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1.发明申请公开(公告)号：US20160139032A1
公开(公告)日：2016-05-19
申请号：US14668879
申请日：2015-03-25
Applicant: KLA-Tencor Corporation
Inventor： Claudio Rampoldi , Barry Blasenheim , Alexander Kuznetsov , Shankar Krishnan , Andrei V. Shchegrov
CPC classification number: G01N21/211 , G01B11/0625 , G01B11/0641 , G01B2210/56 , G01N21/9501 , G01N2021/213
Abstract: An inspection system is provided that can include a reflectometer having a light source for projecting light, and a light splitter for receiving the light projected by the light source, transforming at least one aspect of the light, and projecting the light once transformed. The reflectometer further has an off-axis unobscured objective lens through which the light transformed by the light splitter passes to contact a fabricated component, and has a detector for detecting a result of the transformed light contacting the fabricated component. The inspection system can additionally, or alternatively, include an ellipsometer having a light source similar to the reflectometer, and further a polarizing element to polarize the light of the light splitter. The polarized light passes through an off-axis unobscured objective lens to contact a fabricated component, and a detector detects a result of the polarized light contacting the fabricated component.
Abstract translation: 提供了一种检查系统，其可以包括具有用于投射光的光源的反射计，以及用于接收由光源投影的光的光分离器，转化至少一个方面的光，并且一旦转换就投射光。 反射计进一步具有离轴未遮蔽的物镜，由光分离器变换的光穿过该物镜接触制造的部件，并具有检测器，用于检测与制造的部件接触的变形光的结果。 检查系统可另外地或替代地包括具有类似于反射计的光源的椭圆计，还有一个使光分离器的光偏振的偏振元件。 偏振光通过离轴未遮蔽的物镜接触制造的部件，并且检测器检测与制造的部件接触的偏振光的结果。
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公开(公告)号：US10365211B2
公开(公告)日：2019-07-30
申请号：US16033511
申请日：2018-07-12
Applicant: KLA-Tencor Corporation
Inventor： Barry Blasenheim , Noam Sapiens , Michael Friedmann
Abstract: Methods and systems for measuring a specimen while actively stabilizing an optical measurement beam subject to changes in polarization by a rotating polarizer element are described herein. Movement of a focused measurement beam spot induced by a rotating polarizer element is compensated by actively controlling the position of an optical element in the beam path based on measurements of the focused measurement beam spot. Both feedback and feedforward control schemes may be employed to reduce beam position error. In one aspect, a measurement system includes a rotating optical polarizer, a beam position sensor, and an active beam compensating element in the illumination beam path, the collection beam path, or both. Beam position errors are detected by the beam position sensor, and control commands are communicated to the active beam compensating element to reduce the measured beam position errors.
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公开(公告)号：US20190107697A1
公开(公告)日：2019-04-11
申请号：US16149582
申请日：2018-10-02
Applicant: KLA-TENCOR CORPORATION
Inventor： Barry Blasenheim
Abstract: A lens system includes a curved primary mirror and an aspheric secondary mirror. The aspheric secondary mirror has a diameter smaller than that of the primary mirror and shares an optical axis with the primary mirror. The aspheric secondary mirror and the primary mirror are rotationally symmetric with respect to the optical axis. A support member, which may be transparent over an operating wavelength of the lens system, is disposed on the aspheric secondary mirror.
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公开(公告)号：US10801953B2
公开(公告)日：2020-10-13
申请号：US16245695
申请日：2019-01-11
Applicant: KLA-Tencor Corporation
Inventor： David Y. Wang , Alexander Buettner , Stilian Ivanov Pandev , Emanuel Saerchen , Andrei V. Shchegrov , Barry Blasenheim
IPC: G01J3/28 , G01N21/3563 , H01L21/66 , G01N21/21
Abstract: Methods and systems for performing semiconductor measurements based on hyperspectral imaging are presented herein. A hyperspectral imaging system images a wafer over a large field of view with high pixel density over a broad range of wavelengths. Image signals collected from a measurement area are detected at a number of pixels. The detected image signals from each pixel are spectrally analyzed separately. In some embodiments, the illumination and collection optics of a hyperspectral imaging system include fiber optical elements to direct illumination light from the illumination source to the measurement area on the surface of the specimen under measurement and fiber optical elements to image the measurement area. In another aspect, a fiber optics collector includes an image pixel mapper that couples a two dimensional array of collection fiber optical elements into a one dimensional array of pixels at the spectrometer and the hyperspectral detector.
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Patent Agency Ranking
公开(公告)号：US10739571B2
公开(公告)日：2020-08-11
申请号：US16149582
申请日：2018-10-02
Applicant: KLA-TENCOR CORPORATION
Inventor： Barry Blasenheim
Abstract: A lens system includes a curved primary mirror and an aspheric secondary mirror. The aspheric secondary mirror has a diameter smaller than that of the primary mirror and shares an optical axis with the primary mirror. The aspheric secondary mirror and the primary mirror are rotationally symmetric with respect to the optical axis. A support member, which may be transparent over an operating wavelength of the lens system, is disposed on the aspheric secondary mirror.
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公开(公告)号：US20200225151A1
公开(公告)日：2020-07-16
申请号：US16245695
申请日：2019-01-11
Applicant: KLA-Tencor Corporation
Inventor： David Y. Wang , Alexander Buettner , Stilian Ivanov Pandev , Emanuel Saerchen , Andrei V. Shchegrov , Barry Blasenheim
IPC: G01N21/3563 , G01J3/28 , H01L21/66 , G01N21/21
Abstract: Methods and systems for performing semiconductor measurements based on hyperspectral imaging are presented herein. A hyperspectral imaging system images a wafer over a large field of view with high pixel density over a broad range of wavelengths. Image signals collected from a measurement area are detected at a number of pixels. The detected image signals from each pixel are spectrally analyzed separately. In some embodiments, the illumination and collection optics of a hyperspectral imaging system include fiber optical elements to direct illumination light from the illumination source to the measurement area on the surface of the specimen under measurement and fiber optical elements to image the measurement area. In another aspect, a fiber optics collector includes an image pixel mapper that couples a two dimensional array of collection fiber optical elements into a one dimensional array of pixels at the spectrometer and the hyperspectral detector.
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公开(公告)号：US10663392B2
公开(公告)日：2020-05-26
申请号：US16056244
申请日：2018-08-06
Applicant: KLA-Tencor Corporation
Inventor： Barry Blasenheim , Noam Sapiens , Michael Friedmann , Pablo Rovira
Abstract: In some embodiments, a collection system of a semiconductor metrology tool includes a chuck to support a target from which an optical beam is reflected and an aperture mask to provide an adjustable aperture for the reflected optical beam. The aperture mask includes a plurality of opaque plates with adjustable positions. The collection system also includes a spectrometer to receive the reflected optical beam. The aperture mask is situated between the chuck and the spectrometer along the optical axis.
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公开(公告)号：US20190094130A1
公开(公告)日：2019-03-28
申请号：US16033511
申请日：2018-07-12
Applicant: KLA-Tencor Corporation
Inventor： Barry Blasenheim , Noam Sapiens , Michael Friedmann
CPC classification number: G01N21/211 , G01B11/02 , G01N2021/213 , G02B26/08 , G02B26/0816 , G02B26/0875 , G02B27/0025 , G02B27/0075 , G03F7/70625 , G03F7/70633
Abstract: Methods and systems for measuring a specimen while actively stabilizing an optical measurement beam subject to changes in polarization by a rotating polarizer element are described herein. Movement of a focused measurement beam spot induced by a rotating polarizer element is compensated by actively controlling the position of an optical element in the beam path based on measurements of the focused measurement beam spot. Both feedback and feedforward control schemes may be employed to reduce beam position error. In one aspect, a measurement system includes a rotating optical polarizer, a beam position sensor, and an active beam compensating element in the illumination beam path, the collection beam path, or both. Beam position errors are detected by the beam position sensor, and control commands are communicated to the active beam compensating element to reduce the measured beam position errors.
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公开(公告)号：US20190049365A1
公开(公告)日：2019-02-14
申请号：US16056244
申请日：2018-08-06
Applicant: KLA-Tencor Corporation
Inventor： Barry Blasenheim , Noam Sapiens , Michael Friedmann , Pablo Rovira
Abstract: In some embodiments, a collection system of a semiconductor metrology tool includes a chuck to support a target from which an optical beam is reflected and an aperture mask to provide an adjustable aperture for the reflected optical beam. The aperture mask includes a plurality of opaque plates with adjustable positions. The collection system also includes a spectrometer to receive the reflected optical beam. The aperture mask is situated between the chuck and the spectrometer along the optical axis.
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