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    METHODS AND APPARATUS FOR HEATING AIR WITH HOT WATER
    1.
    发明申请
    METHODS AND APPARATUS FOR HEATING AIR WITH HOT WATER 审中-公开
    用热水加热空气的方法和装置

    公开(公告)号：US20150053198A1

    公开(公告)日：2015-02-26

    申请号：US14194752

    申请日：2014-03-02

    Applicant: Rinnai America Corporation

    Inventor： James York ,  Hugh L. Allen-Magande

    IPC: F24H6/00 ,  F24H1/00 ,  F24H1/22

    CPC classification number: F24H6/00 ,  F24D3/08 ,  F24D5/02 ,  F24D5/04 ,  F24D19/1009 ,  F24D19/1084 ,  F24H1/0027 ,  F24H1/22 ,  F28D1/024 ,  Y10T137/0357

    Abstract: A method controls an air handler that generates heated air from hot water generated by a water heater. The method includes generating a signal in the presence or absence of an indicia of water flow associated with the water heater; initiating operation of a pump associated with the air handler when the signal indicates that water flow associated with the water heater is at least at a selected level to supply hot water to the air handler sufficient to generate heated air; and/or terminating operation of the pump and/or a blower/fan associated with the air handler when the presence or absence signal indicates that the water flow associated with the water heater is less than the selected level.

    Abstract translation: 一种方法控制从由热水器产生的热水产生热空气的空气处理器。 该方法包括在存在或不存在与热水器相关联的水流的标记的情况下产生信号; 当所述信号指示与所述热水器相关联的水流至少处于选定的水平以向所述空气处理器供应足以产生加热空气的热水时，启动与所述空气处理器相关联的泵的操作; 和/或当存在或不存在信号指示与热水器相关联的水流小于所选择的水平时，泵和/或与空气处理器相关联的鼓风机/风扇的操作。

    Flow rate control using mass flow rate control device
    2.
    发明授权
    Flow rate control using mass flow rate control device 有权
    使用质量流量控制装置进行流量控制

    公开(公告)号：US08857461B2

    公开(公告)日：2014-10-14

    申请号：US13765673

    申请日：2013-02-12

    Applicant: Hitachi Metals, Ltd.

    Inventor： Takao Goto ,  Makoto Tanaka

    IPC: F16K31/12 ,  G01F1/696 ,  F17D3/01 ,  G01F25/00 ,  G01F5/00 ,  G05D7/06 ,  G01F1/684

    CPC classification number: F17D3/01 ,  G01F1/6847 ,  G01F1/6965 ,  G01F5/00 ,  G01F25/0053 ,  G05D7/0635 ,  Y10T137/0324 ,  Y10T137/0357 ,  Y10T137/0363 ,  Y10T137/7722 ,  Y10T137/7761 ,  Y10T137/85986

    Abstract: A process and device enabling accurate mass flow control is described. A mass flow controller can be re-specified corresponding to multiple types of actual process gases and multiple flow rate ranges, even after the mass flow controller has been shipped. Calibration gas data is derived using actual flow rate versus a flow rate setting signal to generate calibration gas data. Actual gas data is derived by measuring actual flow rate versus a flow rate setting signal for each actual gas and saving. Subsequently, prior to operating the mass flow rate control device, the characteristic data for an actual and the calibration gas characteristic data is recalled. The calibration gas characteristic data is then converted to controlled flow rate correction data based on the actual gas characteristic data that is saved to the control unit and the actual gas flow rate is corrected based on this controlled flow rate correction data.

    Abstract translation: 描述了能够进行精确质量流量控制的过程和装置。 质量流量控制器可以对应于多种类型的实际工艺气体和多个流量范围，即使在质量流量控制器已经运输之后也可重新指定。 使用实际流量与流量设置信号得出校准气体数据，以产生校准气体数据。 实际气体数据是通过测量实际流量相对于每个实际气体的流量设置信号和节省而得出的。 随后，在操作质量流量控制装置之前，召回实际和校准气体特性数据的特征数据。 基于保存到控制单元的实际气体特性数据，基于该受控流量校正数据校正实际气体流量，校准气体特性数据被转换为受控流量校正数据。

    CHEMICAL VAPORIZER FOR MATERIAL DEPOSITION SYSTEMS AND ASSOCIATED METHODS
    3.
    发明申请
    CHEMICAL VAPORIZER FOR MATERIAL DEPOSITION SYSTEMS AND ASSOCIATED METHODS 有权
    化学蒸发器用于材料沉积系统和相关方法

    公开(公告)号：US20120289059A1

    公开(公告)日：2012-11-15

    申请号：US13554265

    申请日：2012-07-20

    Applicant: Eugene P. Marsh ,  David R. Atwell

    Inventor： Eugene P. Marsh ,  David R. Atwell

    IPC: C23C16/448 ,  H01L21/30

    CPC classification number: C23C16/4405 ,  C23C16/4402 ,  C23C16/4481 ,  C23C16/52 ,  Y10T137/0357

    Abstract: System and method for operating a material deposition system are disclosed. In one embodiment, the method can include periodically injecting a precursor into a vaporizer through an injector at the vaporizer, vaporizing the precursor in the vaporizer and supplying the vaporized precursor to a reaction chamber in fluid communication with the vaporizer, and shutting down the vaporizer and the reaction chamber after a period of time. The method can also include conducting maintenance of the injector at the vaporizer by using a vapor solvent rinse.

    Abstract translation: 公开了用于操作材料沉积系统的系统和方法。 在一个实施方案中，该方法可以包括通过蒸发器处的注射器周期性地将前体注入蒸发器中，蒸发蒸发器中的前体并将蒸发的前体供应到与蒸发器流体连通的反应室，并且关闭蒸发器和 反应室经过一段时间。 该方法还可以包括通过使用蒸气溶剂冲洗在蒸发器处进行喷射器的维护。

    Methods for atomic layer deposition of hafnium-containing high-K dielectric materials
    4.
    发明授权
    Methods for atomic layer deposition of hafnium-containing high-K dielectric materials 失效
    含铪高K介电材料的原子层沉积方法

    公开(公告)号：US08282992B2

    公开(公告)日：2012-10-09

    申请号：US11925681

    申请日：2007-10-26

    Applicant: Nyi Oo Myo ,  Kenric Cho ,  Shreyas Kher ,  Pravin Narwankar ,  Steve Poppe ,  Craig R. Metzner ,  Paul Deaten

    Inventor： Nyi Oo Myo ,  Kenric Cho ,  Shreyas Kher ,  Pravin Narwankar ,  Steve Poppe ,  Craig R. Metzner ,  Paul Deaten

    IPC: C23C16/00

    CPC classification number: C23C16/4488 ,  C23C16/0272 ,  C23C16/40 ,  C23C16/401 ,  C23C16/405 ,  C23C16/4412 ,  C23C16/45529 ,  C23C16/45531 ,  C23C16/45544 ,  C23C16/45582 ,  C23C16/56 ,  Y02T50/67 ,  Y10T137/0357 ,  Y10T137/0396 ,  Y10T137/2087

    Abstract: Embodiments of the invention provide methods for depositing materials on substrates during vapor deposition processes, such as atomic layer deposition (ALD). In one embodiment, a chamber contains a substrate support with a receiving surface and a chamber lid containing an expanding channel formed within a thermally insulating material. The chamber further includes at least one conduit coupled to a gas inlet within the expanding channel and positioned to provide a gas flow through the expanding channel in a circular direction, such as a vortex, a helix, a spiral, or derivatives thereof. The expanding channel may be formed directly within the chamber lid or formed within a funnel liner attached thereon. The chamber may contain a retaining ring, an upper process liner, a lower process liner or a slip valve liner. Liners usually have a polished surface finish and contain a thermally insulating material such as fused quartz or ceramic. In an alternative embodiment, a deposition system contains a catalytic water vapor generator connected to an ALD chamber.

    Abstract translation: 本发明的实施例提供了在诸如原子层沉积（ALD）的气相沉积工艺期间在衬底上沉积材料的方法。 在一个实施例中，腔室包含具有接收表面的衬底支撑件和包含形成在绝热材料内的扩张通道的腔室盖。 腔室还包括至少一个管道，其连接到膨胀通道内的气体入口并且定位成提供在圆形方向（例如涡流，螺旋，螺旋或其衍生物）上的气体流过膨胀通道。 膨胀通道可以直接形成在室盖内，或者形成在其内附着的漏斗衬套中。 腔室可以包含保持环，上加工衬套，下工艺衬垫或滑阀衬套。 衬里通常具有抛光表面光洁度并且包含绝热材料，例如熔融石英或陶瓷。 在替代实施例中，沉积系统包含连接到ALD室的催化水蒸汽发生器。

    METHOD TO DELIVER A FLUID WITH FLOW RATE CONTROL
    5.
    发明申请
    METHOD TO DELIVER A FLUID WITH FLOW RATE CONTROL 审中-公开
    用流量控制提供流体的方法

    公开(公告)号：US20120031497A1

    公开(公告)日：2012-02-09

    申请号：US13276075

    申请日：2011-10-18

    Applicant: John Howard Gordon

    Inventor： John Howard Gordon

    IPC: F15D1/00

    CPC classification number: A61M5/16877 ,  A61M5/14244 ,  A61M5/16886 ,  A61M2205/0294 ,  A61M2205/3368 ,  Y10T137/0318 ,  Y10T137/0357 ,  Y10T137/2562 ,  Y10T137/3149 ,  Y10T137/8158

    Abstract: A method for delivering a fluid to a target site is disclosed in one embodiment of the invention as including generating a first fluid stream having a first flow rate, introducing the first fluid stream into a flow modulator, and permitting a second fluid stream having a second flow rate that is substantially more uniform than the first flow rate to exit the flow modulator. The flow modulator may smooth out irregularities in the flow rate, thereby generating the second fluid steam having a second flow rate that is substantially more uniform than the first flow rate.

    Abstract translation: 在本发明的一个实施例中公开了将流体输送到目标位置的方法，包括产生具有第一流量的第一流体流，将第一流体流引入流动调节器，并允许具有第二流体流的第二流体流 流速比第一流速基本上更均匀以离开流量调节器。 流动调节器可以平滑流速中的不规则性，从而产生具有比第一流量基本上更均匀的第二流量的第二流体蒸汽。

    SINGLE COMPONENT TWO-STAGE REGULATOR
    6.
    发明申请
    SINGLE COMPONENT TWO-STAGE REGULATOR 有权
    单组件两级稳压器

    公开(公告)号：US20110079290A1

    公开(公告)日：2011-04-07

    申请号：US12651896

    申请日：2010-01-04

    Applicant: Paul J. Califano ,  Michael J. Califano

    Inventor： Paul J. Califano ,  Michael J. Califano

    IPC: F15D1/00 ,  F16K31/12

    CPC classification number: G05D16/103 ,  Y10S137/906 ,  Y10S137/907 ,  Y10S137/908 ,  Y10T137/0357 ,  Y10T137/0396 ,  Y10T137/7781 ,  Y10T137/7782 ,  Y10T137/7793 ,  Y10T137/7795 ,  Y10T137/7808 ,  Y10T137/7811

    Abstract: Disclosed is a cylindrical, single-component two-stage regulator for controlling a pressure and a flow rate of a gas. The regulator includes a housing for holding the two stages having an ingress adapted for connection to a source of gas at a high input pressure and an egress adapted for supplying gas at a lower output pressure than the high input pressure; a first stage for reducing the pressure of the gas from the high input pressure to a fixed intermediate pressure; and a second stage for reducing the pressure of the gas from the fixed intermediate pressure to the lower output pressure and regulating the flow rate of the gas out of the egress. One application of the present invention is for use in scuba (Self-Contained Under-water Breathing Apparatus) applications, where it replaces the traditional two-component user-adjustable regulator. The regulator may be made out of stainless steel, and is small enough to fit into a user's mouthpiece.

    Abstract translation: 公开了一种用于控制气体的压力和流量的圆柱形单组分两级调节器。 调节器包括用于保持两级的壳体，其具有适于连接到高输入压力的气体源的入口和适于以比高输入压力更低的输出压力供应气体的出口; 用于将气体从高输入压力降低到固定中间压力的第一阶段; 以及第二阶段，用于将气体从固定中间压力降低到较低的输出压力，并调节气体流出出口的流量。 本发明的一个应用是用于潜水（自包含水下呼吸装置）应用中，其中它代替传统的双组分用户可调整的调节器。 调节器可以由不锈钢制成，并且足够小以适合使用者的喉舌。

    SYSTEM AND METHOD FOR FLUID FLOW CONTROL
    7.
    发明申请
    SYSTEM AND METHOD FOR FLUID FLOW CONTROL 审中-公开
    流体流量控制系统与方法

    公开(公告)号：US20100107904A1

    公开(公告)日：2010-05-06

    申请号：US12336964

    申请日：2008-12-17

    Applicant: RICHARD KINGSWOOD KELLY

    Inventor： RICHARD KINGSWOOD KELLY

    IPC: A01F15/08 ,  F04B49/00 ,  F04B11/00 ,  F04B49/06 ,  F16L55/04 ,  G05D7/06 ,  B30B15/00

    CPC classification number: G01F1/72 ,  Y10T137/0357

    Abstract: The present invention relates to a system and method for fluid flow control, for particular user in a hay baler. The system involves calculating or inputting a preferred flow rate (the Set Point), measuring the “actual” flow rate of liquid through the system, and controlling the speed of a pump used to move the liquid through the system to ensure that the flow rate is maintained as close as possible to the Set Point flow rate at all times during operation. The flow rate Set Point can be calculated using one or more user or sensor inputs, including the dose rate, the mass flow rate of fodder, the moisture content, etc.

    Abstract translation: 本发明涉及一种用于流体流动控制的系统和方法，用于干草打包机中的特定用户。 该系统包括计算或输入优选流量（设定点），测量通过系统的液体的“实际”流速，以及控制用于将液体移动通过系统的泵的速度，以确保流速 在运行期间始终保持尽可能接近设定点流量。 流量设定点可以使用一个或多个用户或传感器输入计算，包括剂量率，饲料质量流量，含水量等。

    Method and Apparatus for Preventing Slug Flow in Pipelines
    8.
    发明申请
    Method and Apparatus for Preventing Slug Flow in Pipelines 有权
    用于防止管道中流淌流动的方法和装置

    公开(公告)号：US20080264495A1

    公开(公告)日：2008-10-30

    申请号：US12169498

    申请日：2008-07-08

    Applicant: Sunder Ramachandran ,  Christopher T. Gallagher ,  Michael D. Loudermilk ,  Jiang Yang

    Inventor： Sunder Ramachandran ,  Christopher T. Gallagher ,  Michael D. Loudermilk ,  Jiang Yang

    IPC: F16T1/34

    CPC classification number: F17D1/17 ,  C09K8/52 ,  Y10T137/0357 ,  Y10T137/0391 ,  Y10T137/3003

    Abstract: Disclosed is a method and system for controlling the formation of liquid or gas slugs along a pipeline. In embodiments, an injection unit injects a liquid surface tension reducing agent, such as a foamant, into the pipeline upstream of the high point. A control unit can be used to control the injection unit. In certain arrangements, the control unit adjusts the injection of the agent based on measured parameters of interest. In embodiments where the control unit utilizes temperature measurements, one or more temperature sensors are positioned along the pipeline. The control unit utilizes the temperature measurements to determine whether a predetermined condition exists or a liquid or gas slug is present.

    Abstract translation: 公开了一种用于控制沿着管道形成液体或气体s塞的方法和系统。 在实施方案中，注射单元将诸如发泡剂的液体表面张力降低剂注入到高点上游的管道中。 控制单元可用于控制注射单元。 在某些布置中，控制单元基于所感兴趣的测量参数来调整代理的注入。 在控制单元利用温度测量的实施例中，沿管道定位一个或多个温度传感器。 控制单元利用温度测量来确定是否存在预定条件或存在液体或气体块塞。

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