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US5882532A Fabrication of single-crystal silicon structures using sacrificial-layer wafer bonding 失效
使用牺牲层晶片接合制造单晶硅结构

Fabrication of single-crystal silicon structures using sacrificial-layer
wafer bonding
摘要:
A thin micromechanical device is fabricated in a way that is mechanically compatible with wafer handling for conventional-thickness wafers. A removable bonding layer bonds a fabrication wafer to a substantially conventional-thickness handle wafer to form a bonded wafer pair. The micromechanical device is formed in the fabrication wafer by subjecting the bonded wafer pair to processing including wafer handling for conventional-thickness wafers. The micromechanical device is formed to include part of the fabrication wafer. Finally, the bonding layer underlying the micromechanical device is removed to release the micromechanical device from the handle wafer.
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