公开(公告)号：US07602504B2

公开(公告)日：2009-10-13

申请号：US12059444

申请日：2008-03-31

申请人： Miwako Ando ,  Yoshinori Ohsaki

发明人： Miwako Ando ,  Yoshinori Ohsaki

IPC分类号： G01B11/02

CPC分类号： G03F7/7085 ,  G03F7/706

摘要： An exposure apparatus, which equipped with a projection optical system that is configured to project a pattern of an original onto a substrate, includes an interferometer configured to measure a wavefront in a first direction and a wavefront in a second direction of light passed through the projection optical system; a focus detecting unit configured to detect focus positions in the first and second directions of the projection optical system; and a calculating unit configured to calculate wavefront aberration of the projection optical system on the basis of the measurement result of the interferometer and the detection result of the focus detecting unit.

摘要翻译： 配备有投影光学系统的投影光学系统的曝光装置，其配置为将原稿的图案投影到基板上，包括：干涉仪，被配置为测量第一方向上的波前和沿着第二方向的波前方， 光学系统; 焦点检测单元，被配置为检测投影光学系统的第一和第二方向上的焦点位置; 以及计算单元，被配置为基于所述干涉仪的测量结果和所述焦点检测单元的检测结果来计算所述投影光学系统的波前像差。

公开(公告)号：US20080259349A1

公开(公告)日：2008-10-23

申请号：US12059444

申请日：2008-03-31

申请人： Miwako Ando ,  Yoshinori Ohsaki

发明人： Miwako Ando ,  Yoshinori Ohsaki

IPC分类号： G01B11/02

CPC分类号： G03F7/7085 ,  G03F7/706

摘要： An exposure apparatus, which equipped with a projection optical system that is configured to project a pattern of an original onto a substrate, includes an interferometer configured to measure a wavefront in a first direction and a wavefront in a second direction of light passed through the projection optical system; a focus detecting unit configured to detect focus positions in the first and second directions of the projection optical system; and a calculating unit configured to calculate wavefront aberration of the projection optical system on the basis of the measurement result of the interferometer and the detection result of the focus detecting unit.

摘要翻译： 配备有投影光学系统的投影光学系统的曝光装置，其配置为将原稿的图案投影到基板上，包括：干涉仪，被配置为测量第一方向上的波前和沿着第二方向的波前方， 光学系统; 焦点检测单元，被配置为检测投影光学系统的第一和第二方向上的焦点位置; 以及计算单元，被配置为基于干涉仪的测量结果和焦点检测单元的检测结果来计算投影光学系统的波前像差。

公开(公告)号：US20060119821A1

公开(公告)日：2006-06-08

申请号：US11246036

申请日：2005-10-06

申请人： Miwako Ando ,  Yoshinori Ohsaki

发明人： Miwako Ando ,  Yoshinori Ohsaki

IPC分类号： G03B27/52

CPC分类号： G03F7/706

摘要： Provided is an exposure apparatus including a projection optical system for projecting an exposure pattern onto an object to be exposed, a measurement device for measuring an optical performance of the projection optical system by guiding light to the projection optical system through a measurement pattern to detect interference fringes formed by the light emitted from the projection optical system, and an adjustment portion for adjusting a numerical aperture of the light that illuminates the measurement pattern, in which the adjustment portion adjusts the numerical aperture so that the visibility of the interference fringes V, which is defined as V=(Imax−Imin)/(Imax+Imin), is equal to or more than 0.3, where Imax represents the maximum amount of light of the interference fringes, and Imin represents the minimum amount of light of the interference fringes, when the measurement device measures an optical performance of the projection optical system.

摘要翻译： 本发明提供一种曝光装置，包括用于将曝光图案投影到被曝光物体上的投影光学系统，用于通过测量图案将光引导到投影光学系统以检测干涉来测量投影光学系统的光学性能的测量装置 由投影光学系统发射的光形成的条纹以及用于调节照亮测量图案的光的数值孔径的调节部分，其中调节部分调节数值孔径，使得干涉条纹V的可见度，其中 被定义为V =（I max max -I min min）/（I max max + I min min），是 等于或大于0.3，其中I 最大表示干涉条纹的最大光量，I min表示干涉条纹的最小光量，当 测量装置测量光的性能 e投影光学系统。

公开(公告)号：US07417712B2

公开(公告)日：2008-08-26

申请号：US11246036

申请日：2005-10-06

申请人： Miwaki Ando ,  Yoshinori Ohsaki

发明人： Miwaki Ando ,  Yoshinori Ohsaki

IPC分类号： G03B27/54 ,  G03B27/52

CPC分类号： G03F7/706

摘要： Provided is an exposure apparatus including a projection optical system for projecting an exposure pattern onto an object to be exposed, a measurement device for measuring an optical performance of the projection optical system by guiding light to the projection optical system through a measurement pattern to detect interference fringes formed by the light emitted from the projection optical system, and an adjustment portion for adjusting a numerical aperture of the light that illuminates the measurement pattern, in which the adjustment portion adjusts the numerical aperture so that the visibility of the interference fringes V, which is defined as V=(Imax−Imin)/(Imax+Imin), is equal to or more than 0.3, where Imax represents the maximum amount of light of the interference fringes, and Imin represents the minimum amount of light of the interference fringes, when the measurement device measures an optical performance of the projection optical system.

摘要翻译： 本发明提供一种曝光装置，包括用于将曝光图案投影到被曝光物体上的投影光学系统，用于通过测量图案将光引导到投影光学系统以检测干涉来测量投影光学系统的光学性能的测量装置 由投影光学系统发射的光形成的条纹以及用于调节照亮测量图案的光的数值孔径的调节部分，其中调节部分调节数值孔径，使得干涉条纹V的可见度，其中 被定义为V =（I max max -I min min）/（I max max + I min min），是 等于或大于0.3，其中I 最大表示干涉条纹的最大光量，I min表示干涉条纹的最小光量，当 测量装置测量光的性能 e投影光学系统。

公开(公告)号：US20100309448A1

公开(公告)日：2010-12-09

申请号：US12793873

申请日：2010-06-04

申请人： Kazuki Yamamoto ,  Yoshinori Ohsaki

发明人： Kazuki Yamamoto ,  Yoshinori Ohsaki

IPC分类号： G03B27/42 ,  G01B9/02 ,  G03F7/20

CPC分类号： G01B9/02083 ,  G01B9/02039 ,  G01B11/2441 ,  G01J9/02 ,  G03B27/42 ,  G03F7/706

摘要： A measurement apparatus, which measures a wavefront aberration of an optical system to be measured, comprises: a calculation unit configured to calculate the wavefront aberration based on an interference fringe generated by light which passed through the optical system to be measured; and a determination unit configured to calculate an evaluation value indicating a wavefront state based on the wavefront aberration calculated by the calculation unit, and determine the calculated wavefront aberration as the wavefront aberration of the optical system if the evaluation value falls within an allowable range.

摘要翻译： 测量要测量的光学系统的波前像差的测量装置包括：计算单元，被配置为基于通过待测量的光学系统的光产生的干涉条纹来计算波前像差; 以及确定单元，被配置为基于由所述计算单元计算的所述波前像差来计算指示波前状态的评估值，并且如果所述评估值在允许范围内，则将所计算的波前像差确定为所述光学系统的波面像差。

公开(公告)号：US20090015815A1

公开(公告)日：2009-01-15

申请号：US12169734

申请日：2008-07-09

申请人： Yoshinori Ohsaki

发明人： Yoshinori Ohsaki

IPC分类号： G03B27/72 ,  G03B27/32

CPC分类号： G03F7/7085 ,  G03B27/32 ,  G03B27/72 ,  G03F7/706

摘要： The present invention provides an exposure apparatus comprising a projection optical system configured to project a pattern of a reticle onto a substrate, a stage configured to move the substrate; and a sensor unit which is arranged on the stage and configured to receive light having passed through the projection optical system, the sensor unit including an aperture plate which is configured to be used in measuring different optical performances, and on which a plurality of aperture patterns with different shapes or different sizes are formed, and a photoelectric conversion device configured to photoelectrically convert the light beams from the plurality of aperture patterns.

摘要翻译： 本发明提供一种曝光装置，包括：投影光学系统，被配置为将掩模版的图案投影到基板上;阶段，被配置为移动所述基板; 以及传感器单元，其布置在所述台上并且被配置为接收已经穿过所述投影光学系统的光，所述传感器单元包括孔径板，所述孔板被配置为用于测量不同的光学性能，并且多个孔径图案 形成不同形状或不同尺寸的光电转换装置，以及被配置为对来自多个孔径图案的光束进行光电转换的光电转换装置。

公开(公告)号：US07403263B2

公开(公告)日：2008-07-22

申请号：US11734606

申请日：2007-04-12

申请人： Yoshinori Ohsaki

发明人： Yoshinori Ohsaki

IPC分类号： G03B27/42 ,  G03B27/52 ,  G03B27/74 ,  G03B27/58

CPC分类号： G03F7/7085 ,  G03B27/52 ,  G03F7/70341 ,  G03F9/7096

摘要： An exposure apparatus includes a projection optical system for projecting a pattern on a reticle onto an object to be exposed, a reference mark that serves as a reference for an alignment between the reticle and the object, a first fluid that has a refractive index of 1 or greater, and fills a space between at least part of the projection optical system and the object and a space between at least part of the projection optical system and the reference mark, and an alignment mechanism for aligning the object by using the projection optical system and the first fluid.

摘要翻译： 曝光装置包括：投影光学系统，用于将掩模版上的图案投影到待曝光的物体上;基准标记，其用作参考标号，用于对准所述标线片和所述物体;第一流体，其折射率为1 以上，并且填充投影光学系统的至少一部分与物体之间的空间以及投影光学系统的至少一部分与基准标记之间的空间，以及通过使用投影光学系统对准物体的对准机构 和第一流体。

公开(公告)号：US06989885B2

公开(公告)日：2006-01-24

申请号：US10726541

申请日：2003-12-04

申请人： Yuichi Osakabe ,  Yoshinori Ohsaki

发明人： Yuichi Osakabe ,  Yoshinori Ohsaki

IPC分类号： G03B27/42 ,  G03B27/58 ,  G03B27/62 ,  G01B11/00

CPC分类号： G03F9/7011 ,  G03B27/42

摘要： A scanning exposure apparatus for exposing a substrate (8) to a pattern with an original (1) through a projection optical system (5), while scanning the original and the substrate, includes a first detection system (14c) which detects a first substrate reference mark (18c1, 18c3) corresponding to the substrate through the projection optical system on/at at least one of an optical axis of the projection optical and an off-axis position shifted from the optical axis in a scanning direction, and an alignment system (2, 9) which aligns the original and the substrate on the basis of a detection result of the first detection system.

摘要翻译： 一种用于通过投影光学系统（5）将基板（8）暴露于具有原稿（1）的图案的扫描曝光装置，在扫描原件和基板的同时，包括第一检测系统（14c），其检测第一 通过投影光学系统对应于基板的基板参照标记（18c1,18c3），在投影光学的光轴和离开光轴的扫描方向上偏离的离轴位置 以及基于第一检测系统的检测结果对准原件和基板的对准系统（2,9）。

公开(公告)号：US20050219487A1

公开(公告)日：2005-10-06

申请号：US11130174

申请日：2005-05-17

申请人： Yuichi Osakabe ,  Yoshinori Ohsaki

发明人： Yuichi Osakabe ,  Yoshinori Ohsaki

IPC分类号： G03F7/22 ,  G03B27/42 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027

CPC分类号： G03F9/7011 ,  G03B27/42

摘要： A scanning exposure apparatus for exposing a substrate (8) to a pattern with an original (1) through a projection optical system (5), while scanning the original and the substrate, includes a first detection system (14c) which detects a first substrate reference mark (18c1, 18c3) corresponding to the substrate through the projection optical system on/at at least one of an optical axis of the projection optical and an off-axis position shifted from the optical axis in a scanning direction, and an alignment system (2, 9) which aligns the original and the substrate on the basis of a detection result of the first detection system.

摘要翻译： 一种用于通过投影光学系统（5）将基板（8）暴露于具有原稿（1）的图案的扫描曝光装置，在扫描原件和基板的同时，包括第一检测系统（14c），其检测第一 通过投影光学系统对应于基板的基板参照标记（18c1,18c3），在投影光学的光轴和离开光轴的扫描方向上偏离的离轴位置 以及基于第一检测系统的检测结果对准原件和基板的对准系统（2,9）。

公开(公告)号：US6088115A

公开(公告)日：2000-07-11

申请号：US866216

申请日：1997-05-30

申请人： Yoshinori Ohsaki ,  Takashi Suzuki

发明人： Yoshinori Ohsaki ,  Takashi Suzuki

IPC分类号： G01N21/21 ,  G01N21/55

CPC分类号： G01N21/21 ,  G01N2021/212 ,  G01N2021/218

摘要： In an optical anisotropy measurement apparatus for emitting a light flux from a He-Ne laser to be incident to an object to be examined, such as a liquid crystal in a liquid crystal cell, and detecting a light flux totally reflected from the object to be examined to measure an optical anisotropy of the object, a portion of the incident light flux is designed to be incident at an angle smaller than a critical angle of total reflection to and transmitted through the object to be examined. As a result, a light flux-incident region causing total reflection at the boundary is allowed to have a shape closer to a circle and have a smaller size, thus allowing detection of a local alignment change in optical anisotropy as caused by, e.g., a minute alignment defect in a liquid crystal device. Further by detecting the transmitted portion of the incident light flux, an optical anisotropy of the object to be examined at a position other than a boundary thereof can be measured simultaneously.

摘要翻译： 在用于从He-Ne激光器入射到待检测对象的光通量的光学各向异性测量装置中，例如液晶单元中的液晶，并且检测从物体全反射的光通量 检查以测量物体的光学各向异性，入射光束的一部分被设计成以小于全反射的临界角并且透过被检测物体的角度入射。 结果，允许在边界处引起全反射的光通量入射区域具有更接近圆形且具有较小尺寸的形状，从而允许检测由例如a的引起的光学各向异性的局部取向变化 在液晶装置中存在微小的取向缺陷。 此外，通过检测入射光束的透射部分，可以同时测量在其边界以外的位置处的被检查物体的光学各向异性。