-
公开(公告)号：US11676263B2
公开(公告)日：2023-06-13
申请号：US17529403
申请日：2021-11-18
Applicant: Samsung Electronics Co., Ltd.
Inventor： Dong-Hyub Lee , Kyungsik Kang , Jeong-Gil Kim , Jinyong Kim , Hochul Kim , Yozo Matsuda , Youngduk Suh , Seungkoo Lee , Sungho Jang , Yoojin Jeong
IPC: G06T7/00 , G02B5/10 , G02B5/20 , G02B5/08 , G01M11/00 , G03F7/20 , H04N23/56 , G02B27/10 , G03F7/00
CPC classification number: G06T7/0004 , G01M11/005 , G02B5/0816 , G02B5/0891 , G02B5/10 , G02B5/208 , G02B27/1013 , G03F7/70916 , H04N23/56 , G06T2207/10152
Abstract: An extreme ultraviolet (EUV) collector inspection apparatus and method capable of precisely inspecting a contamination state of an EUV collector and EUV reflectance in accordance with the contamination state are provided. The EUV collector inspection apparatus includes a light source arranged in front of an EUV collector to be inspected and configured to output light in a visible light (VIS) band from UV rays, an optical device configured to output narrowband light from the light, and a camera configured to perform imaging from an UV band to a VIS band. An image by wavelength of the EUV collector is obtained by using the optical device and the camera and a contamination state of the EUV collector is inspected.
-
Patent Agency Ranking
公开(公告)号：US09642234B2
公开(公告)日：2017-05-02
申请号：US15064942
申请日：2016-03-09
Applicant: Samsung Electronics Co., Ltd.
Inventor： Seungkoo Lee , Insung Kim
CPC classification number: H05G2/006 , G02B19/0095 , H05G2/008
Abstract: Described is an extreme ultraviolet (EUV) light generator apparatus. The EUV light generator apparatus includes a droplet nozzle, a central electromagnet including a central coil wound around the droplet nozzle, and a droplet generator including side electromagnets around the central electromagnet.
-
3.发明申请EUV Light Generator Apparatus Having a Droplet Generator Configured to Control a Droplet Position Using a Magnetic Field 有权具有配置为使用磁场控制液滴位置的液滴发生器的EUV发光装置公开(公告)号：US20170048956A1
公开(公告)日：2017-02-16
申请号：US15064942
申请日：2016-03-09
Applicant: Samsung Electronics Co., Ltd.
Inventor： Seungkoo Lee , lnsung KIM
CPC classification number: H05G2/006 , G02B19/0095 , H05G2/008
Abstract: Described is an extreme ultraviolet (EUV) light generator apparatus. The EUV light generator apparatus includes a droplet nozzle, a central electromagnet including a central coil wound around the droplet nozzle, and a droplet generator including side electromagnets around the central electromagnet.
Abstract translation: 描述了一种极紫外（EUV）光发生器装置。 EUV发光装置包括液滴喷嘴，包括卷绕在液滴喷嘴上的中心线圈的中心电磁体，以及包括在中央电磁体周围的侧面电磁体的液滴发生器。
-
公开(公告)号：US11828952B2
公开(公告)日：2023-11-28
申请号：US17218891
申请日：2021-03-31
Applicant: Samsung Electronics Co., Ltd.
Inventor： Dohyung Kim , Seongchul Hong , Kyungsik Kang , Kyungbin Park , Motoshi Sakai , Seungkoo Lee , Jungchul Lee
CPC classification number: G02B27/1073 , G02B27/106 , G02B27/108 , G02B27/141 , G03F7/70191 , H01S3/0071 , H01S3/2308 , H01S3/2383 , H05G2/008 , H01S3/2232
Abstract: A light source capable of operating third and fourth reflection mirrors included in a beam splitting device in conjunction with movements of first and second reflection mirrors included in a beam transfer device and an optical assembly, respectively. The third and fourth reflection mirrors are disposed on optical paths of a pre-pulse and a main pulse emitted from first and second pulse generators, respectively. The light source operates the third and fourth reflection mirrors to offset an excessive compensation of the main pulse caused in a process of compensating for an optical path error of the pre-pulse. The light source may be included in an extreme ultraviolet light source system.
-
公开(公告)号：US20220309643A1
公开(公告)日：2022-09-29
申请号：US17529403
申请日：2021-11-18
Applicant: Samsung Electronics Co., Ltd.
Inventor： Dong-Hyub Lee , Kyungsik Kang , Jeong-Gil Kim , Jinyong Kim , Hochul Kim , Yozo Matsuda , Youngduk Suh , Seungkoo Lee , Sungho Jang , Yoojin Jeong
Abstract: An extreme ultraviolet (EUV) collector inspection apparatus and method capable of precisely inspecting a contamination state of an EUV collector and EUV reflectance in accordance with the contamination state are provided. The EUV collector inspection apparatus includes a light source arranged in front of an EUV collector to be inspected and configured to output light in a visible light (VIS) band from UV rays, an optical device configured to output narrowband light from the light, and a camera configured to perform imaging from an UV band to a VIS band. An image by wavelength of the EUV collector is obtained by using the optical device and the camera and a contamination state of the EUV collector is inspected.
-
公开(公告)号：US20220066225A1
公开(公告)日：2022-03-03
申请号：US17218891
申请日：2021-03-31
Applicant: Samsung Electronics Co., Ltd.
Inventor： Dohyung Kim , Seongchul Hong , Kyungsik Kang , Kyungbin Park , Motoshi Sakai , Seungkoo Lee , Jungchul Lee
Abstract: A light source capable of operating third and fourth reflection mirrors included in a beam splitting device in conjunction with movements of first and second reflection mirrors included in a beam transfer device and an optical assembly, respectively. The third and fourth reflection mirrors are disposed on optical paths of a pre-pulse and a main pulse emitted from first and second pulse generators, respectively. The light source operates the third and fourth reflection mirrors to offset an excessive compensation of the main pulse caused in a process of compensating for an optical path error of the pre-pulse. The light source may be included in an extreme ultraviolet light source system.
-
-
-
-
-
Search Results
6
records
(took 0.013 seconds)
