公开(公告)号：US06677103B2

公开(公告)日：2004-01-13

申请号：US10114258

申请日：2002-04-03

Applicant: Kazufumi Sato ,  Satoshi Maemori ,  Taku Nakao ,  Kazuyuki Nitta

Inventor： Kazufumi Sato ,  Satoshi Maemori ,  Taku Nakao ,  Kazuyuki Nitta

IPC: G03F7039

CPC classification number: G03F7/0392 ,  Y10S430/106

Abstract: Disclosed is a novel chemical-amplification positive-working photoresist composition capable of giving a patterned resist layer with excellent properties such as photosensitivity, pattern resolution, heat resistance and cross sectional profile of the patterned resist layer. The composition is characterized by the use of, as the film-forming resinous component, a hydroxyl-containing resinous ingredient which is a combination of a first resin of which from 30 to 60% of the hydroxyl groups are substituted by acid-dissociable solubility-reducing groups and a second resin of which from 5 to 20% of the hydroxyl groups are substituted by acid-dissociable groups of the same kind as in the first resin in a weight proportion of 1.9 to 9:1.

Abstract translation: 公开了一种新颖的化学放大正性光致抗蚀剂组合物，其能够赋予具有优异性能的图案化抗蚀剂层，例如图案化抗蚀剂层的光敏性，图案分辨率，耐热性和横截面轮廓。 该组合物的特征在于使用含羟基的树脂成分作为成膜树脂成分，该含羟基的树脂成分是其中30-60％的羟基被酸解离溶解度代替的第一树脂， 还原基团，其中5〜20％的羟基被第一树脂中相同种类的酸解离基团以1.9至9:1的重量比取代的第二树脂。

公开(公告)号：US06656659B1

公开(公告)日：2003-12-02

申请号：US09080530

申请日：1998-05-18

Applicant: Koji Nozaki ,  Ei Yano

Inventor： Koji Nozaki ,  Ei Yano

IPC: G03F7039

CPC classification number: G03F7/0397 ,  Y10S430/106 ,  Y10S430/111

Abstract: A resist composition has a polymer containing a carboxyl group with a protective group at a side chain of a monomer unit, the polymer being insoluble to basic aqueous solution and becoming soluble to basic aqueous solution when the protective group of the carboxyl group is eliminated from the side chain, the protective group of the carboxyl group being represented by: where R is a hydrogen atom or a single-bonded hydrocarbon group, n is an integer 1 to 4, and R is bonded to a position other than the ester bonded position.

Abstract translation: 抗蚀剂组合物具有在单体单元的侧链含有保护基的羧基的聚合物，该聚合物在碱性水溶液中不溶，并且当羧基的保护基从 侧链，羧基的保护基由下式表示：其中R是氢原子或单键合烃基，n是1至4的整数，并且R结合到除了酯键合位置之外的位置。

公开(公告)号：US06641974B2

公开(公告)日：2003-11-04

申请号：US09759825

申请日：2001-01-12

Applicant: Jae Young Kim ,  Joo Hyeon Park

Inventor： Jae Young Kim ,  Joo Hyeon Park

IPC: G03F7039

CPC classification number: G03F7/039 ,  G03F7/0045 ,  Y10S430/106

Abstract: Disclosed is a chemically amplified positive photoresist composition including a multi-component copolymer having a polystyrene-reduced weight average molecular weight (Mw) of 3,000 to 50,000 and a molecular weight distribution (Mw/Mn) of 1.0 to 3.0, a low molecular weight additive, an acid generator, and a solvent. A resist composition comprising the additive may provide a resist pattern excellent in sensitivity as well as adhesion to substrate and dry etching resistance. Such a resist composition is a promising material greatly suitable for use in the fabrication of semiconductor devices that are expected to have further fineness. Especially, the resist composition is suitable for KrF or ArF excimer laser lithography and thus useful in the fine engineering of less than 0.20 micron patterns.

Abstract translation: 公开了一种化学放大型正性光致抗蚀剂组合物，其包含聚苯乙烯换算的重均分子量（Mw）为3,000〜50,000，分子量分布（Mw / Mn）为1.0〜3.0的多组分共聚物，低分子量添加剂 ，酸产生剂和溶剂。包含添加剂的抗蚀剂组合物可以提供灵敏度以及对基材的粘附性和耐干蚀刻性优异的抗蚀剂图案。 这种抗蚀剂组合物是非常适合用于预期具有更高细度的半导体器件的制造中的有希望的材料。 特别地，抗蚀剂组合物适用于KrF或ArF准分子激光光刻，因此可用于小于0.20微米图案的精细工程中。

公开(公告)号：US06602645B1

公开(公告)日：2003-08-05

申请号：US09573159

申请日：2000-05-19

Applicant: Tatsuo Nakamura ,  Kazuto Kunita ,  Katsuji Kitatani

Inventor： Tatsuo Nakamura ,  Kazuto Kunita ,  Katsuji Kitatani

IPC: G03F7039

CPC classification number: B41C1/1025 ,  B41C2201/04 ,  B41C2201/14 ,  B41C2210/02 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/262 ,  Y10S430/165

Abstract: The present invention provides a photosensitive composition for an infrared laser used for direct plate making, which has high sensitivity and good developing latitude and storage stability, and provides a planographic printing plate in which this composition is used. The positive-type photosensitive composition of the present invention has (a) a macromolecular compound having alkali-soluble groups and (b) a compound that has a phthalocyanine skeleton and has in its molecule at least one group which can form a bond by interaction with an alkali-soluble group in the macromolecular compound (a).

Abstract translation: 本发明提供一种用于直接制版的红外激光用光敏组合物，其具有高灵敏度和良好的显影纬度和储存稳定性，并提供了使用该组合物的平版印刷版。 本发明的正型感光性组合物具有（a）具有碱溶性基团的高分子化合物和（b）具有酞菁骨架的化合物，并且在其分子中具有至少一个可以通过与 大分子化合物（a）中的碱溶性基团。

公开(公告)号：US06573012B1

公开(公告)日：2003-06-03

申请号：US09630620

申请日：2000-08-02

Applicant: Geun Su Lee ,  Jae Chang Jung ,  Ki Ho Baik

Inventor： Geun Su Lee ,  Jae Chang Jung ,  Ki Ho Baik

IPC: G03F7039

CPC classification number: G03F7/0397 ,  G03F7/0395 ,  Y10S430/106

Abstract: The present invention provides compounds represented by formulas 1a and 1b, and photoresist polymers derived from the same. The present inventors have found that photoresist polymers derived from compounds of formulas 1a, 1b, or mixtures thereof, having an acid labile protecting group have excellent durability, etching resistance, reproducibility, adhesiveness and resolution, and as a result are suitable for lithography processes using deep ultraviolet light sources such as KrF, ArF, VUV, EUV, electron-beam, and X-ray, which can be applied to the formation of the ultrafine pattern of 4G and 16G DRAMs as well as the DRAM below 1G: where R1, R2 and R3 are those defined herein.

Abstract translation: 本发明提供由式1a和1b表示的化合物和衍生自其的光致抗蚀剂聚合物。 本发明人已经发现，具有酸不稳定保护基的衍生自式Ia，1b化合物或其混合物的光致抗蚀剂聚合物具有优异的耐久性，耐腐蚀性，再现性，粘合性和分辨率，因此适用于使用 深紫外光源如KrF，ArF，VUV，EUV，电子束和X射线，可用于形成4G和16G DRAM的超细格局以及低于1G的DRAM：其中R1， R2和R3是本文定义的那些。

公开(公告)号：US06548219B2

公开(公告)日：2003-04-15

申请号：US09771262

申请日：2001-01-26

Applicant: Hiroshi Ito ,  Phillip Joe Brock ,  Gregory Michael Wallraff

Inventor： Hiroshi Ito ,  Phillip Joe Brock ,  Gregory Michael Wallraff

IPC: G03F7039

CPC classification number: G03F7/0395 ,  C08F232/08 ,  G03F7/0382 ,  Y10S430/108 ,  Y10S430/111

Abstract: Copolymers prepared by radical polymerization of a substituted norbornene monomer and a fluoromethacrylic acid, fluoromethacrylonitrile, or fluoromethacrylate comonomer are provided. The polymers are useful in lithographic phtoresist compositions, particularly chemical amplification resists. In a preferred embodiment, the polymers are substantially transparent to deep ultraviolet (DUV) radiation, i.e., radiation of a wavelength less than 250 nm, including 157 nm, 193 nm and 248 nm radiation, and are thus useful in DUV lithographic photoresist compositions. A process for using the composition to generate resist images on a substrate is also provided, i.e., in the manufacture of integrated circuits or the like.

Abstract translation: 提供了通过取代的降冰片烯单体和氟代甲基丙烯酸，氟甲基丙烯腈或氟代甲基丙烯酸酯共聚单体的自由基聚合制备的共聚物。 聚合物可用于光刻抗蚀剂组合物，特别是化学增强抗蚀剂。 在优选的实施方案中，聚合物对深紫外（DUV）辐射基本上是透明的，即波长小于250nm的辐射，包括157nm，193nm和248nm辐射，因此可用于DUV平版光刻胶组合物。 还提供了使用该组合物在衬底上产生抗蚀剂图像的方法，即在集成电路等的制造中。

公开(公告)号：US06485890B2

公开(公告)日：2002-11-26

申请号：US09860943

申请日：2001-05-18

Applicant: Gareth Rhodri Parsons ,  David Stephen Riley ,  Richard David Hoare ,  Alan Stanley Victor Monk

Inventor： Gareth Rhodri Parsons ,  David Stephen Riley ,  Richard David Hoare ,  Alan Stanley Victor Monk

IPC: G03F7039

CPC classification number: B41M5/368 ,  B41C1/1008 ,  B41C1/1016 ,  B41C2210/02 ,  B41C2210/06 ,  B41C2210/14 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/262 ,  Y10S430/145 ,  Y10S430/146 ,  Y10S430/165

Abstract: Thermally imageable lithographic printing plate precursors and heat-sensitive compositions for use in these printing plate precursors are disclosed. The compositions contain an aqueous developer soluble polymer, such as a phenolic resin; a compound that reduces the aqueous developer solubility of the polymer; and optionally, and infrared absorber. Examples of compounds that reduce the aqueous developer solubility of the polymer are those that contain at least one quarternized nitrogen atom, such as quinolinium compounds, benzothiazolium compounds, pyridinium compounds, and imidazoline compounds. On thermal imaging, the irradiated areas become more soluble in the aqueous developer and can be removed to form a positive image.

公开(公告)号：US06472119B1

公开(公告)日：2002-10-29

申请号：US09476089

申请日：2000-01-03

Applicant: Eric Verschueren ,  Joan Vermeersch ,  Marc Van Damme ,  Guido Hauquier

Inventor： Eric Verschueren ,  Joan Vermeersch ,  Marc Van Damme ,  Guido Hauquier

IPC: G03F7039

CPC classification number: B41C1/1008 ,  B41C1/1016 ,  B41C2210/02 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/262

Abstract: According to the present invention there is provided a heat ode imaging element for making a lithographic printing plate having n a lithographic base with a hydrophilic surface a first layer including a polymer, soluble in an aqueous alkaline solution and a top layer on the same side of the lithographic base as the first layer which top layer is IR-sensitive and unpenetrable or insoluble for an alkaline developer wherein said first layer and said top layer may be one and the same layer and said first layer and said top layer being the imaging layers; characterized in that said imaging layers have a glass transition temperature of at least 57° C.

Abstract translation: 根据本发明，提供了一种用于制造平版印刷版的平版印刷版，其具有亲水表面的具有可溶于碱性水溶液的聚合物的第一层和具有亲水表面的第一层， 作为第一层的光刻基底，其顶层对于碱性显影剂是IR敏感的且不可穿透的或不溶的，其中所述第一层和所述顶层可以是同一层，所述第一层和所述顶层是成像层; 其特征在于，所述成像层的玻璃化转变温度至少为57℃

公开(公告)号：US06461795B1

公开(公告)日：2002-10-08

申请号：US09558109

申请日：2000-04-25

Applicant: Christopher David McCullough ,  Kevin Barry Ray ,  Alan Stanley Monk ,  John David Riches ,  Anthony Paul Kitson ,  Gareth Rhodri Parsons ,  David Stephen Riley

Inventor： Christopher David McCullough ,  Kevin Barry Ray ,  Alan Stanley Monk ,  John David Riches ,  Anthony Paul Kitson ,  Gareth Rhodri Parsons ,  David Stephen Riley

IPC: G03F7039

CPC classification number: B41N3/00 ,  B41M5/368 ,  H05K3/0082 ,  Y10S430/145 ,  Y10S430/146 ,  Y10S430/165

Abstract: Phenolic resin compositions formulated for use in lithographic exposure processes are given a heat treatment at 40-90° C. for at least 4 hours shortly after their coating onto lithographic substrates, to produce lithographic printing forms. It is found that such a heat treatment improves later exposure processes, in particular by rendering the sensitivity of the compositions less variable, over time.

Abstract translation: 配制用于光刻曝光工艺的酚醛树脂组合物在其涂布在平版印刷基材上不久后在40-90℃下进行至少4小时的热处理，以产生平版印刷形式。 发现这种热处理改进了后续的曝光过程，特别是通过使组合物的灵敏度随时间变化而变小。

公开(公告)号：US06461790B1

公开(公告)日：2002-10-08

申请号：US09658604

申请日：2000-09-08

Applicant: Jun Hatakeyama ,  Jun Watanabe ,  Yuji Harada ,  Mutsuo Nakashima ,  Masaru Sasago ,  Shinji Kishimura

Inventor： Jun Hatakeyama ,  Jun Watanabe ,  Yuji Harada ,  Mutsuo Nakashima ,  Masaru Sasago ,  Shinji Kishimura

IPC: G03F7039

CPC classification number: G03F7/0046 ,  G03F7/0045 ,  G03F7/0382 ,  G03F7/0392 ,  Y10S430/106

Abstract: Polymers comprising fluorinated vinyl phenol units and having acid labile groups partially introduced are novel. Using such polymers, resist compositions featuring transparency to excimer laser and alkali solubility are obtained.

Abstract translation: 包含氟化乙烯基苯酚单元和部分引入酸不稳定基团的聚合物是新颖的。 使用这种聚合物，获得具有对准分子激光的透明度和碱溶性的抗蚀剂组合物。