公开(公告)号：US08890067B2

公开(公告)日：2014-11-18

申请号：US13905623

申请日：2013-05-30

Applicant: Samsung Display Co., Ltd.

Inventor： Young-Gil Park ,  Won-Bong Baek ,  Ki-Won Oh

IPC: H01J37/26 ,  H01J37/18 ,  H01J37/28 ,  H01J37/20

CPC classification number: H01J37/26 ,  H01J37/185 ,  H01J37/20 ,  H01J37/28 ,  H01J2237/24592 ,  H01J2237/2605

Abstract: An inspection system using a scanning electron microscope includes a scanning electron microscope chamber inspecting an object to be inspected by using an electron beam and maintaining a vacuum condition, a stage positioned below the scanning electron microscope chamber to be separated therefrom and mounted with the object to be inspected, and a transverse guide transferring the scanning electron microscope chamber on the stage. Atmospheric conditions are maintained between the scanning electron microscope chamber and the object to be inspected. Accordingly, object to be inspected a large size of an object to be inspected may be inspected without damage to the object to be inspected such that a cost reduction and a yield improvement may be realized.

Abstract translation: 使用扫描电子显微镜的检查系统包括扫描电子显微镜室，通过使用电子束检查待检查物体并保持真空状态，将位于扫描电子显微镜室下方的台与其分离并安装在该物体上 被检查，横向引导件将扫描电子显微镜室转移到平台上。 在扫描电子显微镜室和被检查物体之间保持大气条件。 因此，可以检查被检查物体的大小，而不会损害被检查物体，从而可以实现成本降低和产量提高。

公开(公告)号：US20140308445A1

公开(公告)日：2014-10-16

申请号：US14318086

申请日：2014-06-27

Applicant: Samsung Display Co., Ltd.

Inventor： Heung-Yeol Na ,  Ki-Yong Lee ,  Jin-Wook Seo ,  Min-Jae Jeong ,  Jong-Won Hong ,  Eu-Gene Kang ,  Seok-Rak Chang ,  Tae-Hoon Yang ,  Yun-Mo Chung ,  Byung-Soo So ,  Byoung-Keon Park ,  Ivan Maidanchuk ,  Dong-Hyun Lee ,  Kii-Won Lee ,  Won-Bong Baek ,  Jong-Ryuk Park ,  Bo-Kyung Choi ,  Jae-Wan Jung

IPC: C23C16/455 ,  C23C16/52

CPC classification number: C23C16/45525 ,  C23C16/4481 ,  C23C16/45544 ,  C23C16/52 ,  Y10T137/6416

Abstract: A deposition apparatus, and a canister for the deposition apparatus capable of maintaining a predetermined amount of source material contained in a reactive gas supplied to a deposition chamber when the source material is deposited on a substrate by atomic layer deposition includes a main body, a source storage configured to store a source material, a heater disposed outside the main body, and a first feed controller configured to control the source material supplied to the main body from the source storage.

Abstract translation: 当原料通过原子层沉积沉积在基板上时，沉积设备和用于沉积设备的罐能够保持供应到沉积室的反应气体中包含的预定量的源材料，包括主体，源 存储器，其被配置为存储源材料，设置在主体外部的加热器;以及第一馈送控制器，被配置为控制从源存储器供应到主体的源材料。