知搜-全球专利检索

  1. 登录
  2. 注册

搜索结果

61 条记录 (耗时 0.087 秒)

    Polymer comprising end groups containing photoacid generator, photoresist comprising the polymer, and method of making a device
    15.
    发明授权
    Polymer comprising end groups containing photoacid generator, photoresist comprising the polymer, and method of making a device 有权
    包含含有光酸产生剂的端基的聚合物，包含聚合物的光致抗蚀剂，以及制造器件的方法

    公开(公告)号：US09052589B2

    公开(公告)日：2015-06-09

    申请号：US14012174

    申请日：2013-08-28

    申请人： Dow Global Technologies LLC

    发明人： John W. Kramer ,  Daniel J. Arriola

    IPC分类号： G03F7/004 ,  G03F7/20 ,  C08F2/38 ,  G03F7/039 ,  C08F220/28 ,  C08F220/18 ,  C08F220/38

    CPC分类号： G03F7/0041 ,  C08F2/38 ,  C08F220/28 ,  C08F2220/1891 ,  C08F2220/387 ,  C08F2438/03 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/20 ,  C08F2220/282 ,  C08F2220/1866 ,  C08F220/24

    摘要： A polymer comprises the polymerized product of unsaturated monomers comprising an acid-deprotectable monomer, a base-soluble monomer, a lactone-containing monomer, a photoacid-generating monomer, or a combination comprising at least one of the foregoing monomers, with a chain transfer agent of Formula (I); wherein in Formula (I), Z is a y valent C1-20 organic group, L is a heteroatom or a single bond, A1 and A2 are each independently ester containing or non-ester containing and are fluorinated or non-fluorinated, and are independently C1-40 alkylene, C3-40 cycloalkylene, C6-40 arylene, or C7-40 aralkylene, and A1 contains a nitrile, ester, or aryl substituent group alpha to the point of attachment with sulfur, X1 is a single bond, —O—, —S—, —C(═O)—O—, —O—C(═O)—, —O—C(═O)—O—, —C(═O)—NR—, —NR—C(═O)—, —NR—C(═O)—NR—, —S(═O)2—O—, —O—S(═O)2—O—, —NR—S(═O)2—, or —S(═O)2—NR, wherein R is H, C1-10 alkyl, C3-10 cycloalkyl or C6-10 aryl, Y− is an anionic group, G+ is a metallic or non-metallic cation, and y is an integer of 1 to 6. A photoresist composition comprising the polymer, a coated substrate, comprising a layer of the photoresist composition, and a method of forming an electronic device from the photoresist, are also disclosed.

    摘要翻译： 聚合物包含不饱和单体的聚合产物，其包含酸可脱保护的单体，可溶于碱的单体，含内酯的单体，产生光致酸的单体或包含至少一种前述单体的组合与链转移 式（I）的试剂; 其中在式（I）中，Z是一价C 1-20有机基团，L是杂原子或单键，A1和A2各自独立地为含酯或非酯，并且为氟化或非氟化的，并且独立地为 C 1-4亚烷基，C 3-40亚环烷基，C 6-40亚芳基或C 3-40亚芳基，并且A1含有与硫连接点的腈，酯或芳基取代基α，X1是单键，-O - ， - S - ， - C（= O）-O-，-O-C（= O） - ， - O-C（= O）-O-，-C（= -C（= O） - ， - NR-C（= O）-NR - ， - S（= O）2-O-，-O-S（= O）2-O-，-NR-S O）2-或-S（= O）2 -NR，其中R是H，C 1-10烷基，C 3-10环烷基或C 6-10芳基，Y-是阴离子基团，G +是金属或非金属， 金属阳离子，y为1〜6的整数。包含聚合物的光致抗蚀剂组合物，包含光致抗蚀剂组合物的层的涂布基材，以及从该光刻胶形成电子器件的方法 抗拒，也被披露。