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公开(公告)号:USD938925S1
公开(公告)日:2021-12-21
申请号:US29710616
申请日:2019-10-24
Designer: Ryosuke Okawa , Toshikazu Imai , Kazuma Yoshida , Tsubasa Inoue , Takeshi Imamura
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公开(公告)号:US11201017B2
公开(公告)日:2021-12-14
申请号:US16525027
申请日:2019-07-29
Inventor: Takeshi Imamura , Toshihisa Miura
Abstract: A method for manufacturing a capacitor includes a step of forming a case integrated with a terminal unit designed to be connected with an external terminal, and a step of housing a capacitor element in the case so that the terminal unit is electrically connected to the capacitor element. The step of forming the case includes heating a metal mold to a temperature less than or equal to a glass transition temperature of a thermoplastic resin that is a material for the case. The metal mold internally has a mold part that is a hollow part having a shape of the case. And the step of forming the case further includes, after the heating of the metal mold and inserting the terminal unit into the mold part, injecting the thermoplastic resin in a molten state into the mold part of the metal mold.
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公开(公告)号:USD934820S1
公开(公告)日:2021-11-02
申请号:US29710622
申请日:2019-10-24
Designer: Ryosuke Okawa , Toshikazu Imai , Kazuma Yoshida , Tsubasa Inoue , Takeshi Imamura
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公开(公告)号:US12027318B2
公开(公告)日:2024-07-02
申请号:US17695227
申请日:2022-03-15
Inventor: Yoshiki Kamimura , Takeshi Imamura , Akihiro Morikawa , Wataru Tamura
Abstract: A capacitor includes a bus bar. The bus bar includes a bus bar body member and a terminal formation member configured to be superposed on and fixed to a terminal formation part of the bus bar body member. In the terminal formation part, a plurality of first connection terminal parts are formed so as to be arranged in one direction, by portions of the terminal formation part being cut and raised. In the terminal formation member, a plurality of second connection terminal parts are formed so as to be arranged in one direction, by portions of the terminal formation member being cut and raised, and second openings are formed in places where the portions have been cut and raised. The first connection terminal parts and the second connection terminal parts are alternately arranged in one direction, by the first connection terminal parts being passed through the second openings.
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公开(公告)号:US10811189B2
公开(公告)日:2020-10-20
申请号:US16052200
申请日:2018-08-01
Inventor: Takeshi Imamura , Toshihisa Miura , Eriko Kanatani
Abstract: A rear bus bar includes a rear electrode connecting part connected to an upper end electrode of a capacitor element, and a rear overlapping part is led out upward from a rear electrode connecting part at a position overlapping with the upper end electrode. A front bus bar includes a front electrode connecting part connected to a lower end electrode of the capacitor element, a first relay part, and a second relay part extending along the upper end electrode, and a front overlapping part is led out upward from the second relay part. An insulation module includes a first insulating part interposed between the front overlapping part and the rear overlapping part, and a second insulating part interposed between the upper end electrode and the second relay part.
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公开(公告)号:US10340347B1
公开(公告)日:2019-07-02
申请号:US16146272
申请日:2018-09-28
Inventor: Kazuma Yoshida , Takeshi Imamura , Toshikazu Imai , Ryosuke Okawa , Ryou Kato
IPC: H01L29/417 , H01L23/00 , H01L27/088 , H01L29/423 , H01L29/78
CPC classification number: H01L29/41775 , H01L23/562 , H01L27/088 , H01L29/41741 , H01L29/4236 , H01L29/7827
Abstract: A semiconductor device includes a first gate electrode, a plurality of first source electrodes, a second gate electrode, and a plurality of second source electrodes. The first gate electrode is arranged with no other electrode between the first gate electrode and a first short side of the semiconductor substrate. The plurality of first source electrodes include a plurality of approximately rectangular first source electrodes arranged in stripes extending parallel to the lengthwise direction of the semiconductor substrate. The second gate electrode is arranged with no other electrode between the second gate electrode and a second short side of the semiconductor substrate. The plurality of second source electrodes include a plurality of approximately rectangular second source electrodes arranged in stripes extending parallel to the lengthwise direction of the semiconductor substrate.
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公开(公告)号:USD813182S1
公开(公告)日:2018-03-20
申请号:US29592124
申请日:2017-01-26
Designer: Toshikazu Imai , Ryosuke Okawa , Eiji Yasuda , Takeshi Imamura , Kazuma Yoshida , Shigetoshi Sota
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公开(公告)号:US10541310B2
公开(公告)日:2020-01-21
申请号:US16418617
申请日:2019-05-21
Inventor: Kazuma Yoshida , Takeshi Imamura , Toshikazu Imai , Ryosuke Okawa , Ryou Kato
IPC: H01L29/417 , H01L29/78 , H01L27/088 , H01L23/00 , H01L29/423
Abstract: A semiconductor device includes a first gate electrode, a plurality of first source electrodes, a second gate electrode, and a plurality of second source electrodes. The first gate electrode is arranged with no other electrode between the first gate electrode and a first short side of the semiconductor substrate. The plurality of first source electrodes include a plurality of approximately rectangular first source electrodes arranged in stripes extending parallel to the lengthwise direction of the semiconductor substrate. The second gate electrode is arranged with no other electrode between the second gate electrode and a second short side of the semiconductor substrate. The plurality of second source electrodes include a plurality of approximately rectangular second source electrodes arranged in stripes extending parallel to the lengthwise direction of the semiconductor substrate.
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公开(公告)号:US20190157403A1
公开(公告)日:2019-05-23
申请号:US16261232
申请日:2019-01-29
Inventor: Eiji Yasuda , Toshikazu Imai , Ryosuke Okawa , Takeshi Imamura , Mitsuaki Sakamoto , Kazuma Yoshida , Masaaki Hirako , Yasuyuki Masumoto , Shigetoshi Sota , Tomonari Oota
IPC: H01L29/417 , H01L29/36 , H01L29/78 , H01L27/088 , H01L23/498 , H01L23/13 , H01L29/45 , H01L23/00
Abstract: A semiconductor device includes a semiconductor substrate including a first conductivity-type impurity, a low-concentration impurity layer including a first conductivity-type impurity having a concentration lower than a concentration of the first conductivity-type impurity in the semiconductor substrate, a backside electrode including a metal material, and first and second transistors in the low-concentration impurity layer. The first transistor includes a first source electrode and a first gate electrode on a surface of the low-concentration impurity layer, the second transistor includes a second source electrode and a second gate electrode on the surface of the low-concentration impurity layer. The semiconductor substrate serves as a common drain region of the transistors. The thickness of the backside electrode ranges from 25 to 35 μm, and the ratio of the thickness of the backside electrode to the thickness of a semiconductor layer including the semiconductor substrate and the low-concentration impurity layer is 0.32 or more.
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