摘要:
An acoustical resonator comprising top and bottom electrodes that sandwich a PZ layer. The resonance frequency of the acoustical resonator may be adjusted after fabrication by utilizing heating elements included in the acoustical resonator and/or by adjusting the thickness of a tuning layer. In the preferred embodiment of the present invention, the electrodes comprise Mo layers. One embodiment of the present invention is constructed on a Si.sub.3 N.sub.4 membrane. A second embodiment of the present invention is constructed such that it is suspended over a substrate on metallic columns. In the preferred embodiment of the present invention, the electrodes are deposited by a method that minimizes the stress in the electrodes.
摘要翻译:包括夹着PZ层的顶部和底部电极的声学谐振器。 可以通过利用声谐振器中包含的加热元件和/或通过调节调谐层的厚度来调整声学谐振器的共振频率。 在本发明的优选实施例中,电极包括Mo层。 本发明的一个实施方案构造在Si 3 N 4膜上。 本发明的第二实施例构造成使得其悬挂在金属柱上的基板上。 在本发明的优选实施例中,通过使电极中的应力最小化的方法来沉积电极。
摘要:
A microelectromechanical system includes a first wafer, a second wafer including a moveable portion, and a third wafer. The movable portion is movable between the first wafer and the third wafer. The first wafer, the second wafer, and the third wafer are bonded together.
摘要:
A micro-electro-mechanical system (MEMS) optical switch actuator and method for fabricating the actuator provide an anchor assembly that functions as a second electrode. The actuator has a reflective element assembly and a first electrode assembly for moving the reflective element assembly from a first position to a second position based on a switching signal. The actuator further includes an anchor assembly coupled to the reflective element assembly such that a spring force is generated in the reflective element assembly when the reflective element assembly is in the second position. The anchor assembly is electrically conductive such that the switching signal generates an electrostatic force between the anchor assembly and the first electrode assembly. The method for fabricating the actuator includes the step of coupling a multi-level reflection assembly to an optical circuit. The reflection assembly has an electrically conductive anchor assembly positioned at a first level with respect to the optical circuit and a mirror positioned at a second level with respect to the optical circuit. An insulative mirror beam layer is then coupled to the reflection assembly, and an electrode assembly is coupled to the mirror beam layer. The electrode assembly is coupled such that a voltage potential between the anchor assembly and the electrode assembly causes the electrode assembly to force the mirror beam layer and the mirror from the first switching position to the second switching position.
摘要:
A palladium contact and a gasket are formed on a first wafer. The gasket and contact are simultaneously engaged with a silicon layer of a second wafer. The wafers are then heated to a temperature that both forms a bond between the palladium contact of the first wafer with the silicon layer of the second wafer and that fuses the gasket to the second wafer. Therefore, when the temperature is decreased, the palladium-silicon bond maintains the alignment of the two wafers with respect to one another, and the gasket hardens to form seal around a periphery of the two wafers. By placing the two wafers in a vacuum environment prior to engaging the two wafers, the space encompassed by the gasket and the two wafers forms a sealed vacuum during the heating process. Therefore, the heating process not only forms a palladium-silicon bond between the two wafers, but it also forms a vacuum seal around selected components included within either of the two wafers.
摘要:
Two wafers are bonded together through an annealing process that maintains temperatures at CMOS compatible levels (i.e., below 500 degrees Celsius). A layer of palladium (Pd) is formed on a first wafer. Preferably an adhesion layer of chromium (Cr) attaches the palladium layer to the first wafer. The palladium layer is engaged with silicon (Si) from a second wafer, and the engaged wafers are annealed to form a palladium-silicide (PdSi) bond between the palladium layer of the first wafer and the silicon of the second wafer. In addition to bonding the first wafer to the second wafer, the palladium-silicon bond may be used to form an electrical connection between the two wafers so that circuits on both wafers may communicate to one another through the palladium-silicon bond.
摘要:
A pressure regulator that sets the pressure of a liquid to a predetermined pressure differential below a reference pressure, such as atmospheric pressure. The pressure regulator comprises a liquid delivery channel and a capillary array. The liquid delivery channel includes a liquid input and a liquid output. The liquid flows through the liquid delivery channel from the liquid input to the liquid output. The capillary array is composed of ones of an elongate capillary. The capillary includes a first end in fluid communication with the liquid delivery channel and a second end in pressure communication with a source of the reference pressure. The liquid flows through the first end into the capillary to form a liquid surface in the capillary. The second end is remote from the first end. The capillary has cross-sectional dimensions in relation to the surface tension of the liquid and the angle of contact between the liquid and the capillary such that the pressure drop across the liquid surface in the capillary is equal to the predetermined pressure differential.
摘要:
A moveable micromirror includes a supporting structure, a flexible post extending from the supporting structure, and a table extending radially from the end of the post along a plane generally perpendicular to the post, the table having a reflective surface facing away from the supporting structure. The post, preferably formed of single-crystal silicon, is dimensioned to be sufficiently flexible to allow the reflective surface to be selectively moveable and positionable, with at least two degrees of freedom, when urged by a suitable actuating force. A method of making an array of moveable micromirrors of this type includes deep etching a silicon substrate so as to form posts surrounded by trenches, etching back the surface of the substrate around the posts so as to allow the posts to protrude beyond the surface of the substrate, and affixing a table with a reflective surface thereon to the tops of a plurality of the posts.
摘要:
Data storage media are integrated into a microfabricated data storage system. Each data storage medium is located on one surface of a movable support. Flexures connected to the movable support allow the medium to move within a plane so that data can be stored at different locations on the medium, but significantly resist any out of the plane motion of the medium. Therefore, tips or other devices for writing or reading to or from the medium can be placed a small distance from the medium, thereby facilitating microfabrication of the data storage system. First electrodes are coupled to a second surface of the movable support opposite the medium. Second electrodes are located opposite the first electrodes to form an electrostatic surface actuator. Electric fields generated by the second electrodes interact with an electric field generated by the first electrodes to apply a force to the first electrodes and, hence, the movable support and the medium. After forming the media on a microfabricated wafer, the wafer can be bonded to another microfabricated wafer, and the resulting structure can thereby be sealed by a gasket to seal the media within the data storage system. Preferably the bonding process to join the microfabricated wafers is CMOS (complementary metal-oxide semiconductor) compatible by using elements such as palladium and silicon that bond at relatively low temperatures.
摘要:
A thin micromechanical device is fabricated in a way that is mechanically compatible with wafer handling for conventional-thickness wafers. A removable bonding layer bonds a fabrication wafer to a substantially conventional-thickness handle wafer to form a bonded wafer pair. The micromechanical device is formed in the fabrication wafer by subjecting the bonded wafer pair to processing including wafer handling for conventional-thickness wafers. The micromechanical device is formed to include part of the fabrication wafer. Finally, the bonding layer underlying the micromechanical device is removed to release the micromechanical device from the handle wafer.