公开(公告)号：US20160233052A1

公开(公告)日：2016-08-11

申请号：US14956860

申请日：2015-12-02

Applicant: NuFlare Technology, Inc.

Inventor： Satoru HIROSE ,  Takayuki OHNISHI

IPC: H01J37/304 ,  H01J37/317

CPC classification number: H01J37/304 ,  H01J37/045 ,  H01J37/147 ,  H01J37/3045 ,  H01J37/3174 ,  H01J37/3175 ,  H01J2237/3045 ,  H01J2237/31776

Abstract: In one embodiment, a charged particle beam drawing apparatus performs drawing by deflecting a charged particle beam with a deflector. A method for evaluating the apparatus includes making a shot of a first pattern, controlling a deflection amount by the deflector to move an applied position of the beam from the first pattern along a first direction to make a shot of a second pattern, controlling the deflection amount to move the applied position from the second pattern along the first direction to make a shot of a third pattern, controlling the deflection amount to move the applied position from the third pattern along a second direction opposite to the first direction to make a shot of a fourth pattern between the second pattern and the third pattern, calculating an interval between the second pattern and the fourth pattern, and comparing the calculated interval to a reference interval.

公开(公告)号：US20140197326A1

公开(公告)日：2014-07-17

申请号：US14149478

申请日：2014-01-07

Applicant: NUFLARE TECHNOLOGY, INC.

Inventor： Takayuki OHNISHI

IPC: H01J37/147 ,  H01J37/317

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/045 ,  H01J2237/31776

Abstract: A charged particle beam writing method comprising, an irradiation step of irradiating a sample with a charged particle beam emitted from a charged particle source, a first blanking step of performing the blanking while the charged particle beam is moved in a first direction from a position of the charged particle beam in the irradiation step; and a second blanking step of performing the blanking the charged particle beam is moved in a second direction opposite to the first direction from the position of the charged particle beam in the irradiation step.

Abstract translation: 一种带电粒子束写入方法，包括：照射步骤，用于从带电粒子源发射的带电粒子束照射样品;第一冲裁步骤，当带电粒子束从第一方向移动时，进行消隐， 照射步骤中的带电粒子束; 并且进行消隐的第二消隐步骤，在照射步骤中，带电粒子束在与带电粒子束的位置相反的第二方向上移动。

公开(公告)号：US20160365223A1

公开(公告)日：2016-12-15

申请号：US15247056

申请日：2016-08-25

Applicant: NuFlare Technology, Inc.

Inventor： Satoru HIROSE ,  Takayuki OHNISHI

IPC: H01J37/304 ,  H01J37/317

CPC classification number: H01J37/304 ,  H01J37/045 ,  H01J37/147 ,  H01J37/3045 ,  H01J37/3174 ,  H01J37/3175 ,  H01J2237/3045 ,  H01J2237/31776

Abstract: In one embodiment, a charged particle beam drawing apparatus performs drawing by deflecting a charged particle beam with a deflector. A method for evaluating the apparatus includes making a shot of a first pattern, controlling a deflection amount by the deflector to move an applied position of the beam from the first pattern along a first direction to make a shot of a second pattern, controlling the deflection amount to move the applied position from the second pattern along the first direction to make a shot of a third pattern, controlling the deflection amount to move the applied position from the third pattern along a second direction opposite to the first direction to make a shot of a fourth pattern between the second pattern and the third pattern, calculating an interval between the second pattern and the fourth pattern, and comparing the calculated interval to a reference interval.

Abstract translation: 在一个实施例中，带电粒子束描绘装置通过用偏转器偏转带电粒子束来执行绘图。 一种用于评估该装置的方法，包括进行第一图案的拍摄，通过偏转器控制偏转量，沿着第一方向移动来自第一图案的光束的施加位置，以进行第二图案的拍摄，控制偏转 用于将施加位置从第二图案沿着第一方向移动以进行第三图案的拍摄，控制偏转量以沿着与第一方向相反的第二方向从第三图案移动施加位置，以使 计算所述第二图案和所述第四图案之间的间隔，并将所计算的间隔与参考间隔进行比较。

公开(公告)号：US20160111253A1

公开(公告)日：2016-04-21

申请号：US14886434

申请日：2015-10-19

Applicant: NuFlare Technology, Inc.

Inventor： Takayuki OHNISHI ,  Hirohito ANZE

IPC: H01J37/317 ,  G03F7/16

CPC classification number: H01J37/3174 ,  G03F7/0035 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/091 ,  G03F7/11 ,  H01J2237/31752 ,  H01J2237/31754 ,  H01J2237/31769 ,  H01J2237/31796

Abstract: In a method for forming a resist film, a first resist film is formed on a light shielding film formed on a substrate, by using a spin coating method. A protective film is formed on the first resist film. The protective film and the first resist film are simultaneously removed at the same region to expose a portion of the light shielding film. A first region in which the second resist film is formed on the light shielding film and a second region in which the second resist film is formed on the first resist film through the protective film, are provided. The protective film and the second resist film are simultaneously removed in the second region to expose the first resist film. A region in which the first resist film, and a region in which the second resist film, is formed, are separately provided on the substrate.

Abstract translation: 在形成抗蚀剂膜的方法中，通过使用旋涂法在形成在基板上的遮光膜上形成第一抗蚀剂膜。 在第一抗蚀剂膜上形成保护膜。 在相同的区域同时去除保护膜和第一抗蚀剂膜以暴露一部分遮光膜。 提供了在遮光膜上形成第二抗蚀剂膜的第一区域和通过保护膜在第一抗蚀剂膜上形成第二抗蚀剂膜的第二区域。 在第二区域中同时去除保护膜和第二抗蚀剂膜以露出第一抗蚀剂膜。 其中第一抗蚀剂膜和其上形成有第二抗蚀剂膜的区域分开地设置在基板上的区域。

公开(公告)号：US20150228455A1

公开(公告)日：2015-08-13

申请号：US14607559

申请日：2015-01-28

Applicant: NuFlare Technology, Inc.

Inventor： Tomoo MOTOSUGI ,  Takayuki OHNISHI ,  Kaoru TSURUTA ,  Kenji OHTOSHI

IPC: H01J37/317 ,  H01J37/10 ,  H01J37/20 ,  H01J37/302 ,  H01J37/21

CPC classification number: H01J37/3174 ,  H01J37/10 ,  H01J37/20 ,  H01J37/21 ,  H01J37/3026 ,  H01J2237/006 ,  H01J2237/0492 ,  H01J2237/063 ,  H01J2237/103 ,  H01J2237/2007

Abstract: A charged particle beam writing apparatus includes an emission unit to emit a charged particle beam, a stage to mount thereon a target object to be written, an objective lens to focus the charged particle beam on a surface of the target object, a chamber to house the stage, a measurement unit to measure a partial pressure of a predetermined gas in the chamber in a state where a pressure inside the chamber is controlled to be lower than an atmospheric pressure, and an adjustment unit to adjust a focus position for focusing the charged particle beam on the target object, based on the partial pressure of the predetermined gas.

Abstract translation: 带电粒子束写入装置包括发射带电粒子束的发射单元，其上安装待写入的目标物体的载物台，将带电粒子束聚焦在目标物体的表面上的物镜， 该阶段是在室内的压力被控制为低于大气压力的状态下测量室内的预定气体的分压的测量单元，以及调节单元，用于调整聚焦位置以聚焦带电 基于预定气体的分压，靶物体上的粒子束。

公开(公告)号：US20140001380A1

公开(公告)日：2014-01-02

申请号：US13904434

申请日：2013-05-29

Applicant: NuFlare Technology, Inc.

Inventor： Takayuki OHNISHI

IPC: H01J37/317

CPC classification number: H01L21/027 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/40 ,  G03F1/78 ,  G03F7/20 ,  H01J37/20 ,  H01J37/3174 ,  H01J37/3175 ,  H01J2237/0044 ,  H01J2237/304

Abstract: A mask drawing method includes: disposing a grounding body provided with a grounding pin at a plurality of different places on a mask substrate to measure resistance values; disposing the grounding body at a position where the resistance value is lowest, among the plural positions where the resistance values are measured; and irradiating an electron beam to the mask substrate to draw a desired pattern.

Abstract translation: 掩模绘制方法包括：在掩模基板上的多个不同位置处设置设置有接地引脚的接地体，以测量电阻值; 在测量电阻值的多个位置之间将接地体设置在电阻值最低的位置; 并向掩模基板照射电子束以画出期望的图案。