公开(公告)号：US20210407760A1

公开(公告)日：2021-12-30

申请号：US17324301

申请日：2021-05-19

Applicant: JEOL Ltd.

Inventor： Shio En ,  Takashi Sato

IPC: H01J37/147 ,  H01J37/09 ,  B33Y30/00 ,  B33Y50/00 ,  B22F10/80 ,  B22F12/41 ,  B23K15/00 ,  B23K15/02

Abstract: A beam adjustment method includes: installing, on an irradiation surface to which an electron beam is radiated, a detection part having a Faraday cup catching electrical charges of the electron beam, and installing, on a side of an electron gun further than the detection part, a shielding plate having opening holes through which the electron beam is passable. The method includes causing, upon performing beam diameter measurement processing, the electron beam to pass through the opening holes, and radiating the electron beam to the Faraday cup. In addition, the method includes radiating, upon performing normal processing, the electron beam to the shielding plate.

公开(公告)号：US11177107B2

公开(公告)日：2021-11-16

申请号：US16841737

申请日：2020-04-07

Applicant: NuFlare Technology, Inc.

Inventor： Kazuhiro Kishi ,  Mitsuhiro Okazawa

IPC: H01J37/09 ,  H01J37/31 ,  H01J37/24 ,  H01J37/317 ,  H01J37/244

Abstract: Provided is a multi charged particle beam writing apparatus, including: an emission unit emitting a charged particle beam; a first aperture substrate having a plurality of first openings, the first aperture being irradiated with the charged particle beam, and the first aperture allowing a portion of the charged particle beam to pass through the plurality of first openings to form multiple beams; a second aperture substrate having a plurality of second openings through which each beam of the multiple beams passes and the second aperture substrate being capable of independently deflecting the each beam of the multiple beams; and a shielding plate provided so as to be insertable to a space between the first aperture substrate and the second aperture substrate and the shielding plate being capable of simultaneously shielding all the multiple beams.

公开(公告)号：US11158482B2

公开(公告)日：2021-10-26

申请号：US16993392

申请日：2020-08-14

Applicant: Carl Zeiss MultiSEM GmbH

Inventor： Dirk Zeidler ,  Stefan Schubert

IPC: H01J37/09 ,  H01J37/05 ,  H01J37/10 ,  H01J37/244 ,  H01J37/28

Abstract: A multi-beam particle microscope includes a multi-beam particle source, an objective lens, a detector arrangement, and a multi-aperture plate with a multiplicity of openings. The multi-aperture plate is between the objective lens and the object plane. The multi-aperture plate includes a multiplicity of converters which convert backscattered electrons which are generated by primary particle beams at an object into electrons with a lower energy, which provide electrons that form electron beams detected by the detector arrangement.

公开(公告)号：US11152202B2

公开(公告)日：2021-10-19

申请号：US17051891

申请日：2018-05-16

Applicant: SHIMADZU CORPORATION

Inventor： Tomoya Kudo ,  Daisuke Okumura

IPC: H01J49/40 ,  H01J37/16 ,  H01J37/09

Abstract: A transfer electrode unit (240) is configured by coaxially arranging a plurality of loop electrodes (241A, 241B, 241C), and guides ions to an orthogonal acceleration region (242C) by allowing the ions to pass through an inner side of the plurality of electrodes (241A, 241B, 241C) each of which is applied with a voltage. A voltage having a higher absolute value than the voltage applied to the plurality of electrodes (241A, 241B, 241C) is applied to a flight tube (246), and the ions accelerated in the orthogonal acceleration region (242C) are introduced to a flight space formed in the flight tube (246). A shield portion (241F) is provided between the transfer electrode unit (240) and the flight tube (246), and suppresses that an electric field derived from the voltage applied to the flight tube (246) enters the transfer electrode unit (240).

公开(公告)号：US20210265130A1

公开(公告)日：2021-08-26

申请号：US17252997

申请日：2018-06-22

Applicant: Hitachi High-Tech Corporation

Inventor： Asako KANEKO ,  Hisayuki TAKASU

IPC: H01J37/20 ,  H01J37/305 ,  H01J37/08 ,  H01J37/09 ,  H01J37/147

Abstract: An ion milling device capable of high-speed milling is realized even for a specimen containing a material having an imide bond. Therefore, the ion milling device includes: a vacuum chamber 6 configured to hold a specimen 3 in a vacuum atmosphere; an ion gun 1 configured to irradiate the specimen with a non-focused ion beam 2; a vaporization container 17 configured to store a mixed solution 13 of a water-soluble ionic liquid and water; and nozzles 11, 12 configured to supply water vapor obtained by vaporizing the mixed solution to a vicinity of a surface of the specimen processed by the ion beam.

公开(公告)号：US11075053B2

公开(公告)日：2021-07-27

申请号：US16667590

申请日：2019-10-29

Applicant: ASML Netherlands B.V.

Inventor： Shuai Li

IPC: H01J37/143 ,  H01J37/28 ,  H01J3/20 ,  H01J37/063 ,  H01J37/065 ,  H01J37/14 ,  H01J37/09

Abstract: This invention provides a charged particle source, which comprises an emitter and means for generating a magnetic field distribution. The magnetic field distribution is minimum, about zero, or preferred zero at the tip of the emitter, and along the optical axis is maximum away from the tip immediately. In a preferred embodiment, the magnetic field distribution is provided by dual magnetic lens which provides an anti-symmetric magnetic field at the tip, such that magnetic field at the tip is zero.

公开(公告)号：US20210142976A1

公开(公告)日：2021-05-13

申请号：US16676717

申请日：2019-11-07

Applicant: Applied Materials, Inc.

Inventor： Mehdi VAEZ-IRAVANI ,  Christopher Dennis BENCHER ,  Krishna SREERAMBHATLA ,  Hussein FAWAZ ,  Lior ENGEL ,  Robert PERLMUTTER

IPC: H01J37/20 ,  H01J37/317 ,  H01J37/21 ,  H01J37/147 ,  H01J37/09 ,  H01J37/04 ,  H01L21/027 ,  G03F7/20

Abstract: A method of method of operating a multibeamlet charged particle device is disclosed. In the method, a target attached to a stage is translated, and each step of selecting beamlets, initializing beamlets, and exposing the target is repeated. The step of selecting beamlets includes passing a reconfigurable plurality of selected beamlets through the blanking circuit. The step of initializing beamlets includes pointing each of the selected beamlets in an initial direction. The step of exposing the target includes scanning each of the selected beamlets from the initial direction to a final direction, and irradiating a plurality of regions of the target on the stage with the selected beamlets.

公开(公告)号：US10971326B2

公开(公告)日：2021-04-06

申请号：US16572114

申请日：2019-09-16

Applicant: FEI Company

Inventor： Ali Mohammadi-Gheidari ,  Peter Christiaan Tiemeijer ,  Erik Rene Kieft ,  Gerard Nicolaas Anne van Veen

IPC: H01J37/153 ,  H01J37/09 ,  H01J37/10 ,  H01J37/28 ,  H01J37/147 ,  H01J37/20

Abstract: A multi-electron beam imaging apparatus is disclosed herein. An example apparatus at least includes an electron source for producing a precursor electron beam, an aperture plate comprising an array of apertures for producing an array of electron beams from said precursor electron beam, an electron beam column for directing said array of electron beams onto a specimen, where the electron beam column is configured to have a length less than 300 mm, and where the electron beam column comprises a single individual beam crossover plane in which each of said electron beams forms an intermediate image of said electron source, and a single common beam crossover plane in which the electron beams in the array cross each other.

公开(公告)号：US10832889B2

公开(公告)日：2020-11-10

申请号：US16320525

申请日：2016-08-09

Applicant: Hitachi High-Technologies Corporation

Inventor： Asako Kaneko ,  Hisayuki Takasu ,  Toru Iwaya

IPC: H01J37/20 ,  H01J37/09 ,  H01J37/305 ,  H01J37/30

Abstract: A charged particle beam device that can improve machining position precision in section processing using a shielding plate is provided. The invention is directed to a charged particle beam device including: an ion source (101); a sample stand (106) on which a sample (107) is mounted; a shielding plate (108) placed so that a portion of the sample (107) is exposed when seen from the ion source (101); and tilt units (123, 124) that tilt the sample (107) and the shielding plate (108) relative to the irradiation direction of an ion beam (102) from the ion source (101) to the sample (107).

公开(公告)号：US10825643B2

公开(公告)日：2020-11-03

申请号：US16231672

申请日：2018-12-24

Applicant: Nuctech Company Limited

Inventor： Yaohong Liu ,  Liang Zhang ,  Xiaotong Zhang ,  Feng Gao

IPC: H01J37/09 ,  H01J37/32 ,  H01J37/065 ,  G01N33/20 ,  G01N33/24

Abstract: The present application discloses an accelerator system for mineral component analysis and system and method for mineral component analysis. The accelerator system includes an electron gun for generating an electron beam; an accelerating tube for accelerating an electron beam emitted by the electron gun to a predetermined energy; a composite target for generating a radioactive ray on the composite target after receiving bombardment of the electron beam; and a shielding mechanism for shielding the radioactive ray.