公开(公告)号：US09977330B2

公开(公告)日：2018-05-22

申请号：US14856094

申请日：2015-09-16

Applicant: SHIN-ETSU CHEMICAL CO., LTD.

Inventor： Seiichiro Tachibana ,  Daisuke Kori ,  Tsutomu Ogihara ,  Takeru Watanabe ,  Kazumi Noda ,  Toshiharu Yano

IPC: G03F7/11 ,  C08F216/10 ,  C08G61/12 ,  C09D129/02 ,  C09D165/00 ,  G03F7/20 ,  G03F7/32 ,  G03F7/40 ,  H01L21/027 ,  G03F7/09 ,  H01L21/308 ,  C07C43/23 ,  G03F7/075 ,  C07C39/17 ,  C08K5/13 ,  C09D7/12 ,  H01L21/02 ,  H01L27/12 ,  H01L21/311

CPC classification number: G03F7/094 ,  C07C39/17 ,  C07C43/23 ,  C07C2603/18 ,  C08F216/10 ,  C08G61/12 ,  C08K5/13 ,  C09D7/63 ,  C09D129/02 ,  C09D165/00 ,  G03F7/0752 ,  G03F7/091 ,  G03F7/11 ,  G03F7/20 ,  G03F7/32 ,  G03F7/40 ,  H01L21/02118 ,  H01L21/0214 ,  H01L21/02164 ,  H01L21/0217 ,  H01L21/02271 ,  H01L21/0228 ,  H01L21/02318 ,  H01L21/0271 ,  H01L21/0274 ,  H01L21/0276 ,  H01L21/308 ,  H01L21/3081 ,  H01L21/3086 ,  H01L21/31138 ,  H01L21/31144 ,  H01L27/1203

Abstract: The invention provides a compound for forming an organic film having a partial structure represented by the following formula (vii-2), wherein R1 represents a linear, branched or cyclic monovalent hydrocarbon group having 1 to 20 carbon atoms, and a methylene group constituting R1 may be substituted by an oxygen atom; a+b is 1, 2 or 3; c and d are each independently 0, 1 or 2; x represents 0 or 1, when x=0, then a=c=0; L7 represents a linear, branched or cyclic divalent organic group having 1 to 20 carbon atoms, L8′ represents the partial structure represented by the following formula (i), 0≤o

公开(公告)号：US20150253669A1

公开(公告)日：2015-09-10

申请号：US14431512

申请日：2013-10-01

Applicant: AZ ELECTRONIC MATERIALS MANUFACTURING (JAPAN) KK

Inventor： Kazuma Yamamoto ,  Masahiro Ishii ,  Takashi Sekito ,  Hiroshi Yanagita ,  Shigemasa Nakasugi ,  Go Noya

IPC: G03F7/16 ,  G03F7/038 ,  C09D137/00 ,  C09D129/02 ,  C09D133/14

CPC classification number: G03F7/168 ,  C08F12/24 ,  C08F20/30 ,  C08F220/26 ,  C08F220/30 ,  C09D129/02 ,  C09D133/14 ,  C09D137/00 ,  G03F7/0382 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/26 ,  G03F7/32 ,  G03F7/325 ,  G03F7/40 ,  G03F7/405 ,  H01L21/0274 ,  H01L21/0338

Abstract: The present invention provides a fine pattern-forming composition enabling to form a resist pattern having high dry etching resistance, and also provides a pattern formation method using that composition. This formation method hardly causes pipe blockages in the production process. The composition is used for miniaturizing a resist pattern by fattening in a process of forming a negative resist pattern from a chemically amplified resist composition, and comprises a polymer containing a repeating unit having a hydroxyaryl group and an organic solvent not dissolving the negative resist pattern. In the formation method, the fine pattern-forming composition and the resist composition are individually cast with the same coating apparatus, so as to prevent pipe blockages.

Abstract translation: 本发明提供能够形成具有高耐干蚀刻性的抗蚀剂图案的精细图案形成组合物，并且还提供使用该组合物的图案形成方法。 这种形成方法在生产过程中几乎不会导致管堵塞。 该组合物用于在从化学放大抗蚀剂组合物形成负性抗蚀剂图案的工艺中通过育肥来使抗蚀剂图案小型化，并且包含含有具有羟基芳基的重复单元的聚合物和不溶解负型抗蚀剂图案的有机溶剂。 在形成方法中，用相同的涂布装置分别铸造精细图案形成组合物和抗蚀剂组合物，以防止管堵塞。

公开(公告)号：US08198358B2

公开(公告)日：2012-06-12

申请号：US11792801

申请日：2005-12-06

Applicant: Yong Hwan Kim ,  Eun Suk An ,  Jeong Mi Kwon ,  Hyun Seong Jeong ,  Seung Yeong Park ,  Kee Hoon Won ,  Jae Kwang Song ,  Bong Keun Song ,  Jeong Yong Ryu

Inventor： Yong Hwan Kim ,  Eun Suk An ,  Jeong Mi Kwon ,  Hyun Seong Jeong ,  Seung Yeong Park ,  Kee Hoon Won ,  Jae Kwang Song ,  Bong Keun Song ,  Jeong Yong Ryu

IPC: C09D129/02 ,  C12P7/22 ,  C09J129/02

CPC classification number: C08G65/38 ,  B01J31/04 ,  B01J2531/72 ,  B01J2531/845 ,  C08G65/44

Abstract: The present invention relates to a process for preparing phenolic polymers utilizing Coprinus cinereus peroxidase. More particularly, the present invention relates to a process for preparing phenolic polymers by polymerizing phenolic monomers with Coprinus cinereus peroxidase instead of using typical peroxidase which essentially requires the use of toxic formalin or peroxidase of plant origin which is very costly and easily deactivated by hydrogen peroxide in the polymerization of phenolic monomers, wherein the polymerization is conducted in the presence of a polar organic solvent under mild reaction conditions of atmospheric temperature and pressure to economically produce desired phenolic polymers having excellent water and chemical resistances with high yield.

Abstract translation: 本发明涉及利用灰霉菌过氧化物酶制备酚类聚合物的方法。 更具体地说，本发明涉及通过将酚类单体与鬼马菌过氧化物酶聚合来制备酚类聚合物的方法，而不是使用典型的过氧化物酶，其基本上需要使用有毒的福尔马林或植物来源的过氧化物酶，其非常昂贵并且容易被过氧化氢 在酚醛单体的聚合中，其中聚合在极性有机溶剂的存在下，在大气温度和压力的温和反应条件下进行，从而以高产率经济地生产具有优异的耐水和耐化学性的所需酚醛聚合物。

公开(公告)号：US6028124A

公开(公告)日：2000-02-22

申请号：US199645

申请日：1998-11-25

Applicant: Shedric Oneal Glover ,  Chi-long Lee ,  Wen-hong Tong

Inventor： Shedric Oneal Glover ,  Chi-long Lee ,  Wen-hong Tong

IPC: C09D129/02 ,  C08F2/46 ,  C08F16/18 ,  C09D4/00

CPC classification number: C09D4/00

Abstract: This invention relates to a radiation curable compositions. More particularly this invention relates to radiation curable compositions comprising a vinyl ether compound which is free of silicon atoms, a cationic photoinitiator, a free radical photoinitiator, and dodecylphenol. The radiation curable compositions of this invention are useful for coating a thin layer film that has potential for many applications in the coating industry.

Abstract translation: 本发明涉及可辐射固化的组合物。 更具体地说，本发明涉及包含不含硅原子的乙烯基醚化合物，阳离子光引发剂，自由基光引发剂和十二烷基苯酚的可辐射固化组合物。 本发明的可辐射固化组合物可用于涂覆在涂料工业中具有许多应用潜力的薄层膜。

公开(公告)号：US09926457B2

公开(公告)日：2018-03-27

申请号：US14970690

申请日：2015-12-16

Applicant: Avery Dennison Corporation

Inventor： Kevin O. Henderson

IPC: B32B3/10 ,  C09D129/02 ,  C09D145/00 ,  C09D123/08 ,  C08L23/08

CPC classification number: C09D129/02 ,  C08L23/08 ,  C08L23/0815 ,  C08L23/0861 ,  C08L2203/16 ,  C09D123/0861 ,  C09D145/00 ,  C08L23/0876 ,  C08L53/02

Abstract: An inherently printable polymeric material is provided. The polymeric material includes a homogenous mixture of a thermoplastic polymer with a Tg of about 30-80° C., a cyclic olefin copolymer, an ionomer of ethylene and methacrylic acid, and a thermoplastic rubber. The polymeric material can be printed without requiring printing receptive layers or treatments. The polymeric material can be thermoformed, yet retains its printability even after thermoforming.

公开(公告)号：US09631793B2

公开(公告)日：2017-04-25

申请号：US14409026

申请日：2013-07-05

Applicant: PHILIPS LIGHTING HOLDING B.V.

Inventor： Rifat Ata Mustafa Hikmet ,  Ties Van Bommel ,  René Theodorus Wegh ,  Paulus Albertus Van Hal

IPC: F21V9/16 ,  C09D127/08 ,  C09D169/00 ,  B82Y30/00 ,  F21S8/06 ,  F21V3/04 ,  H01J1/63 ,  H01J1/68 ,  C09D127/16 ,  C09D129/02 ,  C09D167/02 ,  C09D177/06 ,  F21K9/232 ,  F21K9/27 ,  F21K9/64 ,  H01L33/50 ,  F21Y101/00

CPC classification number: F21V9/16 ,  B82Y30/00 ,  C09D127/08 ,  C09D127/16 ,  C09D129/02 ,  C09D167/02 ,  C09D169/00 ,  C09D177/06 ,  F21K9/232 ,  F21K9/27 ,  F21K9/64 ,  F21S8/06 ,  F21V3/12 ,  F21V9/30 ,  F21Y2101/00 ,  F21Y2115/10 ,  H01J1/63 ,  H01J1/68 ,  H01L33/505 ,  Y10T428/31507 ,  Y10T428/3154 ,  Y10T428/31725 ,  Y10T428/31786 ,  Y10T428/31855 ,  Y10T428/31935

Abstract: A stack of layers 100, a lamp, a luminaire and a method of manufacturing a stack of layers is disclosed. The stack of layers 100 comprises a first outer layer 102, a second outer layer 106 and a luminescent layer 104. The first outer layer 102 and the second outer layer 106 are of a light transmitting polymeric material and have an oxygen transmission rate lower than 30 cm3/(m2-day) measured under standard temperature and pressure (STP). The luminescent layer 104 is sandwiched between the first outer layer 102 and the second outer layer 106 and comprises a light transmitting matrix polymer and a luminescent material 108 being configured to absorb light according to an absorption spectrum and convert a portion of the absorbed light towards light of a light emission spectrum.

公开(公告)号：US09309431B2

公开(公告)日：2016-04-12

申请号：US14126147

申请日：2012-06-12

Applicant: Yuta Taoka ,  Shinsuke Nii ,  Masato Nakamae

Inventor： Yuta Taoka ,  Shinsuke Nii ,  Masato Nakamae

IPC: C09D129/02 ,  C09J7/04 ,  C08F18/04 ,  C08L43/04 ,  B41M5/52 ,  C08F230/08 ,  C09D129/04 ,  D21H27/00 ,  D21H17/36 ,  D21H19/20 ,  D21H19/60 ,  C09D143/04 ,  C08F218/08 ,  B41M5/44 ,  B41M5/50 ,  D21H21/16 ,  B41M5/337

CPC classification number: C09D129/02 ,  B41M5/3372 ,  B41M5/44 ,  B41M5/443 ,  B41M5/506 ,  B41M5/5254 ,  B41M5/529 ,  B41M2205/04 ,  B41M2205/38 ,  B41M2205/40 ,  C08F218/08 ,  C08F230/08 ,  C09D129/04 ,  C09D143/04 ,  C09J7/205 ,  C09J7/21 ,  D21H17/36 ,  D21H19/20 ,  D21H19/60 ,  D21H21/16 ,  D21H27/001 ,  Y10T428/2839 ,  Y10T428/31895

Abstract: Provided is a vinyl alcohol polymer that provides a coating film having superior water resistance and binder performances, and has sufficient solubility in water and viscosity stability even in a neutral pH region. Further provided are an aqueous solution, a coating agent, an ink jet recording material, a thermal recording material and a base paper for a release paper that comprise the vinyl alcohol polymer, and a method for producing same, and the like. The vinyl alcohol polymer includes a monomer unit represented by the following formula (1), with the following inequality (I) being satisfied. Preferably, the following inequalities (II) and (III) are further satisfied according to the PVA: wherein, P represents the viscosity average degree of polymerization; and S represents the content (mol %) of the monomer unit.

Abstract translation: 提供一种乙烯醇聚合物，其提供具有优异的耐水性和粘合剂性能的涂膜，并且即使在中性pH区域中也具有足够的溶解性和粘度稳定性。 还提供了包含乙烯醇聚合物的脱模纸的水溶液，涂布剂，喷墨记录材料，热敏记录材料和原纸，及其制造方法等。 乙烯醇聚合物包括由下式（1）表示的单体单元，其满足以下不等式（I）。 优选地，根据PVA进一步满足以下不等式（II）和（III）：其中P表示粘度平均聚合度; S表示单体单元的含量（mol％）。

公开(公告)号：US08940822B2

公开(公告)日：2015-01-27

申请号：US13862511

申请日：2013-04-15

Applicant: BASF Coatings GmbH

Inventor： Timothy S. December ,  William Merritt

IPC: C04B24/22 ,  C09D129/02 ,  C09D5/00 ,  C09D133/06 ,  C09J133/06 ,  C08L23/28

CPC classification number: C09D129/02 ,  C08J7/047 ,  C08J2323/04 ,  C08J2323/10 ,  C08J2323/16 ,  C08J2423/00 ,  C08J2433/00 ,  C08J2433/04 ,  C08L23/283 ,  C08L2666/02 ,  C09D5/002 ,  C09D133/06 ,  C09J133/066

Abstract: A method of improving the transfer efficiency of applying a topcoat layer to a primed component includes applying an organic solventborne, carboxyl functional olefin based polymer composition to a substrate to provide a primed component before electrostatically applying a coating composition comprising principal resin and crosslinker to the primed component to form a topcoat layer, wherein the carboxyl functional olefin based polymer is neutralized with at least one amine-containing compound to form a salted carboxyl functional polymer.

Abstract translation: 提高将底涂层施加到底漆组分的转印效率的方法包括将有机溶剂型羧基官能烯烃基聚合物组合物施加到基材上以在将包含主要树脂和交联剂的涂料组合物静电施涂到涂有底漆 组分以形成面漆层，其中用至少一种含胺化合物中和羧基官能烯烃基聚合物以形成盐化的羧基官能聚合物。

公开(公告)号：US20130143163A1

公开(公告)日：2013-06-06

申请号：US13706825

申请日：2012-12-06

Applicant: SHIN-ETSU CHEMICAL CO., LTD.

Inventor： Jun Hatakeyama

IPC: C09D145/00 ,  G03F7/20 ,  C09D129/02 ,  C08F232/08 ,  C08F216/10

CPC classification number: C09D145/00 ,  C08F216/10 ,  C08F220/18 ,  C08F232/08 ,  C08F2220/283 ,  C09D125/18 ,  C09D129/02 ,  G03F7/11 ,  G03F7/20

Abstract: A pattern is printed by forming a photoresist layer on a wafer, forming a protective film thereon, exposure, and development. The protective film is formed from a composition comprising a copolymer of hydroxystyrene with acenaphthylene and/or vinylnaphthalene and a mixture of an alcohol solvent and an ether or aromatic solvent.

Abstract translation: 通过在晶片上形成光致抗蚀剂层，在其上形成保护膜，曝光和显影来印刷图案。 保护膜由包含羟基苯乙烯与苊烯和/或乙烯基萘的共聚物以及醇溶剂和醚或芳族溶剂的混合物的组合物形成。

公开(公告)号：US10007183B2

公开(公告)日：2018-06-26

申请号：US14856014

申请日：2015-09-16

Applicant: SHIN-ETSU CHEMICAL CO., LTD.

Inventor： Seiichiro Tachibana ,  Daisuke Kori ,  Tsutomu Ogihara ,  Takeru Watanabe ,  Kazumi Noda ,  Toshiharu Yano

IPC: G03F7/11 ,  G03F7/40 ,  G03F7/09 ,  H01L21/308 ,  C07C43/23 ,  G03F7/075 ,  C08F216/10 ,  C08G61/12 ,  C09D129/02 ,  C09D165/00 ,  G03F7/20 ,  G03F7/32 ,  C07C39/17 ,  C08K5/13 ,  H01L21/02 ,  H01L27/12 ,  H01L21/311 ,  H01L21/027

CPC classification number: G03F7/094 ,  C07C39/17 ,  C07C43/23 ,  C07C2603/18 ,  C08F216/10 ,  C08G61/12 ,  C08K5/13 ,  C09D7/63 ,  C09D129/02 ,  C09D165/00 ,  G03F7/0752 ,  G03F7/091 ,  G03F7/11 ,  G03F7/20 ,  G03F7/32 ,  G03F7/40 ,  H01L21/02118 ,  H01L21/0214 ,  H01L21/02164 ,  H01L21/0217 ,  H01L21/02271 ,  H01L21/0228 ,  H01L21/02318 ,  H01L21/0271 ,  H01L21/0274 ,  H01L21/0276 ,  H01L21/308 ,  H01L21/3081 ,  H01L21/3086 ,  H01L21/31138 ,  H01L21/31144 ,  H01L27/1203

Abstract: The invention provides a compound for forming an organic film having a partial structure represented by the following formula (ii), wherein the ring structures Ar1, Ar2 and Ar3 each represent a substituted or unsubstituted benzene ring or naphthalene ring; e is 0 or 1; R0 represents a hydrogen atom or a linear, branched or cyclic monovalent organic group having 1 to 30 carbon atoms; L0 represents a linear, branched or cyclic divalent organic group having 1 to 32 carbon atoms; and the methylene group constituting L0 may be substituted by an oxygen atom or a carbonyl group. There can be provided an organic film composition for forming an organic film having high dry etching resistance as well as advanced filling/planarizing characteristics.