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公开(公告)号：US08003959B2
公开(公告)日：2011-08-23
申请号：US12492894
申请日：2009-06-26
Applicant: Wilhelm P. Platow , Neil J. Bassom , Peter F. Kurunczi , Alexander S. Perel , Craig R. Chaney
Inventor： Wilhelm P. Platow , Neil J. Bassom , Peter F. Kurunczi , Alexander S. Perel , Craig R. Chaney
IPC: H01J37/317 , H01J37/08 , H01J49/10 , H01J27/02 , H01J9/38
CPC classification number: H01J49/10 , H01J27/02 , H01J37/08 , H01J37/3171 , H01J2209/017 , H01J2237/022 , H01J2237/05 , H01J2237/30466
Abstract: In an ion implanter, a Faraday cup is utilized to receive an ion beam generated during ion source cleaning. The detected beam has an associated mass spectrum which indicates when the ion source cleaning process is complete. The mass spectrum results in a signal composed of a cleaning agent and the material comprising the ion source. This signal will rise over time as the ion source chamber is being cleaned and will level-off and remain constant once the deposits are etched away from the source chamber, thereby utilizing existing implant tools to determine endpoint detection during ion source cleaning.
Abstract translation: 在离子注入机中，法拉第杯用于接收在离子源清洁期间产生的离子束。 检测到的光束具有相关联的质谱，其指示何时完成离子源清洁过程。 质谱产生由清洁剂和包含离子源的材料组成的信号。 当离子源室被清洁时，该信号将随着时间的推移而升高，并且一旦沉积物从源室被蚀刻掉，就会保持恒定，从而利用现有的植入工具确定离子源清洁期间的端点检测。
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公开(公告)号：US07888662B2
公开(公告)日：2011-02-15
申请号：US12143247
申请日：2008-06-20
Applicant: Costel Biloiu , Craig R. Chaney , Eric R. Cobb , Bon-Woong Koo , Wilhelm P. Platow
Inventor： Costel Biloiu , Craig R. Chaney , Eric R. Cobb , Bon-Woong Koo , Wilhelm P. Platow
IPC: H01J37/08
CPC classification number: H01J37/08 , H01J37/3171 , H01J2237/022 , H01J2237/024 , H01J2237/0458 , H01J2237/061
Abstract: In a cleaning process for an ion source chamber, an electrode positioned outside of the ion source chamber includes a suppression plug. When the cleaning gas is introduced intothe source chamber, the suppression plug may engage an extraction aperture of the source chamber to adjust the gas pressure within the chamber to enhance chamber cleaning via. plasma-enhanced chemical reaction. The gas conductance between the source chamber aperture and the suppression plug can be adjusted during the cleaning process to provide optimum cleaning conditions and to exhaust unwanted deposits.
Abstract translation: 在离子源室的清洁处理中，位于离子源室外的电极包括抑制塞。 当清洁气体被引入源室中时，抑制塞可以接合源室的提取孔以调节室内的气体压力以增强室清洁。 等离子体增强化学反应。 在清洁过程中可以调节源室孔和抑制塞之间的气体传导，以提供最佳的清洁条件并排出不需要的沉积物。
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公开(公告)号：US20090314951A1
公开(公告)日：2009-12-24
申请号：US12143247
申请日：2008-06-20
Applicant: Costel Biloiu , Craig R. Chaney , Eric R. Cobb , Bon-Woong Koo , Wilhelm P. Platow
Inventor： Costel Biloiu , Craig R. Chaney , Eric R. Cobb , Bon-Woong Koo , Wilhelm P. Platow
CPC classification number: H01J37/08 , H01J37/3171 , H01J2237/022 , H01J2237/024 , H01J2237/0458 , H01J2237/061
Abstract: In a cleaning process for an ion source chamber, an electrode positioned outside of the ion source chamber includes a suppression plug. When the cleaning gas is introduced into the source chamber, the suppression plug may engage an extraction aperture of the source chamber to adjust the gas pressure within the chamber to enhance chamber cleaning via. plasma-enhanced chemical reaction. The gas conductance between the source chamber aperture and the suppression plug can be adjusted during the cleaning process to provide optimum cleaning conditions and to exhaust unwanted deposits.
Abstract translation: 在离子源室的清洁处理中，位于离子源室外的电极包括抑制塞。 当清洁气体被引入源室中时，抑制塞可以接合源室的提取孔以调节室内的气体压力以增强室清洁。 等离子体增强化学反应。 在清洁过程中可以调节源室孔和抑制塞之间的气体传导，以提供最佳的清洁条件并排出不需要的沉积物。
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公开(公告)号：US08912976B2
公开(公告)日：2014-12-16
申请号：US13612406
申请日：2012-09-12
Applicant: Wilhelm P. Platow , Craig R. Chaney
Inventor： Wilhelm P. Platow , Craig R. Chaney
IPC: H01Q1/36
CPC classification number: H01J37/3211 , H01J37/32477 , H05H1/46 , H05H2001/4667
Abstract: Disclosed is a radio frequency (RF) antenna for plasma ion sources. The RF antenna includes a low-resistance metal tube having an inner and outer diameter. A low friction polymer tube also having an inner and outer diameter surrounds the low-resistance metal tube. The inner diameter of the polymer tube is slightly larger than the outer diameter of the low-resistance metal tube. A pre-formed quartz glass tube encases the low friction polymer tube and low-resistance metal tube. The quartz glass tube is pre-formed in a desired shape. A guide wire is attached inside one end of the low-resistance hollow metal tube. The flexible low friction polymer tube containing the low-resistance metal tubed may then be threaded through the quartz glass tube.
Abstract translation: 公开了一种用于等离子体离子源的射频（RF）天线。 RF天线包括具有内径和外径的低电阻金属管。 也具有内外径的低摩擦聚合物管围绕低电阻金属管。 聚合物管的内径稍微大于低电阻金属管的外径。 预制石英玻璃管包裹低摩擦聚合物管和低电阻金属管。 石英玻璃管预成形为所需形状。 引导线安装在低阻力中空金属管的一端内。 含有低电阻金属管的柔性低摩擦聚合物管可以穿过石英玻璃管。
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公开(公告)号：US08809800B2
公开(公告)日：2014-08-19
申请号：US12533318
申请日：2009-07-31
Applicant: Bon-Woong Koo , Christopher R. Campbell , Craig R. Chaney , Robert Lindberg , Wilhelm P. Platow , Alexander S. Perel
Inventor： Bon-Woong Koo , Christopher R. Campbell , Craig R. Chaney , Robert Lindberg , Wilhelm P. Platow , Alexander S. Perel
IPC: H01J27/02 , H01J27/14 , H01J37/08 , H01J37/317
CPC classification number: H01J27/022 , H01J27/02 , H01J27/14 , H01J37/08 , H01J37/3002 , H01J37/3171 , H01J2237/022 , H01J2237/31705
Abstract: An ion source and method of cleaning are disclosed. One or more heating units are placed in close proximity to the inner volume of the ion source, so as to affect the temperature within the ion source. In one embodiment, one or more walls of the ion source have recesses into which heating units are inserted. In another embodiment, one or more walls of the ion source are constructed of a conducting circuit and an insulating layer. By utilizing heating units near the ion source, it is possible to develop new methods of cleaning the ion source. Cleaning gas is flowed into the ion source, where it is ionized, either by the cathode, as in normal operating mode, or by the heat generated by the heating units. The cleaning gas is able to remove residue from the walls of the ion source more effectively due to the elevated temperature.
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Patent Agency Ranking
公开(公告)号：US20140070697A1
公开(公告)日：2014-03-13
申请号：US13612406
申请日：2012-09-12
Applicant: Wilhelm P. Platow , Craig R. Chaney
Inventor： Wilhelm P. Platow , Craig R. Chaney
CPC classification number: H01J37/3211 , H01J37/32477 , H05H1/46 , H05H2001/4667
Abstract: Disclosed is a radio frequency (RF) antenna for plasma ion sources. The RF antenna includes a low-resistance metal tube having an inner and outer diameter. A low friction polymer tube also having an inner and outer diameter surrounds the low-resistance metal tube. The inner diameter of the polymer tube is slightly larger than the outer diameter of the low-resistance metal tube. A pre-formed quartz glass tube encases the low friction polymer tube and low-resistance metal tube. The quartz glass tube is pre-formed in a desired shape. A guide wire is attached inside one end of the low-resistance hollow metal tube. The flexible low friction polymer tube containing the low-resistance metal tubed may then be threaded through the quartz glass tube.
Abstract translation: 公开了用于等离子体离子源的射频（RF）天线。 RF天线包括具有内径和外径的低电阻金属管。 也具有内外径的低摩擦聚合物管围绕低电阻金属管。 聚合物管的内径稍微大于低电阻金属管的外径。 预制石英玻璃管包裹低摩擦聚合物管和低电阻金属管。 石英玻璃管预成形为所需形状。 引导线安装在低阻力中空金属管的一端内。 含有低电阻金属管的柔性低摩擦聚合物管可以穿过石英玻璃管。
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公开(公告)号：US08263944B2
公开(公告)日：2012-09-11
申请号：US12340812
申请日：2008-12-22
Applicant: John Bon-Woong Koo , David J. Twiss , Chris Campbell , Frank Sinclair , Alexander S. Perel , Craig R. Chaney , Wilhelm P. Platow , Eric R. Cobb
Inventor： John Bon-Woong Koo , David J. Twiss , Chris Campbell , Frank Sinclair , Alexander S. Perel , Craig R. Chaney , Wilhelm P. Platow , Eric R. Cobb
IPC: H01J27/00
CPC classification number: H01J27/08 , H01J37/08 , H01J37/3171 , H01J2237/006 , H01J2237/022 , H01J2237/061
Abstract: In an ion implanter, an inert gas is directed at a cathode assembly near an ion source chamber via a supply tube. The inert gas is provided with a localized directional flow toward the cathode assembly to reduce unwanted concentrations of cleaning or dopant gases introduced into the ion source chamber, thereby reducing the effects of unwanted filament growth in the cathode assembly and extending the manufacturing life of the ion source.
Abstract translation: 在离子注入机中，惰性气体通过供应管被引导到离子源室附近的阴极组件。 向惰性气体提供朝向阴极组件的局部定向流，以减少引入离子源室的清洁或掺杂气体的不期望浓度，从而减少阴极组件中不想要的细丝生长的影响并延长离子的制造寿命 资源。
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公开(公告)号：US20100327159A1
公开(公告)日：2010-12-30
申请号：US12492894
申请日：2009-06-26
Applicant: Wilhelm P. Platow , Neil J. Bassom , Peter F. Kurunczi , Alexander S. Perel , Craig R. Chaney
Inventor： Wilhelm P. Platow , Neil J. Bassom , Peter F. Kurunczi , Alexander S. Perel , Craig R. Chaney
IPC: H01J37/317 , H01J37/05 , H01J49/26
CPC classification number: H01J49/10 , H01J27/02 , H01J37/08 , H01J37/3171 , H01J2209/017 , H01J2237/022 , H01J2237/05 , H01J2237/30466
Abstract: In an ion implanter, a Faraday cup is utilized to receive an ion beam generated during ion source cleaning. The detected beam has an associated mass spectrum which indicates when the ion source cleaning process is complete. The mass spectrum results in a signal composed of a cleaning agent and the material comprising the ion source. This signal will rise over time as the ion source chamber is being cleaned and will level-off and remain constant once the deposits are etched away from the source chamber, thereby utilizing existing implant tools to determine endpoint detection during ion source cleaning.
Abstract translation: 在离子注入机中，法拉第杯用于接收在离子源清洁期间产生的离子束。 检测到的光束具有相关联的质谱，其指示何时完成离子源清洁过程。 质谱产生由清洁剂和包含离子源的材料组成的信号。 当离子源室被清洁时，该信号将随着时间的推移而升高，并且一旦沉积物从源室被蚀刻掉，就会保持恒定，从而利用现有的植入工具确定离子源清洁期间的端点检测。
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公开(公告)号：US20100155619A1
公开(公告)日：2010-06-24
申请号：US12340812
申请日：2008-12-22
Applicant: John Bon-Woong Koo , David J. Twiss , Chris Campbell , Frank Sinclair , Alexander S. Perel , Craig R. Chaney , Wilhelm P. Platow , Eric R. Cobb
Inventor： John Bon-Woong Koo , David J. Twiss , Chris Campbell , Frank Sinclair , Alexander S. Perel , Craig R. Chaney , Wilhelm P. Platow , Eric R. Cobb
CPC classification number: H01J27/08 , H01J37/08 , H01J37/3171 , H01J2237/006 , H01J2237/022 , H01J2237/061
Abstract: In an ion implanter, an inert gas is directed at a cathode assembly near an ion source chamber via a supply tube. The inert gas is provided with a localized directional flow toward the cathode assembly to reduce unwanted concentrations of cleaning or dopant gases introduced into the ion source chamber, thereby reducing the effects of unwanted filament growth in the cathode assembly and extending the manufacturing life of the ion source.
Abstract translation: 在离子注入机中，惰性气体通过供应管被引导到离子源室附近的阴极组件。 向惰性气体提供朝向阴极组件的局部定向流，以减少引入离子源室的清洁或掺杂气体的不期望浓度，从而减少阴极组件中不想要的细丝生长的影响并延长离子的制造寿命 资源。
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10.发明申请METHOD AND APPARATUS FOR CONTROLLING BEAM CURRENT UNIFORMITY IN AN ION IMPLANTER 有权用于控制离子植入物中光束电流均匀性的方法和装置公开(公告)号：US20090314962A1
公开(公告)日：2009-12-24
申请号：US12143144
申请日：2008-06-20
Applicant: Rajesh DORAI , Peter F. Kurunczi , Alexander S. Perel , Wilhelm P. Platow
Inventor： Rajesh DORAI , Peter F. Kurunczi , Alexander S. Perel , Wilhelm P. Platow
CPC classification number: H01J37/3171 , H01J37/04 , H01J37/08 , H01J37/09 , H01J2237/024 , H01J2237/0455 , H01J2237/08 , H01J2237/083 , H01J2237/0835 , H01J2237/24542
Abstract: An electrode assembly for use with an ion source chamber or as part of an ion implanter processing system to provide a uniform ion beam profile. The electrode assembly includes an electrode having an extraction slot with length L aligned with an aperture of the ion source chamber for extracting an ion beam. The electrode includes a plurality of segments partitioned within the length of the extraction slot where each of the segments is configured to be displaced in at least one direction with respect to the ion beam. A plurality of actuators are connected to the plurality of electrode segments for displacing one or more of the segments. By displacing at least one of the plurality of electrode segments, the current density of a portion of the ion beam corresponding to the position of the segment within the extraction slot is modified to provide a uniform current density beam profile associated with the extracted ion beam.
Abstract translation: 一种与离子源室一起使用或作为离子注入机处理系统的一部分以提供均匀离子束分布的电极组件。 电极组件包括具有长度为L的提取槽的电极，其与用于提取离子束的离子源室的孔径对准。 电极包括在提取槽的长度内分隔的多个段，其中每个段被配置为相对于离子束在至少一个方向上移位。 多个致动器连接到多个电极段，用于移动一个或多个段。 通过移位多个电极段中的至少一个，修改与提取槽内的段的位置相对应的一部分离子束的电流密度，以提供与提取的离子束相关联的均匀的电流密度波束轮廓。
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