公开(公告)号：US20140021343A1

公开(公告)日：2014-01-23

申请号：US13834484

申请日：2013-03-15

Applicant: Sean R. Kirkpatrick ,  Allen R. Kirkpatrick

Inventor： Sean R. Kirkpatrick ,  Allen R. Kirkpatrick

IPC: H01J37/147

CPC classification number: G03F1/80 ,  B24B37/04 ,  G03F1/82 ,  H01J37/05 ,  H01J37/147 ,  H01J37/317 ,  H01J37/3171 ,  H01J2237/0041 ,  H01J2237/0812 ,  H01J2237/15 ,  H01L21/02115 ,  H01L21/02274 ,  H01L21/26506 ,  H01L21/26513 ,  H01L21/26566 ,  H01L21/31105 ,  H01L21/31111 ,  H01L29/36 ,  H05H3/02 ,  Y10T428/24355 ,  Y10T428/24479 ,  Y10T428/30

Abstract: An apparatus, method and products thereof provide an accelerated neutral beam derived from an accelerated gas cluster ion beam for processing materials.

Abstract translation: 其装置，方法和产品提供从用于加工材料的加速气体簇离子束衍生的加速中性束。

公开(公告)号：US08847148B2

公开(公告)日：2014-09-30

申请号：US13215514

申请日：2011-08-23

Applicant: Sean R. Kirkpatrick ,  Allen R. Kirkpatrick

Inventor： Sean R. Kirkpatrick ,  Allen R. Kirkpatrick

IPC: H01J37/00 ,  H01J37/147 ,  H01J37/317 ,  H01J37/05

CPC classification number: G03F1/80 ,  B24B37/04 ,  G03F1/82 ,  H01J37/05 ,  H01J37/147 ,  H01J37/317 ,  H01J37/3171 ,  H01J2237/0041 ,  H01J2237/0812 ,  H01J2237/15 ,  H01L21/02115 ,  H01L21/02274 ,  H01L21/26506 ,  H01L21/26513 ,  H01L21/26566 ,  H01L21/31105 ,  H01L21/31111 ,  H01L29/36 ,  H05H3/02 ,  Y10T428/24355 ,  Y10T428/24479 ,  Y10T428/30

Abstract: An apparatus, method and products thereof provide an accelerated neutral beam derived from an accelerated gas cluster ion beam for processing materials.

公开(公告)号：US20130105710A1

公开(公告)日：2013-05-02

申请号：US13660295

申请日：2012-10-25

Applicant: Sean R. Kirkpatrick ,  Allen R. Kirkpatrick

Inventor： Sean R. Kirkpatrick ,  Allen R. Kirkpatrick

IPC: G01T7/00

CPC classification number: H01J37/244 ,  H01J37/304 ,  H01J37/317 ,  H01J2237/0812 ,  H01J2237/24514 ,  H01L21/26566

Abstract: An apparatus and method for characterizing a particle beam provides receiving a particle beam in a central region of a reduced pressure enclosure; impacting the received beam against a beam strike that is thermally isolated from the enclosure; measuring a temperature change of the beam strike due to the impacting beam; measuring a pressure change in the enclosure due to receiving the beam; and processing the measured temperature change and the measured pressure change to determine beam characteristics.

Abstract translation: 用于表征粒子束的装置和方法提供了在减压外壳的中心区域中接收粒子束; 撞击接收的梁抵抗与外壳热隔离的梁撞击; 测量由于冲击梁造成的射束的温度变化; 测量由于接收光束而导致的外壳中的压力变化; 并处理测量的温度变化和测量的压力变化以确定光束特性。

公开(公告)号：US09117628B2

公开(公告)日：2015-08-25

申请号：US13660295

申请日：2012-10-25

Applicant: Sean R. Kirkpatrick ,  Allen R. Kirkpatrick

Inventor： Sean R. Kirkpatrick ,  Allen R. Kirkpatrick

IPC: H01J37/244 ,  H01L21/265 ,  H01J37/304 ,  H01J37/317

CPC classification number: H01J37/244 ,  H01J37/304 ,  H01J37/317 ,  H01J2237/0812 ,  H01J2237/24514 ,  H01L21/26566

Abstract: An apparatus and method for characterizing a particle beam provides receiving a particle beam in a central region of a reduced pressure enclosure; impacting the received beam against a beam strike that is thermally isolated from the enclosure; measuring a temperature change of the beam strike due to the impacting beam; measuring a pressure change in the enclosure due to receiving the beam; and processing the measured temperature change and the measured pressure change to determine beam characteristics.

Abstract translation: 用于表征粒子束的装置和方法提供了在减压外壳的中心区域中接收粒子束; 撞击接收的梁抵抗与外壳热隔离的梁撞击; 测量由于冲击梁造成的射束的温度变化; 测量由于接收光束而导致的外壳中的压力变化; 并处理测量的温度变化和测量的压力变化以确定光束特性。

公开(公告)号：US10202684B2

公开(公告)日：2019-02-12

申请号：US14466242

申请日：2014-08-22

Applicant: Sean R. Kirkpatrick ,  Allen R. Kirkpatrick ,  Michael J. Walsh

Inventor： Sean R. Kirkpatrick ,  Allen R. Kirkpatrick ,  Michael J. Walsh

IPC: C23C14/58 ,  H01J37/32 ,  G02B1/12 ,  G02B1/02 ,  H01J37/05 ,  H01J37/317 ,  H01J37/147

Abstract: A method for Neutral Beam irradiation derived from gas cluster ion beams and articles produced thereby including optical elements.

公开(公告)号：US10181402B2

公开(公告)日：2019-01-15

申请号：US15047553

申请日：2016-02-18

Applicant: Sean R. Kirkpatrick ,  Allen R. Kirkpatrick ,  Michael J. Walsh ,  Richard C. Svrluga

Inventor： Sean R. Kirkpatrick ,  Allen R. Kirkpatrick ,  Michael J. Walsh ,  Richard C. Svrluga

IPC: H01L29/167 ,  H01J37/05 ,  H01L21/265 ,  H01J37/08 ,  H01J37/147 ,  H01J37/317

Abstract: A method of treating a surface of a silicon substrate forms an accelerated gas cluster ion beam of carbon atoms, promotes fragmentation and/or dissociation of gas cluster ions in the beam, removes charged particles from the beam to form a neutral beam, and treats a portion of a surface of the silicon substrate by irradiating it with the neutral beam. A silicon substrate surface layer of SiCX (0.05

公开(公告)号：US20160172197A1

公开(公告)日：2016-06-16

申请号：US15047553

申请日：2016-02-18

Applicant: Sean R. Kirkpatrick ,  Allen R. Kirkpatrick ,  Michael J. Walsh ,  Richard C. Svrluga

Inventor： Sean R. Kirkpatrick ,  Allen R. Kirkpatrick ,  Michael J. Walsh ,  Richard C. Svrluga

IPC: H01L21/265 ,  H01L29/167

CPC classification number: H01L21/2652 ,  C03C23/005 ,  C03C2204/08 ,  H01J37/05 ,  H01J37/08 ,  H01J37/147 ,  H01J37/317 ,  H01J37/3171 ,  H01J2237/0041 ,  H01J2237/0812 ,  H01J2237/15 ,  H01J2237/31701 ,  H01L21/02115 ,  H01L21/02238 ,  H01L21/02274 ,  H01L21/26506 ,  H01L21/26513 ,  H01L21/26566 ,  H01L21/31116 ,  H01L21/32115 ,  H01L21/324 ,  H01L29/167 ,  H01L29/36 ,  Y10T428/24355 ,  Y10T428/24479 ,  Y10T428/30

Abstract: A method for treating a silicon substrate, and a silicon substrate, provide a surface treated with an accelerated neutral beam.

Abstract translation: 用于处理硅衬底和硅衬底的方法提供用加速中性束处理的表面。

公开(公告)号：US20130213933A1

公开(公告)日：2013-08-22

申请号：US13590405

申请日：2012-08-21

Applicant: Sean R. Kirkpatrick ,  Allen R. Kirkpatrick

Inventor： Sean R. Kirkpatrick ,  Allen R. Kirkpatrick

IPC: G01N23/00

CPC classification number: G01N23/00 ,  G01N23/225 ,  H01J37/08 ,  H01J37/305 ,  H01J2237/0041 ,  H01J2237/0812 ,  H01J2237/3151

Abstract: Apparatus and methods are disclosed for employing an accelerated neutral beam derived from an accelerated gas cluster ion beam as a physical etching beam for providing reduced material mixing at the etched surface, compared to previous techniques. This results in the ability to achieve improved depth profile resolution in measurements by analytical instruments such as SIMS and XPS (or ESCA) analytical instruments.

Abstract translation: 公开了用于采用从加速气体团簇离子束衍生的加速中性束作为物理蚀刻光束的设备和方法，用于在蚀刻表面提供减少的材料混合，与先前的技术相比。 这样就可以通过SIMS和XPS（或ESCA）分析仪器等分析仪器在测量中实现改进的深度分布分辨率。

公开(公告)号：US20150294838A1

公开(公告)日：2015-10-15

申请号：US14571533

申请日：2014-12-16

Applicant: Sean R. Kirkpatrick ,  Allen R. Kirkpatrick ,  Michael J. Walsh ,  Richard C. Svrluga

Inventor： Sean R. Kirkpatrick ,  Allen R. Kirkpatrick ,  Michael J. Walsh ,  Richard C. Svrluga

IPC: H01J37/317 ,  H01J37/08 ,  H01J37/147 ,  H01J37/05

CPC classification number: H01J37/3171 ,  C03C23/005 ,  C03C2204/08 ,  H01J37/05 ,  H01J37/08 ,  H01J37/147 ,  H01J37/317 ,  H01J2237/0041 ,  H01J2237/0812 ,  H01J2237/15 ,  H01J2237/31701 ,  H01L21/02115 ,  H01L21/02238 ,  H01L21/02274 ,  H01L21/26506 ,  H01L21/26513 ,  H01L21/26566 ,  H01L21/31105 ,  H01L21/31116 ,  H01L21/32115 ,  H01L29/36 ,  H01M4/04 ,  H01M10/04 ,  H01M10/0585 ,  H01M2004/021 ,  Y10T428/24355 ,  Y10T428/24479 ,  Y10T428/30

Abstract: A method of improving the surface of an object treats the surface with a neutral beam formed from a gas cluster ion mean to create a surface texture and/or increase surface area.

Abstract translation: 改善物体表面的方法用由气体团簇离子形成的中性束来处理表面，以产生表面纹理和/或增加表面积。

公开(公告)号：US20140363678A1

公开(公告)日：2014-12-11

申请号：US14466242

申请日：2014-08-22

Applicant: Sean R. Kirkpatrick ,  Allen R. Kirkpatrick ,  Michael J. Walsh

Inventor： Sean R. Kirkpatrick ,  Allen R. Kirkpatrick ,  Michael J. Walsh

IPC: C23C14/58 ,  G02B1/12 ,  G02B1/02 ,  H01J37/32

CPC classification number: C23C14/5833 ,  G02B1/02 ,  G02B1/12 ,  H01J37/05 ,  H01J37/147 ,  H01J37/3171 ,  H01J37/32816 ,  H01J2237/0041 ,  H01J2237/0812 ,  H01J2237/15 ,  Y10T428/30

Abstract: A method for Neutral Beam irradiation derived from gas cluster ion beams and articles produced thereby including optical elements.

Abstract translation: 一种由气体团簇离子束产生的中性光束照射方法及其制造的物品，包括光学元件。