Manufacturing process for high-purity phosphors having utility in field
emission displays
    18.
    发明授权
    Manufacturing process for high-purity phosphors having utility in field emission displays 失效
    用于场致发射显示器的高纯度荧光粉的制造方法

    公开(公告)号:US5906771A

    公开(公告)日:1999-05-25

    申请号:US974749

    申请日:1997-11-19

    IPC分类号: C09K11/08 C09K11/78 C09K11/00

    摘要: A process is provided for manufacturing high-purity phosphors having utility in field emission displays. The high-purity phosphor is a host lattice infiltrated by a dopant that activates luminescent properties therein. The lattice and dopant are initially milled together to reduce their average particle size while simultaneously achieving complete mixing between the lattice and the dopant. The resulting mixture is maintained free of a flux or substantially any other treatment agent capable of contaminating the phosphor and placed in a heating vessel formed from a substantially impervious contaminant-free material. The mixture is heated to a high temperature effectuating thorough infiltration of the dopant into the lattice structure. The use of an impervious contaminant-free heating vessel and the exclusion of flux or other treatment agents from the mixture avoids undesirable contamination and undue particle size growth of the phosphor product during the manufacture thereof. Accordingly, product is a high-purity phosphor having a small average particle size, yet exhibiting sufficient luminescent efficiencies for utility in field emission displays as a luminescent coating for the anode screen.

    摘要翻译: 提供了用于制造在场发射显示器中具有实用性的高纯度荧光体的方法。 高纯度荧光体是由掺杂剂渗透的主体晶格,其激活其中的发光性质。 晶格和掺杂剂最初被研磨在一起以降低其平均粒度,同时实现晶格和掺杂剂之间的完全混合。 所得混合物保持没有助焊剂或基本上任何能够污染荧光体并且放置在由基本上不渗透的无污染物质形成的加热容器中的其它处理剂。 将混合物加热到高温,使掺杂剂彻底渗透到晶格结构中。 使用不渗透无污染物的加热容器以及从混合物排除助熔剂或其它处理剂避免了在其制造过程中不期望的污染和不适当的粒度增长的荧光体产品。 因此,产品是具有小平均粒度的高纯度荧光体,但在场发射显示器中作为阳极屏的发光涂层显示出足够的发光效率。