATER 审中-公开
    涂层和涂层的方法

    公开(公告)号：US20120273343A1

    公开(公告)日：2012-11-01

    申请号：US13499651

    申请日：2010-09-30

    申请人： Marcus Bender ,  Markus Hanika ,  Evelyn Scheer ,  Fabio Pieralisi ,  Guido Mahnke

    发明人： Marcus Bender ,  Markus Hanika ,  Evelyn Scheer ,  Fabio Pieralisi ,  Guido Mahnke

    IPC分类号： C23C14/35

    CPC分类号： H01J37/3405 ,  H01J37/3452 ,  H01J37/3455

    摘要： A method is provided for coating a substrate (100) with a cathode assembly (10) having a rotatable target (20). The rotatable target has at least one magnet assembly (25) positioned there within. The method includes positioning the magnet assembly at a first position so that it is asymmetrically aligned with respect to a plane (22) perpendicularly extending from the substrate (100) to the axis (21) of the rotatable target for a predetermined first time interval; positioning the magnet assembly at a second position that is asymmetrically aligned with respect to said plane (22) for a predetermined second time interval; and providing a voltage to the rotatable target that is varied over time during coating. Further, a coater is provided that includes a cathode assembly with a rotatable curved target; and two magnet assemblies positioned within the rotatable curved target wherein the distance between the two magnet assemblies can be varied.

    摘要翻译： 提供了一种用具有可旋转靶（20）的阴极组件（10）涂覆基底（100）的方法。 可旋转靶具有定位在其内的至少一个磁体组件（25）。 该方法包括将磁体组件定位在第一位置，使得其相对于从基板（100）垂直延伸到可旋转靶的轴线（21）的平面（22）以预定的第一时间间隔对准地对准; 将磁体组件定位在相对于所述平面（22）不对称对准预定的第二时间间隔的第二位置处; 以及向涂覆期间随时间变化的可旋转靶提供电压。 此外，提供一种包括具有可旋转弯曲目标的阴极组件的涂布机; 以及位于可旋转弯曲目标内的两个磁体组件，其中两个磁体组件之间的距离可以改变。

    METHOD FOR COATING A SUBSTRATE AND COATER
    6.
    发明申请
    METHOD FOR COATING A SUBSTRATE AND COATER 审中-公开
    涂层和涂层的方法

    公开(公告)号：US20110079508A1

    公开(公告)日：2011-04-07

    申请号：US12577073

    申请日：2009-10-09

    申请人： Marcus BENDER ,  Markus HANIKA ,  Evelyn SCHEER ,  Fabio PIERALISI ,  Guido MAHNKE

    发明人： Marcus BENDER ,  Markus HANIKA ,  Evelyn SCHEER ,  Fabio PIERALISI ,  Guido MAHNKE

    IPC分类号： C23C14/35

    CPC分类号： H01J37/3405 ,  H01J37/3452 ,  H01J37/3455

    摘要： A method is provided for coating substrates with at least one cathode assembly having a rotatable target, the rotatable target being provided with at least one magnet assembly positioned there within. The method includes providing a potential difference between the substrate and the rotatable target that is varied over time during coating. Further, the method may include positioning the magnet assembly with respect to the rotatable target so that the magnet assembly is asymmetrically aligned with respect to a plane perpendicularly extending from the substrate to the axis of the rotatable target for a predetermined first time interval. The magnet assembly is then moved to a second position that is also asymmetrically aligned. Further, a coater for coating substrates is provided including a cathode assembly with a rotatable curved target and two magnet assemblies positioned within the rotatable curved target.

    摘要翻译： 提供了一种用于用至少一个具有可旋转靶的阴极组件涂覆衬底的方法，所述可旋转靶设置有位于其内的至少一个磁体组件。 该方法包括提供在涂覆期间随时间变化的基底和可旋转靶之间的电位差。 此外，该方法可以包括相对于可旋转靶定位磁体组件，使得磁体组件相对于从衬底垂直延伸到可旋转靶的轴线的平面不对准地对准预定的第一时间间隔。 然后将磁体组件移动到也不对称对准的第二位置。 此外，提供一种用于涂覆基材的涂布机，其包括具有可旋转弯曲目标的阴极组件和位于可旋转弯曲目标内的两个磁体组件。