公开(公告)号：US08779635B2

公开(公告)日：2014-07-15

申请号：US13859618

申请日：2013-04-09

Applicant: KLA-Tencor Corporation

Inventor： Pradeep Subrahmanyan ,  Mark Williams ,  Samir Nayfeh

IPC: H02K41/00 ,  H02K3/00

CPC classification number: G01N21/01 ,  G03F1/84

Abstract: A reticle positioning apparatus for actinic EUV reticle inspection including a sealed inspection chamber containing a reticle stage for holding a reticle. The reticle stage has a magnetically suspended upper stage with a long travel in a “y” direction and a magnetically suspended lower stage with a long travel in an “x” direction; and a cable stage chamber isolated from the inspection chamber by a cable chamber wall. The cable stage chamber has a cable stage movable in the “y” direction; and a tube connected at one end to the reticle stage and to the cable stage at the other end. The tube passes from the cable stage through the inspection chamber through a seal in the chamber wall and opening into the cable entry chamber for entry of cables and hoses within the cable stage chamber, which cables and hoses pass through the tube to the reticle stage.

Abstract translation: 一种用于光化性EUV掩模版检查的掩模版定位装置，其包括密封检查室，其包含用于保持掩模版的掩模版台。 标线片台具有在“y”方向上具有长行程的磁悬浮上段和在“x”方向上具有长行程的磁悬浮下级; 以及通过电缆室壁与检查室隔离的电缆平台室。 电缆平台室具有可沿“y”方向移动的电缆台; 以及在另一端连接到标线片台和电缆台的一端的管。 管从电缆台通过检查室通过室壁中的密封件并且进入电缆入口室，用于进入电缆级室内的电缆和软管，该电缆和软管通过管道到达标线段。

公开(公告)号：US20130264494A1

公开(公告)日：2013-10-10

申请号：US13859618

申请日：2013-04-09

Applicant: KLA-TENCOR CORPORATION

Inventor： Pradeep Subrahmanyan ,  Mark Williams ,  Samir Nayfeh

IPC: G01N21/01

CPC classification number: G01N21/01 ,  G03F1/84

Abstract: A reticle positioning apparatus for actinic EUV reticle inspection including a sealed inspection chamber containing a reticle stage for holding a reticle. The reticle stage has a. magnetically suspended upper stage with a long travel in a “y” direction and a magnetically suspended lower stage with a long travel in an “x” direction; and a cable stage chamber isolated from the inspection chamber by a cable chamber wall. The cable stage chamber has a cable stage movable in the “y” direction; and a tube connected at one end to the reticle stage and to the cable stage at the other end, The tube passes from the cable stage through the inspection chamber through a seal in the chamber wail and opening into the cable entry chamber for entry of cables and hoses within the cable stage chamber, which cables and hoses pass through the tube to the reticle stage.

Abstract translation: 一种用于光化性EUV掩模版检查的掩模版定位装置，其包括密封检查室，其包含用于保持掩模版的掩模版台。 标线台有一个。 在“y”方向上具有长行程的磁悬浮上级和在“x”方向上长行程的磁悬浮下级; 以及通过电缆室壁与检查室隔离的电缆平台室。 电缆平台室具有可沿“y”方向移动的电缆台; 以及在一端连接到标线台和在另一端处连接到电缆台的管，该管从电缆台通过检查室通过室内的密封件通入电缆入口室，以进入电缆 以及电缆平台室内的软管，这些电缆和软管通过管道到达标线台。

公开(公告)号：US08724115B2

公开(公告)日：2014-05-13

申请号：US13914351

申请日：2013-06-10

Applicant: KLA-Tencor Corporation

Inventor： Upendra Ummethala ,  Layton Hale ,  Josh Clyne ,  Samir Nayfeh ,  Mark Williams ,  Joseph A. DiRegolo ,  Andrew Wilson

IPC: G01B11/02

CPC classification number: G01B11/02 ,  B82Y10/00 ,  B82Y40/00 ,  G01B11/14 ,  G01B21/16 ,  G03F7/70716 ,  G03F7/70775 ,  G03F7/70816 ,  H01J37/20 ,  H01J37/244 ,  H01J37/3174 ,  H01J2237/2445 ,  H01J2237/24578 ,  H01J2237/30433 ,  H01J2237/30438

Abstract: A stage metrology suitable for REBL includes an interferometer stage metrology system configured to measure the position and rotation of a short-stroke wafer scanning stage, wherein the interferometer metrology system includes two or more interferometers for each axis of measurement, wherein a first interferometer mirror is disposed on a first surface of the short-stroke wafer scanning stage and a second interferometer mirror is disposed on a second surface of the short-stroke wafer scanning stage, and a control system configured to determine a shape error for the first interferometer mirror using two or more interferometer measurements from the two or more interferometers associated with the first interferometer mirror and a shape error for the second interferometer mirror using two or more interferometer measurements from the two or more interferometers associated with the second interferometer mirror.

Abstract translation: 适用于REBL的舞台计量包括配置成测量短行晶片扫描台的位置和旋转的干涉仪台计量系统，其中干涉仪计量系统包括用于每个测量轴的两个或更多个干涉仪，其中第一干涉仪镜是 设置在短冲程晶片扫描台的第一表面上，第二干涉仪镜设置在短行晶片扫描台的第二表面上;以及控制系统，被配置为使用两个第二干涉仪来确定第一干涉仪镜的形状误差 或更多的来自与第一干涉仪镜相关联的两个或更多个干涉仪的干涉仪测量，以及使用来自与第二干涉仪镜相关联的两个或更多个干涉仪的两个或更多个干涉仪测量的第二干涉仪镜的形状误差。

公开(公告)号：US20130342827A1

公开(公告)日：2013-12-26

申请号：US13914351

申请日：2013-06-10

Applicant: KLA-Tencor Corporation

Inventor： Upendra Ummethala ,  Layton Hale ,  Josh Clyne ,  Samir Nayfeh ,  Mark Williams ,  Joseph A. DiRegolo ,  Andrew Wilson

IPC: G01B11/14 ,  G01B21/16

CPC classification number: G01B11/02 ,  B82Y10/00 ,  B82Y40/00 ,  G01B11/14 ,  G01B21/16 ,  G03F7/70716 ,  G03F7/70775 ,  G03F7/70816 ,  H01J37/20 ,  H01J37/244 ,  H01J37/3174 ,  H01J2237/2445 ,  H01J2237/24578 ,  H01J2237/30433 ,  H01J2237/30438

Abstract: A stage metrology suitable for REBL includes an interferometer stage metrology system configured to measure the position and rotation of a short-stroke wafer scanning stage, wherein the interferometer metrology system includes two or more interferometers for each axis of measurement, wherein a first interferometer mirror is disposed on a first surface of the short-stroke wafer scanning stage and a second interferometer mirror is disposed on a second surface of the short-stroke wafer scanning stage, and a control system configured to determine a shape error for the first interferometer mirror using two or more interferometer measurements from the two or more interferometers associated with the first interferometer mirror and a shape error for the second interferometer mirror using two or more interferometer measurements from the two or more interferometers associated with the second interferometer mirror.

Abstract translation: 适用于REBL的舞台计量包括配置成测量短行晶片扫描台的位置和旋转的干涉仪台计量系统，其中干涉仪计量系统包括用于每个测量轴的两个或更多个干涉仪，其中第一干涉仪镜是 设置在短冲程晶片扫描台的第一表面上，第二干涉仪镜设置在短行晶片扫描台的第二表面上;以及控制系统，被配置为使用两个第二干涉仪来确定第一干涉仪镜的形状误差 或更多的来自与第一干涉仪镜相关联的两个或更多个干涉仪的干涉仪测量，以及使用来自与第二干涉仪镜相关联的两个或更多个干涉仪的两个或更多个干涉仪测量的第二干涉仪镜的形状误差。