公开(公告)号：US20240359394A1

公开(公告)日：2024-10-31

申请号：US18769521

申请日：2024-07-11

申请人： CANON KABUSHIKI KAISHA

发明人： Toshihiko Nishida

IPC分类号： B29C59/02 ,  B29C31/04 ,  B29C59/00 ,  B29L31/34 ,  G03F7/00

CPC分类号： B29C59/026 ,  B29C31/048 ,  B29C59/002 ,  B29L2031/34 ,  G03F7/0002

摘要： The present invention provides an imprint apparatus that forms a pattern of an imprint material on a substrate using a mold, the apparatus comprising: a supplier configured to supply the imprint material as a plurality of droplets onto the substrate; and a controller configured to control the supplier based on information indicating a target arrangement of the imprint material to be supplied as the plurality of droplets onto a predetermined region of the substrate, wherein the plurality of droplets in the target arrangement include a first droplet group including a plurality of first droplet arrays, a second droplet group including a plurality of second droplet arrays, and a third droplet array.

公开(公告)号：US20240359393A1

公开(公告)日：2024-10-31

申请号：US18507926

申请日：2023-11-13

申请人： Poly-America, L.P.

发明人： Brad A. Cobler ,  Michael A. Ross

IPC分类号： B29C59/02 ,  B65F1/00

CPC分类号： B29C59/022 ,  B65F1/0006 ,  B65F2250/114

摘要： The present invention relates to thermoplastic film having improved tear resistance, puncture resistance, and enhanced control of the film's elongation when subject to an applied load. The film can have an emboss pattern comprising a plurality of embossed regions, each embossed region comprising a plurality of closely spaced, non-intersecting sinusoidal shaped embosses. A sinusoidal emboss of an embossed region can be divided into three sections, wherein for each section along the emboss, the cross and machine orientation of the film can vary due to formation of the emboss. The emboss pattern can be arranged into various sections, wherein the amplitudes of the sinusoidal embosses of an embossed region can vary from one section of the pattern to another. The overall geometric shape of the embossed regions can also vary from one emboss region to another.

公开(公告)号：US12129392B2

公开(公告)日：2024-10-29

申请号：US17627051

申请日：2020-07-13

申请人： NAGASE CHEMTEX CORPORATION

发明人： Yuki Sugiura ,  Yohei Uetsuki

IPC分类号： C09D183/04 ,  C08K3/22 ,  C08K5/5419 ,  C08L83/04 ,  B29C59/02 ,  B29K83/00 ,  B29K105/16 ,  B29K509/02

CPC分类号： C09D183/04 ,  C08K3/22 ,  C08K5/5419 ,  C08L83/04 ,  B29C59/022 ,  B29K2083/00 ,  B29K2105/162 ,  B29K2509/02 ,  B29K2995/0088 ,  C08K2003/2237 ,  C08K2003/2244

摘要： Provided is a resin composition for imprinting excellent in imprint properties and optical properties such as high refractive index and low haze. The invention relates to a resin composition for imprinting containing: (A) a polysiloxane resin represented by the following formula (1): (R1SiO3/2)a(R22SiO2/2)b(R33SiO1/2)c(SiO4/2)d wherein R1, R2, and R3 are each independently a hydrogen atom, a hydroxy group, an alkoxy group, a C1-C12 hydrocarbon group, or a C1-C12 substituent having one or more crosslinkable functional groups, with at least one of R1, R2, or R3 being a C1-C12 substituent having one or more crosslinkable functional groups, and when a plurality of R1s, R2s, or R3s are present, they may be different from one another; and a, b, c, and d are numbers satisfying the following conditions: 0.001≤a≤1.00, 0≤b≤0.999, 0≤c≤0.30, 0≤d≤0.30, and a+b+c+d=1.0; and (B) a fine particulate inorganic oxide, wherein the ratio by weight of the sum of the polysiloxane resin (A) and optionally an alkoxysilane compound and a curable resin to the fine particulate inorganic oxide (B) is 0.2 to 2.5.

公开(公告)号：US12122586B2

公开(公告)日：2024-10-22

申请号：US17957832

申请日：2022-09-30

申请人： YETI Coolers, LLC

发明人： Roy Joseph Seiders ,  Christopher M. Keller

IPC分类号： A45C3/00 ,  A45C11/20 ,  A45C13/00 ,  A45C13/10 ,  A45C13/26 ,  A45C13/30 ,  B29C59/02 ,  B29C65/00 ,  B29C65/02 ,  B29C65/56 ,  B29C65/72 ,  B32B37/14 ,  B32B37/18 ,  B65D25/18 ,  B65D25/20 ,  B65D25/28 ,  B65D81/38 ,  F25D3/08

CPC分类号： B65D81/389 ,  A45C3/00 ,  A45C3/001 ,  A45C11/20 ,  A45C13/008 ,  A45C13/103 ,  A45C13/26 ,  A45C13/30 ,  B65D25/18 ,  B65D25/205 ,  B65D81/3858 ,  B29C59/02 ,  B29C65/02 ,  B29C65/562 ,  B29C65/72 ,  B29C66/43 ,  B29C66/4322 ,  B29C66/4326 ,  B32B37/142 ,  B32B37/185 ,  B65D25/2873 ,  F25D3/08 ,  F25D2331/801 ,  Y10T29/49826 ,  Y10T29/49828

摘要： An apparatus may include a shell defining a first side and a second side, a storage compartment, an opening configured to provide access to the storage compartment, the opening including a closure device, a first carry strap and a second carry strap, a plurality of reinforcement patches in which the first carry strap and the second carry strap are connected to a portion of the plurality of reinforcement patches, a base, and a strip along a bottom of the apparatus configured to provide reinforcement.

公开(公告)号：US20240344993A1

公开(公告)日：2024-10-17

申请号：US18523814

申请日：2023-11-29

申请人： The Trustees of Princeton University

发明人： Stephen Y. CHOU ,  Fei DING

IPC分类号： G01N21/65 ,  B29C33/42 ,  B29C33/56 ,  B29C37/00 ,  B29C59/02 ,  G01N21/64 ,  G03F7/00

CPC分类号： G01N21/658 ,  B29C33/56 ,  B29C37/0003 ,  B29C59/02 ,  B29C59/026 ,  G01N21/648 ,  G01N21/6486 ,  G03F7/0002 ,  B29C33/424 ,  B29C2059/023 ,  B29K2995/0005

摘要： Some embodiments of the invention provide methods that can create large area complex patterns for nanoimprint molds without or with very litter of the use of the charged beam or photon beam direct-writing of nanostructures. Some embodiments of the invention use (i) Fourier nanoimprint patterning (FNP), (ii) edge-guided nanopatterning (EGN), and (iii) nanostructure self-perfection, and their combinations.

公开(公告)号：US20240336003A1

公开(公告)日：2024-10-10

申请号：US18619870

申请日：2024-03-28

申请人： CANON KABUSHIKI KAISHA

发明人： NAOKI MURASATO

IPC分类号： B29C59/02 ,  B29C33/34 ,  B29C33/42 ,  B29C59/00

CPC分类号： B29C59/022 ,  B29C33/34 ,  B29C33/424 ,  B29C59/002

摘要： An imprint apparatus performing imprint processing for molding an imprint material on a substrate using a mold includes a shape correction mechanism configured to correct a shape of the mold using a plurality of contact portions for applying a force to side surfaces of the mold, a detection unit configured to detect contact states of the plurality of contact portions, and a control unit configured to perform a stabilizing operation of moving the mold toward a stable position by adjusting drive timings of the plurality of contact portions in accordance with an output of the detection unit.

公开(公告)号：US12109752B2

公开(公告)日：2024-10-08

申请号：US17484492

申请日：2021-09-24

申请人： FUJIFILM Corporation

发明人： Akihiro Hakamata ,  Naoya Shimoju ,  Yuichiro Goto

IPC分类号： B29C59/02 ,  C08F2/50 ,  C08F220/10 ,  G03F7/00 ,  G03F7/004 ,  G03F7/20

CPC分类号： B29C59/02 ,  C08F2/50 ,  C08F220/10 ,  G03F7/0002 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/2004 ,  G03F7/2018

摘要： A composition for forming an underlayer film in an imprinting method, which includes a high-molecular-weight compound having a polymerizable functional group and a monomer having a plurality of crosslinking functional groups capable of being bonded to the polymerizable functional group, and in which a Hansen solubility parameter distance, which is a difference between a Hansen solubility parameter of the high-molecular-weight compound and a Hansen solubility parameter of the monomer, is 5.0 or less, and regarding the two crosslinking functional groups among the plurality of crosslinking functional groups, the number of atoms, which constitute a shortest atom chain mutually linking crosslinking points in the respective crosslinking functional groups, is 7 or more; a laminate including a layer formed of the composition for forming an underlayer film; and a method for manufacturing a semiconductor element, in which a semiconductor element is manufactured using a pattern obtained by a pattern producing method.

公开(公告)号：US20240326297A1

公开(公告)日：2024-10-03

申请号：US18693438

申请日：2022-09-22

申请人： COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES

发明人： Hubert TEYSSEDRE ,  Nicolas POSSEME ,  Stefan LANDIS

IPC分类号： B29C33/38 ,  B29C59/02

CPC分类号： B29C33/3842 ,  B29C59/02

摘要： A method for manufacturing a mould for nanoprinting and the associated mould, includes providing a substrate having a layer, and at least one ion implantation configured so as to obtain in the layer, at least one first non-implanted portion or portion having a first implantation, at least one second portion having a second implantation, and a third non-implanted portion distinct from the first portion. After implantation, the method includes etching the layer configured so as to have a different etching speed between at least the second portion and the third portion, so as to etch through the openings of an etching mask, a plurality of patterns of different heights being included in the layer.

公开(公告)号：US12083779B2

公开(公告)日：2024-09-10

申请号：US16642528

申请日：2018-02-28

申请人： Kimberly-Clark Worldwide, Inc.

发明人： Jose Augusto Vidal De Siqueira ,  Michael R. Vaughan

IPC分类号： B32B3/26 ,  A61F13/15 ,  A61F13/49 ,  B29C55/18 ,  B29C59/02 ,  B29C59/04 ,  B29C65/00 ,  B29C65/02 ,  B32B3/30 ,  B32B5/02 ,  B32B7/022 ,  B32B7/05 ,  B32B7/12 ,  B32B25/08 ,  B32B25/10 ,  B32B27/02 ,  B32B27/12 ,  B32B27/32 ,  B32B37/00 ,  B32B38/18 ,  A61L15/24 ,  B32B3/08 ,  B32B5/14 ,  B32B5/26 ,  B32B7/04 ,  B32B25/14 ,  B32B27/08 ,  B32B27/30 ,  B32B37/04 ,  B32B37/14 ,  B32B38/00

CPC分类号： B32B3/266 ,  A61F13/15203 ,  A61F13/49019 ,  A61F13/4902 ,  B29C55/18 ,  B29C59/02 ,  B29C59/04 ,  B29C65/00 ,  B29C65/02 ,  B32B3/26 ,  B32B3/30 ,  B32B5/022 ,  B32B7/022 ,  B32B7/05 ,  B32B7/12 ,  B32B25/08 ,  B32B25/10 ,  B32B27/02 ,  B32B27/12 ,  B32B27/32 ,  B32B37/0053 ,  B32B38/1808 ,  A61F2013/15406 ,  A61F2013/15552 ,  A61F2013/49023 ,  A61F2013/49025 ,  A61F2013/49093 ,  A61L15/24 ,  B32B3/085 ,  B32B5/02 ,  B32B5/142 ,  B32B5/147 ,  B32B5/266 ,  B32B7/04 ,  B32B25/14 ,  B32B27/08 ,  B32B27/302 ,  B32B37/0076 ,  B32B2037/0092 ,  B32B37/04 ,  B32B37/14 ,  B32B2038/0028 ,  B32B2250/02 ,  B32B2250/03 ,  B32B2250/242 ,  B32B2250/246 ,  B32B2250/40 ,  B32B2262/0253 ,  B32B2274/00 ,  B32B2305/18 ,  B32B2307/51 ,  B32B2307/54 ,  B32B2307/718 ,  B32B2307/724 ,  B32B2307/726 ,  B32B2307/7265 ,  B32B2309/02 ,  B32B2323/04 ,  B32B2323/10 ,  B32B2325/00 ,  B32B2555/02 ,  Y10T428/24298 ,  Y10T428/24322 ,  Y10T428/24331 ,  Y10T428/24446 ,  Y10T428/2457 ,  Y10T428/24942 ,  Y10T428/24992 ,  Y10T428/27 ,  Y10T442/659 ,  Y10T442/678 ,  Y10T442/679

摘要： An elastic laminate is provided including outer facing layers of a fabric and, located between the outer facing layers, a series of individual, spaced apart strips of elastic film extending continuously along the direction of elasticity. The film strips are formed by a controlled tearing of a continuous film while the film is biaxially stretched and bonded to the fabric facings. The fabric facings have gathers formed therein that allow the elastic laminate to stretch at least to the extent that the gathers can be pulled flat.

公开(公告)号：US12076910B2

公开(公告)日：2024-09-03

申请号：US17726000

申请日：2022-04-21

申请人： CANON KABUSHIKI KAISHA

发明人： Takahiro Sato

IPC分类号： G03F7/00 ,  B29C59/00 ,  B29C59/02 ,  B29C37/00

CPC分类号： B29C59/026 ,  B29C59/002 ,  G03F7/0002 ,  B29C2037/90

摘要： A forming apparatus forms a formable material using a mold including a contact region to be brought into contact with the formable material on a substrate. The apparatus includes a controller configured to perform processing of bringing the contact region and the formable material on the substrate into contact with each other. The controller controls the processing so as to bring the mold and the substrate close to each other at a first relative speed and then bring the mold and the substrate close to each other at a second relative speed lower than the first relative speed, and controls switching from the first relative speed to the second relative speed so as to compensate a manufacturing error of the mold.