LOW-TEMPERATURE SYNTHESIS OF COLLOIDAL NANOCRYSTALS
    18.
    发明申请
    LOW-TEMPERATURE SYNTHESIS OF COLLOIDAL NANOCRYSTALS 审中-公开
    低温合成纳米晶体

    公开(公告)号:US20160138183A1

    公开(公告)日:2016-05-19

    申请号:US15004697

    申请日:2016-01-22

    摘要: Low-temperature organometallic nucleation and crystallization-based synthesis methods for the fabrication of semiconductor and metal colloidal nanocrystals with narrow size distributions and tunable, size- and shape-dependent electronic and optical properties. Methods include (1) forming a reaction mixture in a reaction vessel under an inert atmosphere that includes at least one solvent, a cationic precursor, an anionic precursor, and at least a first surface stabilizing ligand while stirring at a temperature in a range from about 50° C. to about 130° C. and (2) growing nanocrystals in the reaction mixture for a period of time while maintaining the temperature, the stirring, and the inert-gas atmosphere.

    摘要翻译: 低温有机金属成核和基于结晶的合成方法,用于制造具有窄尺寸分布和可调,尺寸和形状依赖的电子和光学性质的半导体和金属胶体纳米晶体。 方法包括(1)在包括至少一种溶剂,阳离子前体,阴离子前体和至少第一表面稳定配体的惰性气氛下在反应容器中形成反应混合物,同时在约 50℃至约130℃,和(2)在保持温度,搅拌和惰性气体气氛的同时在反应混合物中生长纳米晶体一段时间。

    SEMICONDUCTOR DEVICE AND METHOD FOR PRODUCING A SEMICONDUCTOR DEVICE
    20.
    发明申请
    SEMICONDUCTOR DEVICE AND METHOD FOR PRODUCING A SEMICONDUCTOR DEVICE 审中-公开
    用于制造半导体器件的半导体器件和方法

    公开(公告)号:US20160064663A1

    公开(公告)日:2016-03-03

    申请号:US14937429

    申请日:2015-11-10

    IPC分类号: H01L45/00 H01L29/66 H01L27/24

    摘要: A semiconductor device includes first pillar-shaped semiconductor layers, a first gate insulating film formed around the first pillar-shaped semiconductor layers, gate electrodes formed of metal and formed around the first gate insulating film, gate lines formed of metal and connected to the gate electrodes, a second gate insulating film formed around upper portions of the first pillar-shaped semiconductor layers, first contacts formed of a first metal material and formed around the second gate insulating film, second contacts formed of a second metal material and connecting upper portions of the first contacts and upper portions of the first pillar-shaped semiconductor layers, second diffusion layers formed in lower portions of the first pillar-shaped semiconductor layers, pillar-shaped insulator layers formed on the second contacts, variable-resistance films formed around upper portions of the pillar-shaped insulator layers, and lower electrodes formed around lower portions of the pillar-shaped insulator layers and connected to the variable-resistance films.

    摘要翻译: 半导体器件包括第一柱状半导体层,围绕第一柱状半导体层形成的第一栅极绝缘膜,由金属形成的栅电极,并形成在第一栅极绝缘膜周围;栅极线,由金属形成并连接到栅极 电极,形成在第一柱状半导体层的上部周围的第二栅极绝缘膜,由第一金属材料形成并形成在第二栅极绝缘膜周围的第一触点,由第二金属材料形成的第二触点, 第一柱状半导体层的第一接触和上部,形成在第一柱状半导体层的下部的第二扩散层,形成在第二接触部上的柱状绝缘体层,形成在上部的上部的可变电阻膜 的柱状绝缘体层,下部电极形成在p 1的下部 llar形绝缘体层并连接到可变电阻膜。