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    Variable aperture mask
    1.
    发明授权
    Variable aperture mask 有权

    公开(公告)号：US10663392B2

    公开(公告)日：2020-05-26

    申请号：US16056244

    申请日：2018-08-06

    Applicant: KLA-Tencor Corporation

    Inventor： Barry Blasenheim ,  Noam Sapiens ,  Michael Friedmann ,  Pablo Rovira

    IPC: G01N21/21 ,  G01J3/02 ,  G01J4/00 ,  G02B27/28 ,  G02B27/30

    Abstract: In some embodiments, a collection system of a semiconductor metrology tool includes a chuck to support a target from which an optical beam is reflected and an aperture mask to provide an adjustable aperture for the reflected optical beam. The aperture mask includes a plurality of opaque plates with adjustable positions. The collection system also includes a spectrometer to receive the reflected optical beam. The aperture mask is situated between the chuck and the spectrometer along the optical axis.

    Systems And Methods For Metrology Beam Stabilization
    2.
    发明申请
    Systems And Methods For Metrology Beam Stabilization 审中-公开

    公开(公告)号：US20190094130A1

    公开(公告)日：2019-03-28

    申请号：US16033511

    申请日：2018-07-12

    Applicant: KLA-Tencor Corporation

    Inventor： Barry Blasenheim ,  Noam Sapiens ,  Michael Friedmann

    IPC: G01N21/21 ,  G01B11/00

    CPC classification number: G01N21/211 ,  G01B11/02 ,  G01N2021/213 ,  G02B26/08 ,  G02B26/0816 ,  G02B26/0875 ,  G02B27/0025 ,  G02B27/0075 ,  G03F7/70625 ,  G03F7/70633

    Abstract: Methods and systems for measuring a specimen while actively stabilizing an optical measurement beam subject to changes in polarization by a rotating polarizer element are described herein. Movement of a focused measurement beam spot induced by a rotating polarizer element is compensated by actively controlling the position of an optical element in the beam path based on measurements of the focused measurement beam spot. Both feedback and feedforward control schemes may be employed to reduce beam position error. In one aspect, a measurement system includes a rotating optical polarizer, a beam position sensor, and an active beam compensating element in the illumination beam path, the collection beam path, or both. Beam position errors are detected by the beam position sensor, and control commands are communicated to the active beam compensating element to reduce the measured beam position errors.

    Variable Aperture Mask
    3.
    发明申请
    Variable Aperture Mask 审中-公开

    公开(公告)号：US20190049365A1

    公开(公告)日：2019-02-14

    申请号：US16056244

    申请日：2018-08-06

    Applicant: KLA-Tencor Corporation

    Inventor： Barry Blasenheim ,  Noam Sapiens ,  Michael Friedmann ,  Pablo Rovira

    IPC: G01N21/21 ,  G01J4/00 ,  G02B27/30 ,  G02B27/28

    Abstract: In some embodiments, a collection system of a semiconductor metrology tool includes a chuck to support a target from which an optical beam is reflected and an aperture mask to provide an adjustable aperture for the reflected optical beam. The aperture mask includes a plurality of opaque plates with adjustable positions. The collection system also includes a spectrometer to receive the reflected optical beam. The aperture mask is situated between the chuck and the spectrometer along the optical axis.

    X-ray zoom lens for small angle x-ray scatterometry
    5.
    发明授权
    X-ray zoom lens for small angle x-ray scatterometry 有权

    公开(公告)号：US10859518B2

    公开(公告)日：2020-12-08

    申请号：US15847375

    申请日：2017-12-19

    Applicant: KLA-Tencor Corporation

    Inventor： Nikolay Artemiev ,  Michael Friedmann

    IPC: G01N23/201

    Abstract: Methods and systems for controlling illumination beam spot size for Transmission, Small-Angle X-ray Scatterometry (T-SAXS) measurements of different sized metrology targets are described herein. An X-ray illumination optics subsystem includes one or more focusing optical elements with object and image planes at fixed locations and one or more illumination apertures or slits that independently control magnification and beam divergence. In a further aspect, the illumination source size and shape is controlled, along with magnification and beam divergence. In this manner, beam divergence and illumination spot size on a specimen are independently controlled, while maintaining constant illumination flux.

    Methods And Systems For Co-Located Metrology
    6.
    发明申请
    Methods And Systems For Co-Located Metrology 审中-公开

    公开(公告)号：US20200243400A1

    公开(公告)日：2020-07-30

    申请号：US16257066

    申请日：2019-01-24

    Applicant: KLA-Tencor Corporation

    Inventor： David Y. Wang ,  Esen Salcin ,  Michael Friedmann ,  Derrick Shaughnessy ,  Andrei V. Shchegrov ,  Jonathan M. Madsen ,  Alexander Kuznetsov

    IPC: H01L21/66 ,  G03F7/20 ,  G01N21/95 ,  G01N21/21 ,  G01B11/02 ,  G06N3/02

    Abstract: Methods and systems for performing co-located measurements of semiconductor structures with two or more measurement subsystems are presented herein. To achieve a sufficiently small measurement box size, the metrology system monitors and corrects the alignment of the measurement spot of each metrology subsystem with a metrology target to achieve maximum co-location of the measurement spots of each metrology subsystem with the metrology target. In another aspect, measurements are performed simultaneously by two or more metrology subsystems at high throughput at the same wafer location. Furthermore, the metrology system effectively decouples simultaneously acquired measurement signals associated with each measurement subsystem. This maximizes signal information associated with simultaneous measurements of the same metrology by two or more metrology subsystems.

    Systems and methods for metrology beam stabilization
    7.
    发明授权
    Systems and methods for metrology beam stabilization 有权

    公开(公告)号：US10365211B2

    公开(公告)日：2019-07-30

    申请号：US16033511

    申请日：2018-07-12

    Applicant: KLA-Tencor Corporation

    Inventor： Barry Blasenheim ,  Noam Sapiens ,  Michael Friedmann

    IPC: G03F7/20 ,  G01B11/02 ,  G01N21/21 ,  G02B26/08 ,  G02B27/00

    Abstract: Methods and systems for measuring a specimen while actively stabilizing an optical measurement beam subject to changes in polarization by a rotating polarizer element are described herein. Movement of a focused measurement beam spot induced by a rotating polarizer element is compensated by actively controlling the position of an optical element in the beam path based on measurements of the focused measurement beam spot. Both feedback and feedforward control schemes may be employed to reduce beam position error. In one aspect, a measurement system includes a rotating optical polarizer, a beam position sensor, and an active beam compensating element in the illumination beam path, the collection beam path, or both. Beam position errors are detected by the beam position sensor, and control commands are communicated to the active beam compensating element to reduce the measured beam position errors.

    X-Ray Zoom Lens For Small Angle X-Ray Scatterometry
    9.
    发明申请
    X-Ray Zoom Lens For Small Angle X-Ray Scatterometry 审中-公开

    公开(公告)号：US20180188192A1

    公开(公告)日：2018-07-05

    申请号：US15847375

    申请日：2017-12-19

    Applicant: KLA-Tencor Corporation

    Inventor： Nikolay Artemiev ,  Michael Friedmann

    IPC: G01N23/201

    CPC classification number: G01N23/201 ,  G01N2223/1016 ,  G01N2223/6116

    Abstract: Methods and systems for controlling illumination beam spot size for Transmission, Small-Angle X-ray Scatterometry (T-SAXS) measurements of different sized metrology targets are described herein. An X-ray illumination optics subsystem includes one or more focusing optical elements with object and image planes at fixed locations and one or more illumination apertures or slits that independently control magnification and beam divergence. In a further aspect, the illumination source size and shape is controlled, along with magnification and beam divergence. In this manner, beam divergence and illumination spot size on a specimen are independently controlled, while maintaining constant illumination flux.

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