公开(公告)号：US20160268156A1

公开(公告)日：2016-09-15

申请号：US15065430

申请日：2016-03-09

Applicant: KLA-TENCOR CORPORATION

Inventor： Pradeep Subrahmanyan ,  Luping HUANG ,  Chris POHLHAMMER

IPC: H01L21/683

CPC classification number: H01L21/6838 ,  H01L21/67288

Abstract: An apparatus tor fixing a wafer, including a chuck having a surface, a plurality of through bores in the chuck extending through the surface of the chuck, a fixed vacuum bellows, and a plurality of floating air bearings, wherein the fixed vacuum bellows and a respective floating air bearing of the plurality of floating air bearings are each individually arranged in separate through bores of the plurality of through bores and elevationally above the surface of the chuck.

Abstract translation: 一种固定晶片的装置，包括具有表面的卡盘，在卡盘中延伸穿过卡盘表面的多个通孔，固定的真空波纹管和多个浮动空气轴承，其中固定的真空波纹管和 多个浮动空气轴承的各自的浮动空气轴承各自分别布置在多个通孔的分开的通孔中并且在卡盘的表面上方。

公开(公告)号：US08779635B2

公开(公告)日：2014-07-15

申请号：US13859618

申请日：2013-04-09

Applicant: KLA-Tencor Corporation

Inventor： Pradeep Subrahmanyan ,  Mark Williams ,  Samir Nayfeh

IPC: H02K41/00 ,  H02K3/00

CPC classification number: G01N21/01 ,  G03F1/84

Abstract: A reticle positioning apparatus for actinic EUV reticle inspection including a sealed inspection chamber containing a reticle stage for holding a reticle. The reticle stage has a magnetically suspended upper stage with a long travel in a “y” direction and a magnetically suspended lower stage with a long travel in an “x” direction; and a cable stage chamber isolated from the inspection chamber by a cable chamber wall. The cable stage chamber has a cable stage movable in the “y” direction; and a tube connected at one end to the reticle stage and to the cable stage at the other end. The tube passes from the cable stage through the inspection chamber through a seal in the chamber wall and opening into the cable entry chamber for entry of cables and hoses within the cable stage chamber, which cables and hoses pass through the tube to the reticle stage.

Abstract translation: 一种用于光化性EUV掩模版检查的掩模版定位装置，其包括密封检查室，其包含用于保持掩模版的掩模版台。 标线片台具有在“y”方向上具有长行程的磁悬浮上段和在“x”方向上具有长行程的磁悬浮下级; 以及通过电缆室壁与检查室隔离的电缆平台室。 电缆平台室具有可沿“y”方向移动的电缆台; 以及在另一端连接到标线片台和电缆台的一端的管。 管从电缆台通过检查室通过室壁中的密封件并且进入电缆入口室，用于进入电缆级室内的电缆和软管，该电缆和软管通过管道到达标线段。

公开(公告)号：US10409171B2

公开(公告)日：2019-09-10

申请号：US15867485

申请日：2018-01-10

Applicant: KLA-Tencor Corporation

Inventor： Michael E. Adel ,  Amnon Manassen ,  William Pierson ,  Ady Levy ,  Pradeep Subrahmanyan ,  Liran Yerushalmi ,  DongSub Choi ,  Hoyoung Heo ,  Dror Alumot ,  John Charles Robinson

IPC: G03B27/00 ,  G03F7/20

Abstract: A process control system may include a controller configured to receive after-development inspection (ADI) data after a lithography step for the current layer from an ADI tool, receive after etch inspection (AEI) overlay data after an exposure step of the current layer from an AEI tool, train a non-zero offset predictor with ADI data and AEI overlay data to predict a non-zero offset from input ADI data, generate values of the control parameters of the lithography tool using ADI data and non-zero offsets generated by the non-zero offset predictor, and provide the values of the control parameters to the lithography tool for fabricating the current layer on the at least one production sample.

公开(公告)号：US20130264494A1

公开(公告)日：2013-10-10

申请号：US13859618

申请日：2013-04-09

Applicant: KLA-TENCOR CORPORATION

Inventor： Pradeep Subrahmanyan ,  Mark Williams ,  Samir Nayfeh

IPC: G01N21/01

CPC classification number: G01N21/01 ,  G03F1/84

Abstract: A reticle positioning apparatus for actinic EUV reticle inspection including a sealed inspection chamber containing a reticle stage for holding a reticle. The reticle stage has a. magnetically suspended upper stage with a long travel in a “y” direction and a magnetically suspended lower stage with a long travel in an “x” direction; and a cable stage chamber isolated from the inspection chamber by a cable chamber wall. The cable stage chamber has a cable stage movable in the “y” direction; and a tube connected at one end to the reticle stage and to the cable stage at the other end, The tube passes from the cable stage through the inspection chamber through a seal in the chamber wail and opening into the cable entry chamber for entry of cables and hoses within the cable stage chamber, which cables and hoses pass through the tube to the reticle stage.

Abstract translation: 一种用于光化性EUV掩模版检查的掩模版定位装置，其包括密封检查室，其包含用于保持掩模版的掩模版台。 标线台有一个。 在“y”方向上具有长行程的磁悬浮上级和在“x”方向上长行程的磁悬浮下级; 以及通过电缆室壁与检查室隔离的电缆平台室。 电缆平台室具有可沿“y”方向移动的电缆台; 以及在一端连接到标线台和在另一端处连接到电缆台的管，该管从电缆台通过检查室通过室内的密封件通入电缆入口室，以进入电缆 以及电缆平台室内的软管，这些电缆和软管通过管道到达标线台。

公开(公告)号：US20180253017A1

公开(公告)日：2018-09-06

申请号：US15867485

申请日：2018-01-10

Applicant: KLA-Tencor Corporation

Inventor： Michael E. Adel ,  Amnon Manassen ,  William Pierson ,  Ady Levy ,  Pradeep Subrahmanyan ,  Liran Yerushalmi ,  DongSub Choi ,  Hoyoung Heo ,  Dror Alumot ,  John Charles Robinson

IPC: G03F7/20

CPC classification number: G03F7/70633 ,  G03F7/705 ,  G03F7/70508 ,  G03F7/7085

Abstract: A process control system may include a controller configured to receive after-development inspection (ADI) data after a lithography step for the current layer from an ADI tool, receive after etch inspection (AEI) overlay data after an exposure step of the current layer from an AEI tool, train a non-zero offset predictor with ADI data and AEI overlay data to predict a non-zero offset from input ADI data, generate values of the control parameters of the lithography tool using ADI data and non-zero offsets generated by the non-zero offset predictor, and provide the values of the control parameters to the lithography tool for fabricating the current layer on the at least one production sample.

公开(公告)号：US20180196358A1

公开(公告)日：2018-07-12

申请号：US15413628

申请日：2017-01-24

Applicant: KLA-Tencor Corporation

Inventor： Myungjun Lee ,  Stewart Robertson ,  Mark D. Smith ,  Pradeep Subrahmanyan

IPC: G03F7/20

CPC classification number: G03F7/70641 ,  G03F1/44 ,  G03F7/70091

Abstract: A lithography system includes an illumination source, one or more projection optical elements, and a pattern mask. The illumination source includes one or more illumination poles. The pattern mask includes a set of focus-sensitive mask elements periodically distributed with a pitch, wherein the set of focus-sensitive mask elements is configured to diffract illumination from the one or more illumination poles. The pitch is selected such that two diffraction orders of illumination associated with each of the one or more illumination poles are asymmetrically distributed in a pupil plane of the one or more projection optical elements. Further, the one or more projection optical elements are configured to expose a sample with an image of the set of focus-sensitive pattern mask elements based on the two diffraction orders of illumination associated with each of the one or more illumination poles. Additionally, one or more printing characteristics of the image of the set of focus-sensitive pattern mask elements on the sample is indicative of a position of the sample within a focal volume of the one or more projection optical elements.

公开(公告)号：US08772731B2

公开(公告)日：2014-07-08

申请号：US13862148

申请日：2013-04-12

Applicant: KLA-Tencor Corporation

Inventor： Pradeep Subrahmanyan ,  Daniel Wack ,  Michael Wright ,  David Alles

IPC: G01J1/42

CPC classification number: G01N21/9501 ,  G01N21/956 ,  G01N2021/95676

Abstract: A method for synchronizing sample stage motion with a time delay integration (TDI) charge-couple device (CCD) in a semiconductor inspection tool, including: measuring a lateral position of a stage holding a sample being inspected; measuring a vertical position of the stage; determining a corrected lateral position of an imaged pixel of the sample based on the measured lateral and vertical positions; and synchronizing charge transfer of the TDI CCD with the corrected lateral position of the imaged pixel.

Abstract translation: 一种用于在半导体检测工具中使样本台运动与时间延迟积分（TDI）电荷耦合器件（CCD）同步的方法，包括：测量保持被检样品的台的横向位置; 测量舞台的垂直位置; 基于所测量的横向和垂直位置确定样本的成像像素的校正横向位置; 以及使所述TDI CCD的电荷转移与被成像像素的校正横向位置同步。

公开(公告)号：US10216096B2

公开(公告)日：2019-02-26

申请号：US15174111

申请日：2016-06-06

Applicant: KLA-Tencor Corporation

Inventor： Myungjun Lee ,  Mark D. Smith ,  Sanjay Kapasi ,  Stilian Pandev ,  Dzmitry Sanko ,  Pradeep Subrahmanyan ,  Ady Levy

IPC: G03B27/54 ,  G03F7/20

Abstract: A lithography system includes an illumination source and a set of projection optics. The illumination source directs a beam of illumination from an off-axis illumination pole to a pattern mask. The pattern mask includes a set of pattern elements to generate a set of diffracted beams including illumination from the illumination pole. At least two diffracted beams of the set of diffracted beams received by the set of projection optics are asymmetrically distributed in a pupil plane of the set of projection optics. The at least two diffracted beams of the set of diffracted beams are asymmetrically incident on the sample to form a set of fabricated elements corresponding to an image of the set of pattern elements. The set of fabricated elements on the sample includes one or more indicators of a location of the sample along an optical axis of the set of projection optics.

公开(公告)号：US20170045826A1

公开(公告)日：2017-02-16

申请号：US15174111

申请日：2016-06-06

Applicant: KLA-Tencor Corporation

Inventor： Myungjun Lee ,  Mark D. Smith ,  Sanjay Kapasi ,  Stilian Pandev ,  Dimitry Sanko ,  Pradeep Subrahmanyan ,  Ady Levy

IPC: G03F7/20

CPC classification number: G03F7/70558 ,  G03F7/70091 ,  G03F7/70641

Abstract: A lithography system includes an illumination source and a set of projection optics. The illumination source directs a beam of illumination from an off-axis illumination pole to a pattern mask. The pattern mask includes a set of pattern elements to generate a set of diffracted beams including illumination from the illumination pole. At least two diffracted beams of the set of diffracted beams received by the set of projection optics are asymmetrically distributed in a pupil plane of the set of projection optics. The at least two diffracted beams of the set of diffracted beams are asymmetrically incident on the sample to form a set of fabricated elements corresponding to an image of the set of pattern elements. The set of fabricated elements on the sample includes one or more indicators of a location of the sample along an optical axis of the set of projection optics.

Abstract translation: 光刻系统包括照明源和一组投影光学元件。 照明源将来自离轴照明杆的照明光束引导到图案掩模。 图案掩模包括一组图案元件，以生成包括来自照明杆的照明的衍射光束集合。 由该组投影光学器件接收的衍射光束组中的至少两个衍射光束不对称地分布在该组投影光学器件的光瞳平面中。 衍射光束组中的至少两个衍射光束不对称地入射到样品上，以形成一组对应于该组图案元素的图像的制造元件。 样品上的一组制造元件包括样品沿该组投影光学器件的光轴的位置的一个或多个指示器。

公开(公告)号：US20130270444A1

公开(公告)日：2013-10-17

申请号：US13862148

申请日：2013-04-12

Applicant: KLA-TENCOR CORPORATION

Inventor： Pradeep Subrahmanyan ,  Daniel Wack ,  Michael Wright ,  David Alles

IPC: G01N21/95

CPC classification number: G01N21/9501 ,  G01N21/956 ,  G01N2021/95676

Abstract: A method for synchronizing sample stage motion with a time delay integration (TDI) charge-couple device (CCD) in a semiconductor inspection tool, including: measuring a lateral position of a stage holding a sample being inspected; measuring a vertical position of the stage; determining a corrected lateral position of an imaged pixel of the sample based on the measured lateral and vertical positions; and synchronizing charge transfer of the TDI CCD with the corrected lateral position of the imaged pixel.

Abstract translation: 一种用于在半导体检测工具中使样本台运动与时间延迟积分（TDI）电荷耦合器件（CCD）同步的方法，包括：测量保持被检样品的台的横向位置; 测量舞台的垂直位置; 基于所测量的横向和垂直位置确定样本的成像像素的校正横向位置; 以及使所述TDI CCD的电荷转移与被成像像素的校正横向位置同步。