Group-III nitride semiconductor laser device
    2.
    发明授权
    Group-III nitride semiconductor laser device 有权
    III族氮化物半导体激光器件

    公开(公告)号:US08908732B2

    公开(公告)日:2014-12-09

    申请号:US13896918

    申请日:2013-05-17

    摘要: A group-III nitride semiconductor laser device comprises: a laser structure including a semiconductor region and a support base having a semipolar primary surface of group-III nitride semiconductor; a first reflective layer, provided on a first facet of the region, for a lasing cavity of the laser device; and a second reflective layer, provided on a second facet of the region, for the lasing cavity. The laser structure includes a laser waveguide extending along the semipolar surface. A c+ axis vector indicating a axial direction of the base tilts toward an m-axis of the group-III nitride semiconductor at an angle of not less than 63 degrees and less than 80 degrees with respect to a vector indicating a direction of an axis normal to the semipolar surface. The first reflective layer has a reflectance of less than 60% in a wavelength range of 525 to 545 nm.

    摘要翻译: III族氮化物半导体激光器件包括:激光器结构,包括半导体区域和具有III族氮化物半导体的半极性主表面的支撑基底; 第一反射层,设置在该区域的第一面上,用于激光装置的激光腔; 以及设置在该区域的第二面上的用于激光腔的第二反射层。 激光器结构包括沿着半极性表面延伸的激光波导。 指示基座的<0001>轴向的c +轴向量相对于指示方向的矢量以不小于63度且小于80度的角度向III族氮化物半导体的m轴倾斜 垂直于半极性表面的轴。 第一反射层在525至545nm的波长范围内具有小于60%的反射率。