发明授权
US08261762B2 Processing gas supplying system and processing gas supplying method
有权
加工气体供应系统和加工气体供应方法
- 专利标题： Processing gas supplying system and processing gas supplying method
- 专利标题（中）： 加工气体供应系统和加工气体供应方法
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申请号： US12093491申请日： 2007-08-10
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公开(公告)号： US08261762B2公开(公告)日： 2012-09-11
- 发明人: Kiyoshi Komiyama , Akitoshi Tsuji , Takuya Fujiwara
- 申请人： Kiyoshi Komiyama , Akitoshi Tsuji , Takuya Fujiwara
- 申请人地址： JP Tokyo
- 专利权人： Tokyo Electron Limited
- 当前专利权人： Tokyo Electron Limited
- 当前专利权人地址： JP Tokyo
- 代理机构： Pearne & Gordon LLP
- 优先权： JP2006-251011 20060915
- 国际申请： PCT/JP2007/065709 WO 20070810
- 国际公布： WO2008/032516 WO 20080320
- 主分类号： H01L21/30
- IPC分类号： H01L21/30 ; B05C11/00
摘要：
A gas supplying system includes a processing gas supply pipe for supplying a processing gas from a gas cylinder 210 into a processing apparatus and a nonreactive gas supply source 230 for supplying a nonreactive gas into the gas supply pipe. While the system is in operation, the gas supply pipe is charged with the nonreactive gas and a control unit is in a standby state. If a processing gas use start signal is received from the processing apparatus, the system exhausts the nonreactive gas from the gas supply pipe to create a vacuum therein; charges the gas supply pipe with the processing gas; and starts a supply of the processing gas from the processing gas supply source. If a processing gas use finish signal is received from the processing apparatus, the system stops the supply of the processing gas from the processing gas supply source; exhausts the processing gas from the gas supply pipe to create a vacuum therein; and charges the gas supply pipe with the nonreactive gas. Accordingly, the gas pipe from the processing gas supply source to the processing apparatus can be kept charged with the nonreactive gas when the processing gas is not used in the processing apparatus. Therefore, a deposit generation inside the gas pipe can be prevented during that period.
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