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公开(公告)号：US10215688B2
公开(公告)日：2019-02-26
申请号：US15217549
申请日：2016-07-22
Applicant: KLA-Tencor Corporation
Inventor： Andrei V. Shchegrov , Lawrence D. Rotter , David Y. Wang , Andrei Veldman , Kevin Peterlinz , Gregory Brady , Derrick A. Shaughnessy
Abstract: The system includes a modulatable illumination source configured to illuminate a surface of a sample disposed on a sample stage, a detector configured to detect illumination emanating from a surface of the sample, illumination optics configured to direct illumination from the modulatable illumination source to the surface of the sample, collection optics configured to direct illumination from the surface of the sample to the detector, and a modulation control system communicatively coupled to the modulatable illumination source, wherein the modulation control system is configured to modulate a drive current of the modulatable illumination source at a selected modulation frequency suitable for generating illumination having a selected coherence feature length. In addition, the present invention includes the time-sequential interleaving of outputs of multiple light sources to generate periodic pulse trains for use in multi-wavelength time-sequential optical metrology.
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公开(公告)号：US09400246B2
公开(公告)日：2016-07-26
申请号：US13648768
申请日：2012-10-10
Applicant: KLA-Tencor Corporation
Inventor： Andrei V. Shchegrov , Lawrence D. Rotter , David Y. Wang , Andrei Veldman , Kevin Peterlinz , Gregory Brady , Derrick Shaughnessy
CPC classification number: G01N21/211 , G01B11/0616 , G01N21/4738 , G01N21/55 , G01N2021/213 , G03F7/70608 , G03F7/70625 , G03F7/70633
Abstract: The present invention may include a modulatable illumination source configured to illuminate a surface of a sample disposed on a sample stage, a detector configured to detect illumination emanating from a surface of the sample, illumination optics configured to direct illumination from the modulatable illumination source to the surface of the sample, collection optics configured to direct illumination from the surface of the sample to the detector, and a modulation control system communicatively coupled to the modulatable illumination source, wherein the modulation control system is configured to modulate a drive current of the modulatable illumination source at a selected modulation frequency suitable for generating illumination having a selected coherence feature length. In addition, the present invention includes the time-sequential interleaving of outputs of multiple light sources to generate periodic pulses trains for use in multi-wavelength time-sequential optical metrology.
Abstract translation: 本发明可以包括被配置为照亮设置在样品台上的样品的表面的可调节照明源，被配置为检测从样品的表面发出的照明的检测器，被配置为将来自可调节照明源的照明引导到 样品的表面，被配置为将样品的表面的照射引导到检测器的收集光学器件，以及通信地耦合到可调节照明源的调制控制系统，其中调制控制系统被配置为调制可调节照明的驱动电流 源，其以适于产生具有选定的相干特征长度的照明的选定调制频率。 此外，本发明包括多个光源的输出的时间顺序交错以产生用于多波长时间顺序光学测量的周期性脉冲串。
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公开(公告)号：US09310290B2
公开(公告)日：2016-04-12
申请号：US14745047
申请日：2015-06-19
Applicant: KLA-Tencor Corporation
Inventor： David Y. Wang , Klaus Flock , Lawrence Rotter , Shankar Krishnan , Johannes D. de Veer , Catalin Filip , Gregory Brady , Muzammil Arain , Andrei Shchegrov
IPC: G01N21/00 , G01N21/21 , G01N21/95 , G01N21/956
CPC classification number: G01N21/211 , G01B2210/56 , G01N21/9501 , G01N21/956 , G01N2021/214 , G01N2021/8848 , G01N2201/06113 , G01N2201/0636
Abstract: An apparatus includes (i) a bright light source for providing an illumination beam at multiple wavelengths selectable with a range from a deep ultraviolet wavelength to an infrared wavelength, (ii) illumination optics for directing the illumination beam towards a sample at selectable sets of angles of incidence (AOI's) or azimuth angles (AZ's) and polarization states to provide spectroscopic ellipsometry, wherein the illumination optics include an apodizer for controlling a spot size of the illumination beam on the sample at each of the selectable AOI/AZ sets, (iii) collection optics for directing an output beam from the sample in response to the illumination beam at each of the selectable AOI/AZ sets and polarization states towards a detector that generates an output signal or image based on the output beam, and (v) a controller for characterizing a feature of the sample based on the output signal or image.
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公开(公告)号：US20130169966A1
公开(公告)日：2013-07-04
申请号：US13648768
申请日：2012-10-10
Applicant: KLA-Tencor Corporation
Inventor： Andrei V. Shchegrov , Lawrence D. Rotter , David Y. Wang , Andrei Veldman , Kevin Peterlinz , Gregory Brady , Derrick Shaughnessy
CPC classification number: G01N21/211 , G01B11/0616 , G01N21/4738 , G01N21/55 , G01N2021/213 , G03F7/70608 , G03F7/70625 , G03F7/70633
Abstract: The present invention may include a modulatable illumination source configured to illuminate a surface of a sample disposed on a sample stage, a detector configured to detect illumination emanating from a surface of the sample, illumination optics configured to direct illumination from the modulatable illumination source to the surface of the sample, collection optics configured to direct illumination from the surface of the sample to the detector, and a modulation control system communicatively coupled to the modulatable illumination source, wherein the modulation control system is configured to modulate a drive current of the modulatable illumination source at a selected modulation frequency suitable for generating illumination having a selected coherence feature length. In addition, the present invention includes the time-sequential interleaving of outputs of multiple light sources to generate periodic pulses trains for use in multi-wavelength time-sequential optical metrology.
Abstract translation: 本发明可以包括被配置为照亮设置在样品台上的样品的表面的可调节照明源，被配置为检测从样品的表面发出的照明的检测器，被配置为将来自可调节照明源的照明引导到 样品的表面，被配置为将样品的表面的照射引导到检测器的收集光学器件，以及通信地耦合到可调节照明源的调制控制系统，其中调制控制系统被配置为调制可调节照明的驱动电流 源，其以适于产生具有选定的相干特征长度的照明的选定调制频率。 此外，本发明包括多个光源的输出的时间顺序交错以产生用于多波长时间顺序光学测量的周期性脉冲串。
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公开(公告)号：US10804167B2
公开(公告)日：2020-10-13
申请号：US16257066
申请日：2019-01-24
Applicant: KLA-Tencor Corporation
Inventor： David Y. Wang , Esen Salcin , Michael Friedmann , Derrick Shaughnessy , Andrei V. Shchegrov , Jonathan M. Madsen , Alexander Kuznetsov
Abstract: Methods and systems for performing co-located measurements of semiconductor structures with two or more measurement subsystems are presented herein. To achieve a sufficiently small measurement box size, the metrology system monitors and corrects the alignment of the measurement spot of each metrology subsystem with a metrology target to achieve maximum co-location of the measurement spots of each metrology subsystem with the metrology target. In another aspect, measurements are performed simultaneously by two or more metrology subsystems at high throughput at the same wafer location. Furthermore, the metrology system effectively decouples simultaneously acquired measurement signals associated with each measurement subsystem. This maximizes signal information associated with simultaneous measurements of the same metrology by two or more metrology subsystems.
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Patent Agency Ranking
公开(公告)号：US10690602B2
公开(公告)日：2020-06-23
申请号：US15896978
申请日：2018-02-14
Applicant: KLA-Tencor Corporation
Inventor： Noam Sapiens , Shankar Krishnan , David Y. Wang , Alexander Buettner , Kerstin Purrucker , Kevin A. Peterlinz
IPC: G01N21/95 , G01B11/06 , G01J3/42 , G01N21/956 , H01L21/66 , G01J3/02 , G01J3/36 , G01J3/10 , G01J3/28 , G01N21/84 , G01N21/21
Abstract: Methods and systems for performing spectroscopic measurements of semiconductor structures including ultraviolet, visible, and infrared wavelengths greater than two micrometers are presented herein. A spectroscopic measurement system includes a combined illumination source including a first illumination source that generates ultraviolet, visible, and near infrared wavelengths (wavelengths less than two micrometers) and a second illumination source that generates mid infrared and long infrared wavelengths (wavelengths of two micrometers and greater). Furthermore, the spectroscopic measurement system includes one or more measurement channels spanning the range of illumination wavelengths employed to perform measurements of semiconductor structures. In some embodiments, the one or more measurement channels simultaneously measure the sample throughout the wavelength range. In some other embodiments, the one or more measurement channels sequentially measure the sample throughout the wavelength range.
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公开(公告)号：US20180088040A1
公开(公告)日：2018-03-29
申请号：US15382713
申请日：2016-12-18
Applicant: KLA-Tencor Corporation
Inventor： Shankar Krishnan , David Y. Wang
CPC classification number: G01N21/3563 , G01B11/28 , G01B2210/56 , G01J3/0229 , G01J3/2803 , G01N21/211 , G01N21/33 , G01N21/47 , G01N21/55 , G01N2021/213 , G01N2021/3137 , G01N2021/335 , G01N2021/3568 , G01N2021/4711
Abstract: Methods and systems for performing spectroscopic reflectometry measurements of semiconductor structures at infrared wavelengths are presented herein. In some embodiments measurement wavelengths spanning a range from 750 nanometers to 2,600 nanometers, or greater, are employed. In one aspect, reflectometry measurements are performed at oblique angles to reduce the influence of backside reflections on measurement results. In another aspect, a broad range of infrared wavelengths are detected by a detector that includes multiple photosensitive areas having different sensitivity characteristics. Collected light is linearly dispersed across the surface of the detector according to wavelength. Each different photosensitive area is arranged on the detector to sense a different range of incident wavelengths. In this manner, a broad range of wavelengths are detected with high signal to noise ratio by a single detector.
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公开(公告)号：US20160245741A1
公开(公告)日：2016-08-25
申请号：US14833370
申请日：2015-08-24
Applicant: KLA-Tencor Corporation
Inventor： Shankar Krishnan , Guorong V. Zhuang , David Y. Wang , Xuefeng Liu
CPC classification number: G01N21/255 , G01J3/0205 , G01J3/0208 , G01J3/18 , G01J3/2803 , G01J3/42 , G01J2003/425 , G01N21/211 , G01N21/55 , G01N21/9501 , G01N2021/213 , G01N2201/06113 , G01N2201/068
Abstract: Methods and systems for performing broadband spectroscopic metrology with reduced sensitivity to focus errors are presented herein. Significant reductions in sensitivity to focus position error are achieved by imaging the measurement spot onto the detector such that the direction aligned with the plane of incidence on the wafer surface is oriented perpendicular to the direction of wavelength dispersion on the detector surface. This reduction in focus error sensitivity enables reduced focus accuracy and repeatability requirements, faster focus times, and reduced sensitivity to wavelength errors without compromising measurement accuracy. In a further aspect, the dimension of illumination field projected on the wafer plane in the direction perpendicular to the plane of incidence is adjusted to optimize the resulting measurement accuracy and speed based on the nature of target under measurement.
Abstract translation: 本文介绍了对聚焦误差灵敏度降低的宽带光谱测量方法和系统。 通过将测量点成像到检测器上来实现对聚焦位置误差的敏感性的显着降低，使得与晶片表面上的入射平面对准的方向定向为垂直于检测器表面上的波长色散的方向。 聚焦误差灵敏度的降低可以降低聚焦精度和重复性要求，更快的聚焦时间，降低对波长误差的灵敏度，而不会影响测量精度。 在另一方面，调整在垂直于入射平面的方向上投射在晶片平面上的照明场的尺寸，以根据测量目标的性质优化所得到的测量精度和速度。
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公开(公告)号：US09228943B2
公开(公告)日：2016-01-05
申请号：US13661752
申请日：2012-10-26
Applicant: KLA-Tencor Corporation
Inventor： David Y. Wang , Guorong Vera Zhuang , Johannes D. de Veer , Kevin Peterlinz , Shankar Krishnan
CPC classification number: G01N21/55 , G01N21/211 , G01N2021/213 , G01N2021/556
Abstract: The present invention may include an illumination source, a detector, a selectably adjustable optical system including a dynamically adjustable illumination pupil of the illumination arm, a dynamically adjustable collection pupil of the collection arm, a dynamically adjustable illumination field stop of the illumination arm, a dynamically adjustable collection field stop of the collection arm, a sensor configured to measure one or more optical characteristics of one or more components of the optical system, and a control system configured to selectably dynamically adjust at least one of the illumination pupil, the collection pupil, the illumination field stop, the collection field stop, and a spectral radiance of the illumination source.
Abstract translation: 本发明可以包括照明源，检测器，可选择地调节的光学系统，其包括照明臂的动态可调节照明光瞳，收集臂的动态可调收集光瞳，照明臂的动态可调照明场停止， 收集臂的可动态调整的收集场停止，被配置为测量所述光学系统的一个或多个部件的一个或多个光学特性的传感器，以及被配置为可选择地动态地调整所述照明瞳孔，所述收集瞳孔 照明场停止，收集场停止以及照明源的光谱。
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10.发明申请公开(公告)号：US20150285735A1
公开(公告)日：2015-10-08
申请号：US14745047
申请日：2015-06-19
Applicant: KLA-Tencor Corporation
Inventor： David Y. Wang , Klaus Flock , Lawrence Rotter , Shankar Krishnan , Johannes D. de Veer , Catalin Filip , Gregory Brady , Muzammil Arain , Andrei Shchegrov
CPC classification number: G01N21/211 , G01B2210/56 , G01N21/9501 , G01N21/956 , G01N2021/214 , G01N2021/8848 , G01N2201/06113 , G01N2201/0636
Abstract: An apparatus includes (i) a bright light source for providing an illumination beam at multiple wavelengths selectable with a range from a deep ultraviolet wavelength to an infrared wavelength, (ii) illumination optics for directing the illumination beam towards a sample at selectable sets of angles of incidence (AOI's) or azimuth angles (AZ's) and polarization states to provide spectroscopic ellipsometry, wherein the illumination optics include an apodizer for controlling a spot size of the illumination beam on the sample at each of the selectable AOI/AZ sets, (iii) collection optics for directing an output beam from the sample in response to the illumination beam at each of the selectable AOI/AZ sets and polarization states towards a detector that generates an output signal or image based on the output beam, and (v) a controller for characterizing a feature of the sample based on the output signal or image.
Abstract translation: 一种装置包括（i）用于提供在从深紫外波长到红外波长的范围内可选择的多个波长的照明光束的明亮光源，（ii）照明光学器件，用于将照明光束以可选择的角度集合 （AOI）或方位角（AZ）和极化状态以提供光谱椭偏仪，其中照明光学器件包括用于控制每个可选AOI / AZ组上样品上的照明光束的光斑尺寸的变迹器，（iii ）收集光学器件，用于响应于在每个可选择的AOI / AZ集合处的照明光束和朝向基于输出光束产生输出信号或图像的检测器的偏振状态来引导来自样品的输出光束，以及（v） 控制器，用于基于输出信号或图像来表征样本的特征。
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