公开(公告)号：US20240218561A1

公开(公告)日：2024-07-04

申请号：US18515664

申请日：2023-11-21

Applicant: Samsung Electronics Co., Ltd.

Inventor： Janghwi Lee ,  Yeontae Kim ,  Junbum Park ,  Hunyong Park ,  Suhwan Park ,  Sangwoo Bae ,  Motoshi Sakai ,  Wondon Joo ,  Jaeho Jin

IPC: C30B25/16 ,  C30B25/12

CPC classification number: C30B25/16 ,  C30B25/12

Abstract: A thin-film deposition apparatus includes: a housing; a chamber located within the housing and providing an internal space; a platform disposed within the chamber and configured to support a substrate; a reflector disposed within the housing and disposed outside the chamber; a light source disposed between opposing walls of the reflector and configured to radiate light onto the substrate; a light receiver disposed within the housing, spaced apart from the light source with a portion of the reflector therebetween, and having a hole through which light emitted from the substrate is introduced; an optical cable connected to the light receiver and extending to the outside of the housing; and a sensor disposed outside the housing, connected to the optical cable, and configured to measure a temperature of the substrate by analyzing light transmitted from the optical cable.

公开(公告)号：US11778719B2

公开(公告)日：2023-10-03

申请号：US16927050

申请日：2020-07-13

Applicant: Samsung Electronics Co., Ltd.

Inventor： Dohyung Kim ,  Seongchul Hong ,  Kyungsik Kang ,  Insung Kim ,  Motoshi Sakai ,  Seulgi Lee ,  Jungchul Lee

IPC: H01S3/23 ,  H05G2/00 ,  G02B26/08 ,  H01S3/00 ,  G02B19/00

CPC classification number: H05G2/008 ,  G02B19/0047 ,  G02B26/0816 ,  G02B26/0875 ,  H01S3/0071 ,  H01S3/2316

Abstract: A laser beam delivery apparatus of an extreme ultra violet light source may include a high power seed module configured to generate a laser beam, a power amplifier configured to amplify the laser beam generated by the high power seed module, a beam transfer module configured to collect and move the laser beam amplified by the power amplifier, a final focusing assembly optical platform configured to adjust focus of the laser beam collected and moved by the beam transfer module, and a focusing unit configured to focus the laser beam with the focus adjusted by the final focusing assembly optical platform to a target droplet. The power amplifier may include a position adjuster configured to adjust a position of the laser beam. The position adjuster may include a refraction plate having a flat surface. The power amplifier may include a pointing adjuster, which may include a mirror.

公开(公告)号：US11828952B2

公开(公告)日：2023-11-28

申请号：US17218891

申请日：2021-03-31

Applicant: Samsung Electronics Co., Ltd.

Inventor： Dohyung Kim ,  Seongchul Hong ,  Kyungsik Kang ,  Kyungbin Park ,  Motoshi Sakai ,  Seungkoo Lee ,  Jungchul Lee

IPC: G02B27/10 ,  H05G2/00 ,  G02B27/14 ,  H01S3/00 ,  H01S3/23 ,  G03F7/00 ,  H01S3/223

CPC classification number: G02B27/1073 ,  G02B27/106 ,  G02B27/108 ,  G02B27/141 ,  G03F7/70191 ,  H01S3/0071 ,  H01S3/2308 ,  H01S3/2383 ,  H05G2/008 ,  H01S3/2232

Abstract: A light source capable of operating third and fourth reflection mirrors included in a beam splitting device in conjunction with movements of first and second reflection mirrors included in a beam transfer device and an optical assembly, respectively. The third and fourth reflection mirrors are disposed on optical paths of a pre-pulse and a main pulse emitted from first and second pulse generators, respectively. The light source operates the third and fourth reflection mirrors to offset an excessive compensation of the main pulse caused in a process of compensating for an optical path error of the pre-pulse. The light source may be included in an extreme ultraviolet light source system.

公开(公告)号：US20220066225A1

公开(公告)日：2022-03-03

申请号：US17218891

申请日：2021-03-31

Applicant: Samsung Electronics Co., Ltd.

Inventor： Dohyung Kim ,  Seongchul Hong ,  Kyungsik Kang ,  Kyungbin Park ,  Motoshi Sakai ,  Seungkoo Lee ,  Jungchul Lee

IPC: G02B27/10 ,  H05G2/00 ,  G02B27/14 ,  H01S3/00 ,  H01S3/23 ,  G03F7/20

Abstract: A light source capable of operating third and fourth reflection mirrors included in a beam splitting device in conjunction with movements of first and second reflection mirrors included in a beam transfer device and an optical assembly, respectively. The third and fourth reflection mirrors are disposed on optical paths of a pre-pulse and a main pulse emitted from first and second pulse generators, respectively. The light source operates the third and fourth reflection mirrors to offset an excessive compensation of the main pulse caused in a process of compensating for an optical path error of the pre-pulse. The light source may be included in an extreme ultraviolet light source system.