ION IMPLANTATION SYSTEM AND RELATED METHODS

    公开(公告)号:US20240379320A1

    公开(公告)日:2024-11-14

    申请号:US18657535

    申请日:2024-05-07

    Applicant: ENTEGRIS, INC.

    Abstract: An ion implantation system and related methods are provided herein. An ion implantation system comprises a gas supply assembly comprising at least one gas supply vessel in fluid communication with an arc chamber. The gas supply assembly is configured to supply a gas component comprising at least one of GeF4, GeH4, H2, a fluorine-containing gas, or any combination thereof. When the gas component is supplied from the at least one gas supply vessel to the arc chamber for implantation into a substrate, a beam current of Ge ions generated from the gas component is greater than a beam current of Ge ions generated from a control gas component.

    Smart package
    12.
    发明授权

    公开(公告)号:US10247363B2

    公开(公告)日:2019-04-02

    申请号:US15549875

    申请日:2016-02-12

    Applicant: ENTEGRIS, INC.

    Abstract: A fluid supply package is described, which includes a fluid storage and dispensing vessel, and a fluid dispensing assembly coupled to the vessel and configured to enable discharge of fluid from the vessel under dispensing conditions, wherein the fluid supply package includes an informational augmentation device thereon, e.g., at least one of a quick read (QR) code and an RFID tag, for informational augmentation of the package. Process systems are described including process tools and one or more fluid supply packages of the foregoing type, wherein the process tool is configured for communicative interaction with the fluid supply package(s). Various communicative arrangements are described, which are usefully employed to enhance the efficiency and operation of process systems in which fluid supply packages of the foregoing type are employed.

    ION IMPLANTATION SYSTEM AND METHOD
    15.
    发明申请
    ION IMPLANTATION SYSTEM AND METHOD 审中-公开
    离子植入系统和方法

    公开(公告)号:US20150357152A1

    公开(公告)日:2015-12-10

    申请号:US14827783

    申请日:2015-08-17

    Applicant: Entegris, Inc.

    Abstract: An ion implantation system and method, providing cooling of dopant gas in the dopant gas feed line, to combat heating and decomposition of the dopant gas by arc chamber heat generation, e.g., using boron source materials such as B2F4 or other alternatives to BF3. Various arc chamber thermal management arrangements are described, as well as modification of plasma properties, specific flow arrangements, cleaning processes, power management, equilibrium shifting, optimization of extraction optics, detection of deposits in flow passages, and source life optimization, to achieve efficient operation of the ion implantation system.

    Abstract translation: 一种离子注入系统和方法,用于提供掺杂剂气体进料管线中的掺杂气体的冷却,以通过例如使用诸如B2F4的硼源材料或BF3的其他替代物来通过电弧室发热来防止掺杂气体的加热和分解。 描述了各种电弧室热管理布置,以及等离子体性质,特定流量布置,清洁过程,功率管理,平衡偏移,提取光学优化,流动通道沉积物检测和源寿命优化等方面的改进,以实现高效率 离子注入系统的操作。

    PRESSURE REGULATOR
    17.
    发明公开
    PRESSURE REGULATOR 审中-公开

    公开(公告)号:US20240247762A1

    公开(公告)日:2024-07-25

    申请号:US18420669

    申请日:2024-01-23

    Applicant: ENTEGRIS, INC.

    Abstract: A device includes a housing including a first chamber having a first pressure regulating device, a first fluid inlet, and a first fluid outlet. The first pressure regulating device includes a plurality of first levers; a first spring; and a first pressure activated device. In response to an external pressure decreasing, the first pressure activated device overcomes a first closing force and opens the first fluid inlet. A second chamber has a second pressure regulating device including a second fluid inlet and a second fluid outlet; a plurality of second levers; a second spring; and a second pressure activated device configured to constrict as the external pressure increases. In response to the external pressure decreasing, the second pressure activated device is configured to overcome a second closing force and open the second fluid inlet.

    GAS STORAGE AND DISPENSING CONTAINER AND A METHOD OF DISPENSING THEREFROM

    公开(公告)号:US20220290812A1

    公开(公告)日:2022-09-15

    申请号:US17689610

    申请日:2022-03-08

    Applicant: ENTEGRIS, INC.

    Abstract: A gas storage and dispensing container includes a storage vessel, a first gas pressure regulator, and a second gas pressure regulator. The storage vessel is configured to contain a pressurized gas. The gas storage and dispensing container has a discharge flow path for discharging the pressurized gas. The first gas pressure regulator is disposed within the storage vessel, and the second gas pressure regulator is external to the storage vessel. The discharge flow path extends through the first gas pressure regulator and the second gas pressure regulator. A method of discharging gas from a gas storage and dispensing container includes a first gas pressure regulator reducing a pressure of the pressurized gas to a first pressure and a second gas pressure regulator reducing the pressure of the pressurized gas to a second pressure.

    APPARATUS AND METHOD FOR PREPARATION OF COMPOUNDS OR INTERMEDIATES THEREOF FROM A SOLID MATERIAL, AND USING SUCH COMPOUNDS AND INTERMEDIATES
    20.
    发明申请
    APPARATUS AND METHOD FOR PREPARATION OF COMPOUNDS OR INTERMEDIATES THEREOF FROM A SOLID MATERIAL, AND USING SUCH COMPOUNDS AND INTERMEDIATES 审中-公开
    从固体材料中制备化合物或其中间体的装置和方法,以及使用这些化合物和中间体

    公开(公告)号:US20160107136A1

    公开(公告)日:2016-04-21

    申请号:US14940278

    申请日:2015-11-13

    Applicant: Entegris, Inc.

    Abstract: An apparatus is described, as including a reaction region for contacting a reactant gas with a reactive solid under conditions effective to form an intermediate product, and an opening for allowing an unreacted portion of the gaseous reagent and the intermediate product to exit the reaction region. The apparatus can be beneficially employed to form a final product as a reaction product of the intermediate product and the reactant gas. The reaction of the reactant gas and reactive solid can be conducted in a first reaction zone, with the reaction of the reactant gas and intermediate product conducted in a second reaction zone. In a specific implementation, the reaction of the reactant gas and intermediate product is reversible, and the reactant gas and intermediate product are flowed to the second reaction zone at a controlled rate or in a controlled manner, to suppress back reaction forming the reactive solid.

    Abstract translation: 描述了一种装置,其包括用于在有效形成中间产物的条件下使反应气体与反应性固体接触的反应区域,以及允许气态试剂和中间产物的未反应部分离开反应区域的开口。 该设备可以有利地用于形成作为中间产物和反应气体的反应产物的最终产物。 反应气体和反应性固体的反应可以在第一反应区进行,反应气体和中间产物的反应在第二反应区中进行。 在具体实施方案中,反应气体和中间产物的反应是可逆的,并且反应物气体和中间产物以受控的速率或受控的方式流到第二反应区,以抑制形成反应性固体的反应。

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