公开(公告)号：US20150041672A1

公开(公告)日：2015-02-12

申请号：US14327900

申请日：2014-07-10

Applicant: NuFlare Technology, Inc.

Inventor： Takashi KAMIKUBO

IPC: H01J37/317

CPC classification number: H01J37/3177 ,  H01J37/045 ,  H01J2237/0435 ,  H01J2237/31798

Abstract: A multi charged particle beam writing apparatus includes a beam forming member, where first openings for writing and second openings not for writing around the first openings are formed, to form multiple beams for writing and to form multiple beams for measurement, plural mark members on a blanking aperture member arranged close to the height position where crossover is formed, a measurement unit to measure positions of the multiple beams for measurement by the plural mark members, and a correction unit to correct a voltage for making a “beam on” state applied to one of the plural blankers, in order to correct a position deviation amount of a measured position.

Abstract translation: 多带电粒子束写入装置包括一个波束形成构件，其中形成用于书写的第一开口和不用于围绕第一开口写入的第二开口，以形成用于书写的多个波束并形成多个用于测量的波束，多个标记构件 设置在靠近形成交叉的高度位置的消隐孔径部件，测量单元，用于测量由多个标记部件测量的多个光束的位置;以及校正单元，用于校正用于使“光束接通”状态施加的电压 为了校正测量位置的位置偏差量，多个消隐器之一。

公开(公告)号：US20150008331A1

公开(公告)日：2015-01-08

申请号：US14309452

申请日：2014-06-19

Applicant: Carl Zeiss SMT GmbH ,  Applied Materials Israel, Ltd.

Inventor： Thomas KEMEN ,  Rainer KNIPPELMEYER ,  Stefan SCHUBERT

IPC: H01J37/04 ,  H01J37/317

CPC classification number: H01J37/04 ,  H01J37/045 ,  H01J37/09 ,  H01J37/145 ,  H01J37/147 ,  H01J37/244 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/04922 ,  H01J2237/04924 ,  H01J2237/04926 ,  H01J2237/15 ,  H01J2237/2446 ,  H01J2237/2448 ,  H01J2237/2561 ,  H01J2237/2817 ,  H01J2237/31774

Abstract: The present invention relates to a charged particle system comprising: a charged particle source; a first multi aperture plate; a second multi aperture plate disposed downstream of the first multi aperture plate, the second multi aperture plate; a controller configured to selectively apply at least first and second voltage differences between the first and second multi aperture plates; wherein the charged particle source and the first and second multi aperture plates are arranged such that each of a plurality of charged particle beamlets traverses an aperture pair, said aperture pair comprising one aperture of the first multi aperture plate and one aperture of the second multi aperture plate, wherein plural aperture pairs are arranged such that a center of the aperture of the first multi aperture plate is, when seen in a direction of incidence of the charged particle beamlet traversing the aperture of the first multi aperture plate, displaced relative to a center of the aperture of the second multi aperture plate. The invention further pertains to a particle-optical component configured to change a divergence of a set of charged particle beamlets and a charged particle inspection method comprising inspection of an object using different numbers of charged particle beamlets.

Abstract translation: 带电粒子系统本发明涉及一种带电粒子系统，包括：带电粒子源; 第一个多孔板; 设置在所述第一多孔板的下游的第二多孔板，所述第二多孔板; 控制器，被配置为选择性地施加所述第一和第二多孔板之间的至少第一和第二电压差; 其中所述带电粒子源和所述第一和第二多孔径孔布置成使得多个带电粒子子束中的每一个穿过孔径对，所述孔径对包括所述第一多孔板的一个孔和所述第二多孔的一个孔 板，其中多个孔径对布置成使得当穿过穿过第一多孔板的孔的带电粒子束的入射方向从第一多孔板的孔的中心相对于中心位移时，第一多孔板的孔的中心 的第二多孔板的孔径。 本发明还涉及一种构造成改变一组带电粒子子束的发散度的粒子光学部件，以及包括使用不同数量的带电粒子子束检查物体的带电粒子检查方法。

公开(公告)号：US20150004807A1

公开(公告)日：2015-01-01

申请号：US14312908

申请日：2014-06-24

Applicant: CANON KABUSHIKI KAISHA

Inventor： Masato Muraki ,  Tomoyuki Morita

IPC: H01J37/317 ,  H01J37/04 ,  H01L21/263 ,  H01J37/244 ,  H01J37/30

CPC classification number: H01J37/3177 ,  H01J37/045 ,  H01J37/244 ,  H01J37/3007 ,  H01J37/3023 ,  H01J2237/31766

Abstract: A drawing apparatus for performing drawing on a substrate with a charged particle beam, includes: a controller configured to control a dose of the charge particle beam at each of a plurality of positions of the charged particle beam on the substrate based on information of displacement of each of the plurality of positions from a target position corresponding thereto and a target dose of the charged particle beam at the target position corresponding to each of the plurality of positions.

Abstract translation: 一种用于在具有带电粒子束的衬底上进行绘图的绘图装置，包括：控制器，其被配置为基于位移的信息来控制所述带电粒子束在所述衬底上的多个位置中的每一个处的剂量 从与其对应的目标位置的多个位置中的每个位置以及与所述多个位置中的每个位置对应的目标位置处的带电粒子束的目标剂量。

公开(公告)号：US20140367586A1

公开(公告)日：2014-12-18

申请号：US13920284

申请日：2013-06-18

Applicant: Jürgen FROSIEN ,  Benjamin John COOK

Inventor： Jürgen FROSIEN ,  Benjamin John COOK

IPC: H01J37/04

CPC classification number: H01J37/045 ,  H01J37/1478 ,  H01J37/153 ,  H01J37/263 ,  H01J2237/1534 ,  H01J2237/281 ,  H01J2237/2815

Abstract: A charged particle beam device is described. In one aspect, the charged particle beam device includes a charged particle beam source, and a switchable multi-aperture for generating two or more beam bundles from a charged particle beam which includes: two or more aperture openings, wherein each of the two or more aperture openings is provided for generating a corresponding beam bundle of the two or more beam bundles; a beam blanker arrangement configured for individually blanking the two or more beam bundles; and a stopping aperture for blocking beam bundles. The device further includes a control unit configured to control the individual blanking of the two or more beam bundles for switching of the switchable multi-aperture and an objective lens configured for focusing the two or more beam bundles on a specimen or wafer.

Abstract translation: 描述带电粒子束装置。 一方面，带电粒子束装置包括带电粒子束源和用于从带电粒子束产生两个或更多个束束的可切换多孔，其包括：两个或更多个孔口，其中两个或更多个 提供孔径开口以产生两个或更多束束的相应束束; 束消除器配置，其被配置为单独地消隐所述两个或更多个束束; 以及用于阻挡束束的止动孔。 该装置还包括控制单元，该控制单元被配置为控制用于切换可切换多孔的两个或更多束束的单独消隐，以及被配置用于将两束或更多束束聚焦在样本或晶片上的物镜。

公开(公告)号：US08890096B2

公开(公告)日：2014-11-18

申请号：US13935853

申请日：2013-07-05

Applicant: Hitachi High-Technologies Corporation

Inventor： Wen Li ,  Hisafumi Imura ,  Hajime Kawano ,  Hiroyuki Takahashi

IPC: H01J37/304 ,  B82Y40/00 ,  H01J37/04 ,  H01J37/26

CPC classification number: H01J37/265 ,  H01J37/045 ,  H01J2237/0432 ,  H01J2237/2485 ,  H01J2237/28

Abstract: Technique capable of achieving shortening of settling time, which is caused by ringing, etc. of a blanking control signal is provided. A measuring/inspecting apparatus is configured to have a main blanking unit and a correction blanking control unit as a high-speed switching control unit of an electron beam. During the period of switching of a main blanking control signal from ON to OFF, a correction blanking control signal is applied in real time in synchronization with the switching. The ringing caused by the main blanking are corrected so as to be cancelled out by that, the settling time is shortened as a result.

Abstract translation: 提供了能够实现由消隐控制信号的振铃等引起的建立时间缩短的技术。 测量/检查装置被配置为具有作为电子束的高速切换控制单元的主消隐单元和校正消隐控制单元。 在将主消隐控制信号从ON切换到OFF的时段期间，与切换同步地实时地施加校正消隐控制信号。 由主消隐引起的振铃被校正，从而被抵消，因此结算时间缩短。

公开(公告)号：US20140319367A1

公开(公告)日：2014-10-30

申请号：US14228415

申请日：2014-03-28

Applicant: CANON KABUSHIKI KAISHA

Inventor： Masato MURAKI ,  Yoshihiro HIRATA

IPC: H01J37/04 ,  H01J37/20 ,  H01J37/30 ,  H01J37/317

CPC classification number: H01J37/045 ,  H01J37/20 ,  H01J37/3177 ,  H01J2237/31761

Abstract: The present invention provides a drawing apparatus for performing drawing on a substrate with a charged particle beam, the apparatus including a controller configured to perform control of the drawing performed by movement of a stage and a blanking function of each of a plurality of charged particle optical systems, wherein the controller is configured to perform, with respect to a first charged particle optical system, of the plurality of charged particle optical systems, from a plurality of charged particle beams reach a first region and a second region, formed on the substrate and adjacent to each other, the control such that the drawing is performed only in one of the first and second regions with a first portion of charged particle beams of the plurality of charged particle beams with the stage moved in a second direction.

Abstract translation: 本发明提供了一种用于在带有带电粒子束的衬底上进行绘图的绘图装置，该装置包括控制器，该控制器被配置为执行通过舞台的移动和多个带电粒子光学中的每一个的消隐功能进行的绘图 系统，其中所述控制器被配置为针对所述多个带电粒子光学系统相对于第一带电粒子光学系统从多个带电粒子束到达形成在所述基板上的第一区域和第二区域，以及 彼此相邻的控制，使得仅在第一和第二区域之一中执行附图，其中多个带电粒子束的带电粒子束的第一部分在台沿第二方向移动。

公开(公告)号：US20140197326A1

公开(公告)日：2014-07-17

申请号：US14149478

申请日：2014-01-07

Applicant: NUFLARE TECHNOLOGY, INC.

Inventor： Takayuki OHNISHI

IPC: H01J37/147 ,  H01J37/317

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/045 ,  H01J2237/31776

Abstract: A charged particle beam writing method comprising, an irradiation step of irradiating a sample with a charged particle beam emitted from a charged particle source, a first blanking step of performing the blanking while the charged particle beam is moved in a first direction from a position of the charged particle beam in the irradiation step; and a second blanking step of performing the blanking the charged particle beam is moved in a second direction opposite to the first direction from the position of the charged particle beam in the irradiation step.

Abstract translation: 一种带电粒子束写入方法，包括：照射步骤，用于从带电粒子源发射的带电粒子束照射样品;第一冲裁步骤，当带电粒子束从第一方向移动时，进行消隐， 照射步骤中的带电粒子束; 并且进行消隐的第二消隐步骤，在照射步骤中，带电粒子束在与带电粒子束的位置相反的第二方向上移动。

公开(公告)号：US08729493B2

公开(公告)日：2014-05-20

申请号：US13294733

申请日：2011-11-11

Applicant: Shinji Ohishi

Inventor： Shinji Ohishi

IPC: G21K5/04

CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/045 ,  H01J37/24 ,  H01J2237/0435

Abstract: A drawing apparatus includes a plurality of charged particle optical elements that are sequentially passed through by a plurality of charged particle beams and performs drawing on a substrate with the charged particle beams. The apparatus further includes a deflector array which includes a plurality of deflectors disposed for respective one or more charged particle beams, each of which aligning corresponding one or more charged particle beams between two of the plurality of charged particle optical elements, a plurality of devices configured to respectively apply a plurality of potentials to the deflector array, and a connector configured to connect each of a plurality of electrodes included in the deflector array to one of the plurality of devices and connect electrodes, to which an equal potential is applied, to each other. Number of devices included in the plurality of devices is less than number of electrodes included in the deflector array.

Abstract translation: 拉伸装置包括多个带电粒子光学元件，其通过多个带电粒子束依次通过，并在带有带电粒子束的基板上进行拉伸。 该装置还包括偏转器阵列，该偏转器阵列包括为相应的一个或多个带电粒子束设置的多个偏转器，每个偏转器各自在多个带电粒子光学元件中的两个之间对准一个或多个带电粒子束，多个器件配置 分别将多个电位施加到偏转器阵列，以及连接器，被配置为将包括在偏转器阵列中的多个电极中的每一个连接到多个器件中的一个，并且将施加相等电位的电极连接到每个 其他。 包括在多个装置中的装置的数量小于包括在偏转器阵列中的电极的数量。

公开(公告)号：US20140124684A1

公开(公告)日：2014-05-08

申请号：US14066940

申请日：2013-10-30

Applicant: NuFlare Technology, Inc.

Inventor： Hiroshi MATSUMOTO ,  Tomohiro Iijima ,  Munehiro Ogasawara ,  Hideo Inoue ,  Ryoichi Yoshikawa

IPC: H01J37/317

CPC classification number: H01J37/045 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/0432 ,  H01J2237/0435 ,  H01J2237/31771 ,  H01J2237/31774

Abstract: A multi charged particle beam writing method includes performing ON/OFF switching of a beam by an individual blanking system for the beam concerned, for each beam in multi-beams of charged particle beam, with respect to each time irradiation of irradiation of a plurality of times, by using a plurality of individual blanking systems that respectively perform beam ON/OFF control of a corresponding beam in the multi-beams, and performing blanking control, in addition to the performing ON/OFF switching of the beam for the each beam by the individual blanking system, with respect to the each time irradiation of the irradiation of the plurality of times, so that the beam is in an ON state during an irradiation time corresponding to irradiation concerned, by using a common blanking system that collectively performs beam ON/OFF control for a whole of the multi-beams.

Abstract translation: 多带电粒子束写入方法包括：对于多束带电粒子束中的每个束，针对相关束的单个消隐系统，对于多个照射束的每次照射，执行光束的ON / OFF切换 次，通过使用多个单独的消隐系统，分别执行多光束中相应光束的光束ON / OFF控制，以及执行消隐控制，除了通过对每个光束的光束进行ON / OFF切换 单个消隐系统相对于每次照射多次照射，使得在对应于照射的照射时间期间光束处于ON状态，通过使用共同执行光束ON的公共消隐系统 / OFF控制整个多光束。

公开(公告)号：US20140057206A1

公开(公告)日：2014-02-27

申请号：US13949408

申请日：2013-07-24

Applicant: CANON KABUSHIKI KAISHA

Inventor： Kazuya KIKUCHI

IPC: H01J37/317

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/045 ,  H01J37/3177 ,  H01J2237/0437 ,  H01J2237/2482

Abstract: The present invention provides a drawing apparatus for performing drawing on a substrate with a plurality of charged particle beams, comprising a blanker array including a plurality of groups each including one light-emitting element and at least one blanker, and a plurality of transmission lines configured to transmit control signals to the plurality of groups, respectively, wherein each light-emitting element emits light when a signal is transmitted via a transmission line connected to a group including the light-emitting element out of the plurality of transmission lines.

Abstract translation: 本发明提供了一种用于在具有多个带电粒子束的基板上进行绘图的绘图装置，包括：包括多个组的消隐器阵列，每个组包括一个发光元件和至少一个消隐器;多个传输线配置 分别将控制信号发送到多个组，其中当通过连接到包括多个传输线中的发光元件的组的传输线发送信号时，每个发光元件发光。