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公开(公告)号：US12046443B2
公开(公告)日：2024-07-23
申请号：US17532358
申请日：2021-11-22
Applicant: Applied Materials, Inc.
Inventor： Klaus Becker , Luigi G. Amato , Elvis Gomez , David Burgdorf , Victor Theriault , Thomas Stewart
IPC: H01J37/08 , H01J37/09 , H01J37/317
CPC classification number: H01J37/08 , H01J37/09 , H01J37/3171
Abstract: A Bernas ion source having a shield is disclosed. The shield is disposed between the distal portion of the filament and the first end of the chamber and serves to confine the plasma to the region between the shield and the second end of the chamber. The shield may be electrically connected to the negative leg of the filament so as to be the most negatively biased component in the chamber. In other embodiments, the shield may be electrically floating. In this embodiment, the shield may self-bias. The shield is typically made of a refractory metal. The use of the shield may reduce back heating of the filament by the plasma and reduce the possibility for thermal runaway. This may allow denser plasmas to be generated within the chamber.
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公开(公告)号：US20240242927A1
公开(公告)日：2024-07-18
申请号：US18562345
申请日：2022-05-24
Inventor： Toshihiko OGURA
Abstract: A sample holder for an impedance microscope according to an aspect includes: a first insulating film having a front surface and a back surface; a second insulating film having a front surface facing the back surface of the first insulating film and a back surface; a conductive film disposed on the front surface of the first insulating film; an electrode disposed to face the back surface of the second insulating film; and a conductive member fixed at a ground potential or a constant potential, in which the conductive member has an opening located between the first insulating film and the electrode.
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公开(公告)号：US20240208762A1
公开(公告)日：2024-06-27
申请号：US18536792
申请日：2023-12-12
Applicant: JEOL Ltd.
Inventor： Tsutomu Negishi , Munehiro Kozuka
CPC classification number: B65H35/002 , B65H59/06 , H01J37/09 , H01J37/3053
Abstract: There is provided a shield plate fabrication apparatus capable of fabricating a shield plate easily. The shield plate is included in a sample milling apparatus which mills a sample by shielding a part of the sample with the shield plate and irradiating the sample with a charged particle beam. The fabrication apparatus includes: a base plate holding shaft for rotatably holding a base plate and winding tape around the base plate; and a tension mechanism for applying tension to the tape while it is being wound around the base plate.
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134.发明授权公开(公告)号：US12020894B2
公开(公告)日：2024-06-25
申请号：US17324301
申请日：2021-05-19
Applicant: JEOL Ltd.
Inventor： Shio En , Takashi Sato
CPC classification number: H01J37/1474 , B22F10/80 , B22F12/41 , B23K15/002 , B23K15/0086 , B23K15/02 , B33Y30/00 , B33Y50/00 , H01J37/09
Abstract: A beam adjustment method includes: installing, on an irradiation surface to which an electron beam is radiated, a detection part having a Faraday cup catching electrical charges of the electron beam, and installing, on a side of an electron gun further than the detection part, a shielding plate having opening holes through which the electron beam is passable. The method includes causing, upon performing beam diameter measurement processing, the electron beam to pass through the opening holes, and radiating the electron beam to the Faraday cup. In addition, the method includes radiating, upon performing normal processing, the electron beam to the shielding plate.
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135.发明公开公开(公告)号：US20240136148A1
公开(公告)日：2024-04-25
申请号：US18461180
申请日：2023-09-04
Applicant: NuFlare Technology, Inc.
Inventor： Yasutaka SATO , Hironori MIZOGUCHI , Toru HINATA , Toshiki KIMURA , Kiminobu AKENO
IPC: H01J37/244 , H01J37/09 , H01J37/317
CPC classification number: H01J37/244 , H01J37/09 , H01J37/3174 , H01J2237/0451 , H01J2237/1501 , H01J2237/24564
Abstract: In one embodiment, a beam detector includes a first aperture plate including a first passage hole, a second aperture plate including a second passage hole that allows a single detection target beam passing through the first passage hole to pass therethrough, and a sensor detecting a beam current of the detection target beam passing through the second passage hole. The second aperture plate includes an electrically conductive material, a plurality of third passage holes are formed around the second passage hole, and the plurality of third passage holes allow light to pass therethrough.
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Patent Agency Ranking
公开(公告)号：US20230411109A1
公开(公告)日：2023-12-21
申请号：US17807362
申请日：2022-06-16
Applicant: FEI Company
Inventor： Sean M. Kellogg , Mostafa Maazouz , James B. McGinn
IPC: H01J37/09 , H01J37/244 , H01J37/22
CPC classification number: H01J37/09 , H01J37/244 , H01J37/226 , H01J2237/2443 , H01J2237/2445 , H01J2237/0458
Abstract: Variations in charged-particle-beam (CPB) source location are determined by scanning an alignment aperture that is fixed with respect to a beam defining aperture in a CPB, particularly at edges of a defocused CPB illumination disk. The alignment aperture is operable to transmit a CPB portion to a secondary emission surface that produces secondary emission directed to a scintillator element. Scintillation light produced in response is directed out of a vacuum enclosure associated with the CPB via a light guide to an external photodetection system.
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公开(公告)号：US11804360B2
公开(公告)日：2023-10-31
申请号：US17778758
申请日：2020-11-04
Applicant: NuFlare Technology, Inc.
Inventor： Tsubasa Nanao , Hirofumi Morita , Takanao Touya
IPC: H01J37/304 , H01J37/12 , H01J37/14 , H01J37/317 , H01J37/04 , G03F7/00 , H01J37/09
CPC classification number: H01J37/304 , G03F7/7005 , G03F7/7055 , G03F7/70383 , H01J37/12 , H01J37/14 , H01J37/3177 , H01J37/045 , H01J37/09 , H01J2237/0435
Abstract: The present invention quickly calculates values of optimal excitation parameters which are set in lenses in multiple stages. A multi charged particle beam adjustment method includes forming a multi charged particle beam, calculating, for each of lenses in two or more stages disposed corresponding to object lenses in two or more stages, a first rate of change and a second rate of change in response to change in at least an excitation parameter, the first rate of change being a rate of change in a demagnification level of a beam image of the multi charged particle beam, the second rate of change being a rate of change in a rotation level of the beam image, and calculating a first amount of correction to the excitation parameter of each of the lenses based on an amount of correction to the demagnification level and the rotation level of the beam image, the first rate of change, and the second rate of change.
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公开(公告)号：US11749493B2
公开(公告)日：2023-09-05
申请号：US17027291
申请日：2020-09-21
Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION
Inventor： Yoshihiro Koyama , Tatsuya Asahata , Masahiro Kiyohara , Tsunghan Yang
CPC classification number: H01J37/08 , H01J37/09 , H01J2237/0805 , H01J2237/31749
Abstract: A liquid metal ion source (50) includes: a reservoir (10) configured to hold an ion material (M) forming a liquid metal; a needle electrode (20); an extraction electrode (22) configured to cause an ion of the ion material to be emitted from a distal end of the needle electrode; a beam diaphragm (24), which is arranged on a downstream side of the extraction electrode, and is configured to limit a beam diameter of the ion; and a vacuum chamber (30) configured to accommodate and hold the reservoir, the needle electrode, the extraction electrode, and the beam diaphragm in vacuum, wherein the liquid metal ion source further includes an oxidizing gas introducing portion (40), and wherein the oxidizing gas introducing portion communicates to the vacuum chamber, and is configured to introduce an oxidizing gas into a periphery of the needle electrode.
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139.发明授权公开(公告)号：US11651933B1
公开(公告)日：2023-05-16
申请号：US17871095
申请日：2022-07-22
Applicant: Plansee USA LLC
Inventor： Nam Ngo , Gerhard Duerrhammer , Jacob Boyer , Florian Schaper , Dustin Hacker , Mason Payne , Surf Johnson , Andrew Dalager
IPC: H01J37/08 , H01J37/09 , H01J37/317
CPC classification number: H01J37/08 , H01J37/09 , H01J37/3171
Abstract: A cathode holding assembly to be mounted on an arc chamber support of an ion implanter includes a cathode holding plate, an insulator block, and a shield cap. The cathode holding plate has a protruding outer rib towards the shield cap and an opening with a protruding inner rib. A protrusion of the insulator block passes through the opening of the cathode holding plate. The insulator block abuts the protruding inner rib of the opening of the cathode holding plate at an edge of the insulator block to precisely fit the insulator block into the opening of the cathode holding plate. The shield cap is arranged to a side of the insulator block opposing the protrusion. A gap extends between the cathode holding plate and the shield cap, then between the cathode holding plate and the insulator block where it ends.
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140.发明公开公开(公告)号：US20230145411A1
公开(公告)日：2023-05-11
申请号：US18148588
申请日：2022-12-30
Applicant: NuFlare Technology, Inc.
Inventor： Shinji SUGIHARA
IPC: H01J37/22 , H01J37/244 , G01N23/2251 , G06T7/00 , G06T7/33
CPC classification number: H01J37/222 , H01J37/244 , G01N23/2251 , G06T7/001 , G06T7/337 , H01J2237/2617 , H01J37/09
Abstract: A pattern inspection apparatus includes an actual outline image generation circuit to generate an actual outline image of a predetermined region defined by a function, where the gray scale value of each pixel in the predetermined region including plural actual image outline positions on an actual image outline of a figure pattern in an inspection image is dependent on a distance from the center of a pixel concerned to the closest actual image outline position in the plural actual image outline positions, and a reference outline image generation circuit to generate a reference outline image of the predetermined region defined by the function, where a gray scale value of each pixel in the predetermined region is dependent on a distance from the center of a pixel concerned to the closest reference outline position in plural reference outline positions on a reference outline to be compared with the actual image outline.
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