THIN FILM DEPOSITION APPARATUS
    4.
    发明申请
    THIN FILM DEPOSITION APPARATUS 有权
    薄膜沉积装置

    公开(公告)号:US20150176131A1

    公开(公告)日:2015-06-25

    申请号:US14642360

    申请日:2015-03-09

    Abstract: A thin film deposition apparatus includes: a deposition source that discharges a deposition material; a deposition source nozzle unit disposed at a side of the deposition source and including a plurality of deposition source nozzles arranged in a first direction; a patterning slit sheet disposed opposite to the deposition source nozzle unit and including a plurality of patterning slits arranged in the first direction; a position detection member that detects a relative position of the substrate to the patterning slit sheet; and an alignment control member that controls a relative position of the patterning slit sheet to the substrate by using the relative position of the substrate detected by the position detection member, wherein the thin film deposition apparatus and the substrate are separated from each other, and the thin film deposition apparatus and the substrate are moved relative to each other.

    Abstract translation: 薄膜沉积设备包括:放电沉积材料的沉积源; 沉积源喷嘴单元,设置在沉积源的一侧,并且包括沿第一方向布置的多个沉积源喷嘴; 图案化缝隙片,与所述沉积源喷嘴单元相对设置并且包括沿所述第一方向布置的多个图案化狭缝; 位置检测构件,其检测所述基板与所述图案化缝隙片的相对位置; 以及对准控制部件,其通过使用由所述位置检测部件检测出的所述基板的相对位置来控制所述图案化狭缝片材与所述基板的相对位置,其中所述薄膜沉积设备和所述基板彼此分离, 薄膜沉积设备和基板相对于彼此移动。

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