Abstract:
A scanning electron microscope has means for generating a beam of electrons which is scanned over a specimen held within a holder in a chamber which contains a gaseous medium. A negative potential is applied to the holder so as to generate an electric field which accelerates secondary electrons, formed by the interaction or the primary beam with the specimen, in a direction away from the specimen surface and into a collision zone in the chamber. In that zone, the accelerated secondary electrons collide with gas molecules of the gaseous medium, thereby initiating a cascade of collisions which, in effect, amplifies the secondary electron signal. That signal (which may take the form of photons generated as a result of the collisions) is detected by detecting means, such as a photo-multiplier.
Abstract:
A scanning electron microscope suitable for imaging samples in a non-vacuum environment, the scanning electron microscope including an electron source located within an enclosure maintained under vacuum, an electron permeable membrane disposed at an opening of the enclosure separating an environment within the enclosure which is maintained under vacuum and an environment outside the enclosure which is not maintained under vacuum, the electron permeable membrane not being electrically grounded and at least one non-grounded electrode operative as an electron detector.
Abstract:
A gas injection system provides a local region at the sample surface that has sufficient gas concentration to be ionized by secondary electrons to neutralize charged on the sample surface. In some embodiments, a gas concentration structure concentrates the gas near the surface. An optional hole in the gas concentration structure allows the charged particle beam to impact the interior of a shrouded region. In some embodiments, an anode near the surface increases the number of ions that return to the work piece surface for charge neutralization, the anode in some embodiments being a part of the gas injection system and in some embodiments being a separate structure.
Abstract:
A scanning transmission electron microscope operated with the sample in a high pressure environment. A preferred detector uses gas amplification by converting either scattered or unscattered transmitted electrons to secondary electrons for efficient gas amplification.
Abstract:
A novel detector for a charged particle beam system which includes multiple gas amplification stages. The stages are typically defined by conductors to which voltage are applied relative to the sample or to a previous stage. By creating cascades of secondary electrons in multiple stages, the gain can be increased without causing dielectric breakdown of the gas.
Abstract:
Disclosed is a charged particle optical apparatus. The charged particle optical apparatus has a liner electrode in a first vacuum zone. The liner electrode is used to generate an electrostatic objective lens field. The apparatus has a second electrode which surrounds at least a section of the primary particle beam path. The section extends in the first vacuum zone and downstream of the liner electrode. A third electrode is provided having a differential pressure aperture through which the particle beam path exits from the first vacuum zone. A particle detector is configured for detecting emitted particles, which are emitted from the object and which pass through the differential pressure aperture of the third electrode. The liner electrode, the second and third electrodes are operable at different potentials relative to each other.
Abstract:
A scanning electron microscope suitable for imaging samples in a non-vacuum environment, the scanning electron microscope including an electron source located within an enclosure maintained under vacuum, an electron permeable membrane disposed at an opening of the enclosure separating an environment within the enclosure which is maintained under vacuum and an environment outside the enclosure which is not maintained under vacuum, the electron permeable membrane not being electrically grounded and at least one non-grounded electrode operative as an electron detector.
Abstract:
Beam-induced etching uses a work piece maintained at a temperature near the boiling point of a precursor material, but the temperature is sufficiently high to desorb reaction byproducts. In one embodiment, NF3 is used as a precursor gas for electron-beam induced etching of silicon at a temperature below room temperature.
Abstract:
A gas injection system provides a local region at the sample surface that has sufficient gas concentration to be ionized by secondary electrons to neutralize charged on the sample surface. In some embodiments, a gas concentration structure concentrates the gas near the surface. An optional hole in the gas concentration structure allows the charged particle beam to impact the interior of a shrouded region. In some embodiments, an anode near the surface increases the number of ions that return to the work piece surface for charge neutralization, the anode in some embodiments being a part of the gas injection system and in some embodiments being a separate structure.
Abstract:
In a VP-SEM that uses gas multiplication induced within a low-vacuum sample chamber and uses a method of detecting a positive displacement current, a secondary electron detector for the VP-SEM that responds at high speed, which can acquire a TV-Scan rate image at a low cost while saving a space is provided. A secondary electron detector is formed by forming the electron supplying electrode and the detection electrode on the flexible thin film type substrate such as a polyimide film, etc., by an etching method. Thereby, the space can be saved while realizing low cost due to mass production. Further, the ion horizontally moving with respect to the surface of the secondary electron detector is detected and the ion moving in a vertical direction returned to the sample holder is not detected, making it possible to realize a high-speed response.