知搜-全球专利检索

  1. 登录
  2. 注册

搜索结果

108 条记录 (耗时 0.021 秒)

    Processing gas supplying system and processing gas supplying method
    3.
    发明授权
    Processing gas supplying system and processing gas supplying method 有权
    加工气体供应系统和加工气体供应方法

    公开(公告)号：US08261762B2

    公开(公告)日：2012-09-11

    申请号：US12093491

    申请日：2007-08-10

    申请人： Kiyoshi Komiyama ,  Akitoshi Tsuji ,  Takuya Fujiwara

    发明人： Kiyoshi Komiyama ,  Akitoshi Tsuji ,  Takuya Fujiwara

    IPC分类号： H01L21/30 ,  B05C11/00

    CPC分类号： F17C7/00 ,  F17C5/06 ,  F17C2205/0326 ,  F17C2205/0335 ,  F17C2205/0352 ,  F17C2221/016 ,  F17C2223/0123 ,  F17C2227/044 ,  F17C2227/045 ,  F17C2250/032 ,  F17C2250/0443 ,  F17C2250/0626 ,  F17C2250/0636 ,  F17C2250/0673 ,  F17C2260/044 ,  F17C2260/053 ,  F17C2270/0518 ,  Y10T137/0419 ,  Y10T137/4259

    摘要： A gas supplying system includes a processing gas supply pipe for supplying a processing gas from a gas cylinder 210 into a processing apparatus and a nonreactive gas supply source 230 for supplying a nonreactive gas into the gas supply pipe. While the system is in operation, the gas supply pipe is charged with the nonreactive gas and a control unit is in a standby state. If a processing gas use start signal is received from the processing apparatus, the system exhausts the nonreactive gas from the gas supply pipe to create a vacuum therein; charges the gas supply pipe with the processing gas; and starts a supply of the processing gas from the processing gas supply source. If a processing gas use finish signal is received from the processing apparatus, the system stops the supply of the processing gas from the processing gas supply source; exhausts the processing gas from the gas supply pipe to create a vacuum therein; and charges the gas supply pipe with the nonreactive gas. Accordingly, the gas pipe from the processing gas supply source to the processing apparatus can be kept charged with the nonreactive gas when the processing gas is not used in the processing apparatus. Therefore, a deposit generation inside the gas pipe can be prevented during that period.

    摘要翻译： 气体供给系统包括用于将来自气瓶210的处理气体供给到处理装置中的处理气体供给管和用于向气体供给管供给非反应性气体的非反应性气体供给源230。 当系统运行时，气体供给管上装有非反应气体，控制单元处于待机状态。 如果从处理装置接收到处理气体使用开始信号，则系统从气体供给管排出非反应性气体，以在其中产生真空; 用加气处理供气管; 并开始从处理气体供应源供应处理气体。 如果从处理装置接收到处理气体使用完成信号，则系统停止从处理气体供应源供应处理气体; 从气体供给管排出处理气体以在其中产生真空; 并用非反应性气体对气体供给管进行充电。 因此，当在处理装置中不使用处理气体时，从处理气体供给源到处理装置的气体管道可以保持充满非反应性气体。 因此，能够防止在该期间内的气体管内的沉积物。

    Integral blocks, chemical delivery systems and methods for delivering an ultrapure chemical
    6.
    发明授权
    Integral blocks, chemical delivery systems and methods for delivering an ultrapure chemical 失效
    整体块，化学物质输送系统和交付超纯化学品的方法

    公开(公告)号：US07334708B2

    公开(公告)日：2008-02-26

    申请号：US10064220

    申请日：2002-06-21

    申请人： Mindi Xu ,  Tay Sayasane ,  Joseph E. Paganessi ,  Gregory M. Jursich ,  Naoyuki Nakamoto ,  Yukinobu Nishikawa ,  Herve E. Dulphy ,  Guillaume Rameau ,  Lorrin Honda

    发明人： Mindi Xu ,  Tay Sayasane ,  Joseph E. Paganessi ,  Gregory M. Jursich ,  Naoyuki Nakamoto ,  Yukinobu Nishikawa ,  Herve E. Dulphy ,  Guillaume Rameau ,  Lorrin Honda

    IPC分类号： B67D5/58

    CPC分类号： B08B9/032 ,  C03B19/1415 ,  C03B37/01413 ,  C03B2207/32 ,  C23C16/448 ,  C23C16/45561 ,  F17C9/02 ,  F17C2205/0332 ,  F17C2205/0338 ,  F17C2221/014 ,  F17C2221/016 ,  F17C2221/017 ,  F17C2221/05 ,  F17C2223/0123 ,  F17C2223/033 ,  F17C2227/044 ,  F17C2227/045 ,  F17C2270/0518

    摘要： Integral blocks, chemical delivery systems and methods for delivering an ultrapure chemical to a point of use or to another integral block are provided. More particularly, the integral blocks include a recharge container block, a pressurization gas block, a purge gas block, a waste recovery block, a vacuum block, a solvent supply block, a degas block, a control block, and a filtration block. Various integral blocks may be selected to form a chemical delivery system, which is particularly suited for a given application. A chemical delivery system will typically comprise a chemical container block, a chemical delivery block, and a point of use in line with the chemical container block and chemical delivery block, as well as one or more integral blocks. The invention also relates to a method for delivering an ultrapure chemical from a chemical container to a point of use, by connecting a chemical container block, containing an ultrapure chemical, to a chemical delivery block and introducing the ultrapure chemical to a point of use. The methods may also include the use of one or more integral blocks. The chemical delivery systems and methods of the invention may be used in a variety of applications. In particular, the invention may be used in electronics fabrication, optical fiber manufacture or semiconductor manufacture.

    摘要翻译： 提供了一体化块，化学传递系统和将超纯化学品输送到使用点或另一整体块的方法。 更具体地，积分块包括再充电容器块，加压气体块，吹扫气体块，废物回收块，真空块，溶剂供应块，脱气块，控制块和过滤块。 可以选择各种积分块以形成特别适用于给定应用的化学物质输送系统。 化学品输送系统通常将包括化学容器块，化学物质输送块和符合化学容器块和化学物质输送块的使用点以及一个或多个整体块。 本发明还涉及通过将含有超纯化学品的化学容器块连接到化学物质输送块并将超纯化学品引入到使用点，将超纯化学品从化学容器输送到使用点的方法。 所述方法还可以包括使用一个或多个积分块。 本发明的化学输送系统和方法可以用于各种应用中。 特别地，本发明可用于电子制造，光纤制造或半导体制造。

    System for purging high purity interfaces
    7.
    发明申请
    System for purging high purity interfaces 审中-公开
    清洗高纯度界面的系统

    公开(公告)号：US20070017596A1

    公开(公告)日：2007-01-25

    申请号：US11470687

    申请日：2006-09-07

    申请人： David Silva

    发明人： David Silva

    IPC分类号： B65B31/00

    CPC分类号： F17C13/00 ,  F17C2205/0146 ,  F17C2205/0323 ,  F17C2221/014 ,  F17C2221/017 ,  F17C2221/05 ,  F17C2223/043 ,  F17C2223/047 ,  F17C2227/0302 ,  F17C2227/0386 ,  F17C2227/044 ,  F17C2227/045 ,  F17C2270/0518

    摘要： In one embodiment, a system for purging high purity interfaces comprises a first manifold in flow communication with a high purity container and a second manifold. The first manifold comprises a first diaphragm valve connected to the container, to a first end of the second manifold and to sources of vacuum and vent. The first manifold further comprises a second diaphragm valve connected to the container and to second and third ends of the second manifold. A third diaphragm valve is interposed between the second diaphragm valve and the third end, and a fourth diaphragm valve is interposed between the first diaphragm valve and the sources of vacuum and vent.

    摘要翻译： 在一个实施例中，用于清洗高纯度界面的系统包括与高纯度容器和第二歧管流动连通的第一歧管。 第一歧管包括连接到容器的第一隔膜阀，第二歧管的第一端和真空源和通气孔。 第一歧管还包括连接到容器和第二歧管的第二和第三端的第二隔膜阀。 第三隔膜阀介于第二隔膜阀和第三端之间，第四隔膜阀介于第一隔膜阀和真空源和通气孔之间。

    Method and apparatus for handling of covering gas
    10.
    发明申请
    Method and apparatus for handling of covering gas 有权
    用于处理覆盖气体的方法和装置

    公开(公告)号：US20040200526A1

    公开(公告)日：2004-10-14

    申请号：US10482768

    申请日：2004-05-12

    发明人： Reidar Trefall ,  Kristian Utkilen

    IPC分类号： F04F001/18

    CPC分类号： F17C9/00 ,  B65D90/44 ,  F17C5/00 ,  F17C6/00 ,  F17C7/00 ,  F17C2221/033 ,  F17C2223/0161 ,  F17C2223/033 ,  F17C2227/0135 ,  F17C2227/0304 ,  F17C2227/045 ,  F17C2260/042 ,  F17C2260/053 ,  F17C2265/025 ,  F17C2270/0105 ,  Y10T137/0396 ,  Y10T137/3127 ,  Y10T137/313 ,  Y10T137/6579

    摘要： A method for the handling of covering gas or inert gas in connection with a tank that conveys crude oil, during successive discharging and loading operations of the tank, is disclosed. The method is characterised by the fact that covering gas/inert gas is re-circulated in an approximate closed circulation by the following steps: that during discharging of the tank, covering gas is produced in a recognised manner known per se from the cargo to fill the gradually increasing void space in the tank, and that when the tank is filled again with crude oil, the gas from the tank is extracted again, and it is compressed and absorbed into the stabilized crude oil. An apparatus is mentioned for accomplishing the method.

    摘要翻译： 公开了一种在连续卸载和加载操作期间处理与传送原油的罐相关的气体或惰性气体的处理方法。 该方法的特征在于，通过以下步骤在大致闭合的循环中重新循环覆盖气体/惰性气体：在排出罐中时，覆盖气体以已知的方式从货物填充到生产中 储罐中的空隙空间逐渐增大，当储罐再次用原油填充时，来自储罐的气体再次被提取，并被压缩并吸收到稳定的原油中。 提到了一种完成该方法的装置。