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    Ion source apparatus and cleaning optimized method thereof
    2.
    发明申请
    Ion source apparatus and cleaning optimized method thereof 有权
    离子源装置及其清洗优化方法

    公开(公告)号：US20050016838A1

    公开(公告)日：2005-01-27

    申请号：US10861758

    申请日：2004-06-04

    申请人： Hirohiko Murata ,  Masateru Sato

    发明人： Hirohiko Murata ,  Masateru Sato

    IPC分类号： H01J27/02 ,  C23C14/00 ,  C23C14/32 ,  H01J27/16 ,  H01J37/08 ,  H01J37/317

    CPC分类号： H01J27/16 ,  H01J37/08 ,  H01J2209/017 ,  H01J2237/022

    摘要： An ion source apparatus includes a rare gas supply source supplying rare gas instead of ion source gas to a plasma chamber, means to determine time and timing for cleaning electrodes in consideration of a collecting amount of insulation layers accreting to the electrodes of an extraction electrode system. Based on the above, the ion source apparatus removes the insulation layers by sputtering with ion beam of the rare gas while adjusting extraction or accelerate voltage and supply amount of the rare gas as a setting parameter. Moreover, by adjusting the setting parameter which changes a diameter of ion beam based on the rare gas when the ion beam collides onto each electrode surface of the extraction electrode system, the beam diameter is focused within an effective range in which intension of the sputtering of the insulation layers is maximized thus evenly removing the insulation layers.

    摘要翻译： 离子源装置包括：将等离子体气体供给稀有气体而不是离子源气体的稀有气体供给源，考虑到提取电极系统的电极的绝缘层的收集量，确定清洗电极的时间和时间的装置 。 基于上述，离子源装置通过溅射稀土气体的离子束，同时调整提取或加速稀有气体的电压和供给量作为设定参数，来除去绝缘层。 此外，通过调整当离子束碰撞到提取电极系统的每个电极表面时基于稀有气体改变离子束直径的设定参数，光束直径聚焦在有效范围内，其中溅射的强度 绝缘层最大化，从而均匀地去除绝缘层。

    Removing coatings from cathode ray tubes or parts thereof
    4.
    发明授权
    Removing coatings from cathode ray tubes or parts thereof 失效
    从阴极射线管或其部件去除涂层

    公开(公告)号：US4974616A

    公开(公告)日：1990-12-04

    申请号：US829167

    申请日：1986-02-14

    申请人： Robert A. Lee

    发明人： Robert A. Lee

    IPC分类号： H01J9/50 ,  B08B3/12 ,  C09K11/01 ,  H01J9/38 ,  H01J9/52

    CPC分类号： H01J9/38 ,  B08B3/12 ,  C09K11/01 ,  H01J2209/017 ,  Y02W30/72

    摘要： In a method of removing a coating from a cathode ray tube, for example a carbon (graphite) coating on the exterior of a glass body or funnel of the tube, the tube is at least partially immersed in a bath containing an alkaline liquor such that at least the coating is immersed in the liquor, and the liquor is subjected to ultrasonic excitation, for example by transducers disposed in the liquor in the bath.

    摘要翻译： 在从阴极射线管中除去涂层的方法中，例如在管的玻璃体或漏斗外部的碳（石墨）涂层，该管至少部分地浸入含有碱性液体的浴中，使得 至少将涂层浸入液体中，并且将液体例如通过设置在浴液中的换能器进行超声波激发。

    Method and apparatus for extending equipment uptime in ion implantation
    6.
    发明申请
    Method and apparatus for extending equipment uptime in ion implantation 审中-公开
    用于在离子注入中延长设备正常运行时间的方法和装置

    公开(公告)号：US20070241689A1

    公开(公告)日：2007-10-18

    申请号：US11647898

    申请日：2006-12-29

    申请人： Thomas Horsky ,  Robert Milgate ,  George Sacco ,  Dale Jacobson ,  Wade Krull

    发明人： Thomas Horsky ,  Robert Milgate ,  George Sacco ,  Dale Jacobson ,  Wade Krull

    IPC分类号： H01J3/00

    CPC分类号： H01J37/3171 ,  C23C14/48 ,  C23C14/564 ,  H01J9/38 ,  H01J27/02 ,  H01J27/024 ,  H01J37/08 ,  H01J2209/017 ,  H01J2237/006 ,  H01J2237/022 ,  Y10T137/0357 ,  Y10T137/7759 ,  Y10T137/776 ,  Y10T137/7761 ,  Y10T137/85954 ,  Y10T137/85978 ,  Y10T137/85986 ,  Y10T137/86002

    摘要： The service lifetime of an ion source is enhanced or prolonged by the source having provisions for in-situ etch cleaning of the ion source and of an extraction electrode, using reactive halogen gases, and by having features that extend the service duration between cleanings. The latter include accurate vapor flow control, accurate focusing of the ion beam optics, and thermal control of the extraction electrode that prevents formation of deposits or prevents electrode destruction. An apparatus comprised of an ion source for generating dopant ions for semiconductor wafer processing is coupled to a remote plasma source which delivers F or Cl ions to the first ion source for the purpose of cleaning deposits in the first ion source and the extraction electrode. These methods and apparatus enable long equipment uptime when running condensable feed gases such as sublimated vapor sources, and are particularly applicable for use with so-called cold ion sources. Methods and apparatus are described which enable long equipment uptime when decaborane and octadecaborane are used as feed materials, as well as when vaporized elemental arsenic and phosphorus are used, and which serve to enhance beam stability during ion implantation.

    摘要翻译： 离子源的使用寿命通过源具有用于使用反应性卤素气体对离子源和引出电极进行原位蚀刻清洁以及具有延长清洁之间的使用持续时间的特征的源来增强或延长。 后者包括准确的蒸汽流量控制，离子束光学的精确聚焦，以及防止沉积物形成或防止电极破坏的引出电极的热控制。 包括用于产生用于半导体晶片处理的掺杂剂离子的离子源的装置耦合到远程等离子体源，其将F或Cl离子递送到第一离子源，以清除第一离子源和提取电极中的沉积物。 这些方法和装置在运行诸如升华蒸汽源的可冷凝进料气体时能够延长设备正常运行时间，并且特别适用于所谓的冷离子源。 描述了使用十硼烷和十八硼烷作为原料的长设备正常运行时间，以及当使用蒸发的元素砷和磷时，并且用于提高离子注入期间的束稳定性的方法和装置。

    Method and apparatus for extracting ions from an ion source for use in ion implantation
    7.
    发明申请
    Method and apparatus for extracting ions from an ion source for use in ion implantation 有权
    用于离子注入离子源提取离子的方法和装置

    公开(公告)号：US20060272775A1

    公开(公告)日：2006-12-07

    申请号：US11452003

    申请日：2006-06-12

    申请人： Thomas Horsky ,  Robert Milgate ,  George Sacco ,  Dale Jacobson ,  Wade Krull

    发明人： Thomas Horsky ,  Robert Milgate ,  George Sacco ,  Dale Jacobson ,  Wade Krull

    IPC分类号： H01L21/306

    CPC分类号： H01J37/08 ,  C23C14/48 ,  C23C14/564 ,  H01J9/38 ,  H01J27/024 ,  H01J37/3171 ,  H01J2209/017 ,  H01J2237/006 ,  H01J2237/022 ,  H01J2237/0812 ,  H01J2237/083 ,  H01J2237/31701 ,  H01L21/265

    摘要： Thermal control is provided for an extraction electrode of an ion-beam producing system that prevents formation of deposits and unstable operation and enables use with ions produced from condensable vapors and with ion sources capable of cold and hot operation. Electrical heating of the extraction electrode is employed for extracting decaborane or octadecaborane ions. Active cooling during use with a hot ion source prevents electrode destruction, permitting the extraction electrode to be of heat-conductive and fluorine-resistant aluminum composition. The service lifetime of the system is enhanced by provisions for in-situ etch cleaning of the ion source and extraction electrode, using reactive halogen gases, and by having features that extend the service duration between cleanings, including accurate vapor flow control and accurate focusing of the ion beam optics. A remote plasma source delivers F or Cl ions to the de-energized ion source for the purpose of cleaning deposits in the ion source and the extraction electrode. These techniques enable long equipment uptime when running condensable feed gases such as sublimated vapors, and are particularly applicable for use with so-called cold ion sources and universal ion sources. Methods and apparatus are described which enable long equipment uptime when decaborane and octadecaborane are used as feed materials, as well as when vaporized elemental arsenic and phosphorus are used, and which serve to enhance beam stability during ion implantation.

    摘要翻译： 为离子束产生系统的提取电极提供热控制，其防止沉积物的形成和不稳定的操作，并且能够与可冷凝蒸气和能够冷热操作的离子源产生的离子一起使用。 提取电极的电加热用于提取十硼烷或十八硼烷离子。 使用热离子源时的主动冷却可防止电极破坏，从而使引出电极具有导热和防氟的铝组成。 通过使用反应性卤素气体对离子源和引出电极进行原位蚀刻清洗，并且具有延长清洗之间的使用持续时间的特征，包括准确的蒸汽流量控制和精确的聚焦，增强了系统的使用寿命 离子束光学。 远程等离子体源将F或Cl离子输送到去激活离子源，以清除离子源和提取电极中的沉积物。 这些技术使得在运行可冷凝的进料气体如升华蒸汽时长的设备正常运行时间，并且特别适用于所谓的冷离子源和通用离子源。 描述了使用十硼烷和十八硼烷作为原料的长设备正常运行时间，以及当使用蒸发的元素砷和磷时，并且用于提高离子注入期间的束稳定性的方法和装置。

    Cleaning method and cleaning apparatus of shadow mask
    9.
    发明授权
    Cleaning method and cleaning apparatus of shadow mask 失效
    荫罩的清洁方法和清洁装置

    公开(公告)号：US06589092B2

    公开(公告)日：2003-07-08

    申请号：US09835382

    申请日：2001-04-17

    申请人： Yoshiaki Sawada ,  Kazumasa Hirayama

    发明人： Yoshiaki Sawada ,  Kazumasa Hirayama

    IPC分类号： H01J938

    CPC分类号： H01J9/146 ,  H01J2209/017 ,  H01J2229/07

    摘要： An ultrasonic wave is oscillated from an ultrasonic generator toward a shadow mask to permit the ultrasonic wave to remove the foreign matter attached to the shadow mask, thereby cleaning the shadow mask. A part of the ultrasonic wave oscillated from the ultrasonic generator toward the shadow mask is reflected by a reflector toward the shadow mask so as to irradiate the shadow mask.

    摘要翻译： 超声波从超声波发生器朝向荫罩振动，使超声波除去附着在荫罩上的异物，从而清洗荫罩。 从超声波发生器朝向荫罩振荡的超声波的一部分被反射器朝向荫罩反射，以照射荫罩。