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公开(公告)号：US09835447B2
公开(公告)日：2017-12-05
申请号：US15332155
申请日：2016-10-24
Applicant: KLA-Tencor Corporation
Inventor： Ibrahim Abdulhalim , Mike Adel , Michael Friedmann , Michael Faeyrman
CPC classification number: G01B11/26 , G01B11/14 , G01N21/9501 , G03F7/70633 , H01L22/12 , H01L23/544 , H01L2223/54426 , H01L2223/54453 , H01L2223/5446 , H01L2924/0002 , H01L2924/00
Abstract: A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.
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公开(公告)号：US20170255188A1
公开(公告)日：2017-09-07
申请号：US15597098
申请日：2017-05-16
Applicant: KLA-Tencor Corporation
Inventor： Pavel Izikson , John Robinson , Mike Adel , Amir Widmann , Dongsub Choi , Anat Marchelli
CPC classification number: G05B21/02 , G03F7/70508 , G03F7/70625 , G03F7/70633 , H01L21/67288
Abstract: Various methods and systems for creating or performing a dynamic sampling scheme for a process during which measurements are performed on wafers are provided. One method for creating a dynamic sampling scheme for a process during which measurements are performed on wafers includes performing the measurements on all of the wafers in at least one lot at all measurement spots on the wafers. The method also includes determining an optimal sampling scheme, an enhanced sampling scheme, a reduced sampling scheme, and thresholds for the dynamic sampling scheme for the process based on results of the measurements. The thresholds correspond to values of the measurements at which the optimal sampling scheme, the enhanced sampling scheme, and the reduced sampling scheme are to be used for the process.
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公开(公告)号：US10151584B2
公开(公告)日：2018-12-11
申请号：US15798041
申请日：2017-10-30
Applicant: KLA-Tencor Corporation
Inventor： Ibrahim Abdulhalim , Mike Adel , Michael Friedmann , Michael Faeyrman
Abstract: A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.
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4.发明申请公开(公告)号：US20170038198A1
公开(公告)日：2017-02-09
申请号：US15332155
申请日：2016-10-24
Applicant: KLA-Tencor Corporation
Inventor： Ibrahim Abdulhalim , Mike Adel , Michael Friedmann , Michael Faeyrman
CPC classification number: G01B11/26 , G01B11/14 , G01N21/9501 , G03F7/70633 , H01L22/12 , H01L23/544 , H01L2223/54426 , H01L2223/54453 , H01L2223/5446 , H01L2924/0002 , H01L2924/00
Abstract: A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.
Abstract translation: 提出了一种测量两个上覆或隔行周期结构之间的对准误差的方法和系统。 覆盖或隔行的周期性结构被入射辐射照射，并且检测由上覆或隔行的周期性结构引起的入射辐射的衍射辐射以提供输出信号。 然后可以从输出信号确定上覆或隔行周期性结构之间的未对准。
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5.发明申请公开(公告)号：US20160084639A1
公开(公告)日：2016-03-24
申请号：US14961629
申请日：2015-12-07
Applicant: KLA-Tencor Corporation
Inventor： Ibrahim Abdulhalim , Mike Adel , Michael Friedmann , Michael Faeyrman
IPC: G01B11/14
CPC classification number: G01B11/26 , G01B11/14 , G01N21/9501 , G03F7/70633 , H01L22/12 , H01L23/544 , H01L2223/54426 , H01L2223/54453 , H01L2223/5446 , H01L2924/0002 , H01L2924/00
Abstract: A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.
Abstract translation: 提出了一种测量两个上覆或隔行周期结构之间的对准误差的方法和系统。 覆盖或隔行的周期性结构被入射辐射照射，并且检测由上覆或隔行的周期性结构引起的入射辐射的衍射辐射以提供输出信号。 然后可以从输出信号确定上覆或隔行周期性结构之间的未对准。
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Patent Agency Ranking
6.发明授权公开(公告)号：US09234745B2
公开(公告)日：2016-01-12
申请号：US14789796
申请日：2015-07-01
Applicant: KLA-Tencor Corporation
Inventor： Ibrahim Abdulhalim , Mike Adel , Michael Friedmann , Michael Faeyrman
CPC classification number: G01B11/26 , G01B11/14 , G01N21/9501 , G03F7/70633 , H01L22/12 , H01L23/544 , H01L2223/54426 , H01L2223/54453 , H01L2223/5446 , H01L2924/0002 , H01L2924/00
Abstract: A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.
Abstract translation: 提出了一种测量两个上覆或隔行周期结构之间的对准误差的方法和系统。 覆盖或隔行的周期性结构被入射辐射照射，并且检测由上覆或隔行的周期性结构引起的入射辐射的衍射辐射以提供输出信号。 然后可以从输出信号确定上覆或隔行周期性结构之间的未对准。
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7.发明授权公开(公告)号：US09103662B2
公开(公告)日：2015-08-11
申请号：US14035766
申请日：2013-09-24
Applicant: KLA-Tencor Corporation
Inventor： Ibrahim Abdulhalim , Mike Adel , Michael Friedmann , Michael Faeyrman
IPC: G01B11/00 , G01B11/14 , G03F7/20 , H01L21/66 , H01L23/544
CPC classification number: G01B11/26 , G01B11/14 , G01N21/9501 , G03F7/70633 , H01L22/12 , H01L23/544 , H01L2223/54426 , H01L2223/54453 , H01L2223/5446 , H01L2924/0002 , H01L2924/00
Abstract: A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.
Abstract translation: 提出了一种测量两个上覆或隔行周期结构之间的对准误差的方法和系统。 覆盖或隔行的周期性结构被入射辐射照射，并且检测由上覆或隔行的周期性结构引起的入射辐射的衍射辐射以提供输出信号。 然后可以从输出信号确定上覆或隔行周期性结构之间的未对准。
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8.发明申请公开(公告)号：US20140022563A1
公开(公告)日：2014-01-23
申请号：US14035766
申请日：2013-09-24
Applicant: KLA-Tencor Corporation
Inventor： Ibrahim Abdulhalim , Mike Adel , Michael Friedmann , Michael Faeyrman
IPC: G01B11/14
CPC classification number: G01B11/26 , G01B11/14 , G01N21/9501 , G03F7/70633 , H01L22/12 , H01L23/544 , H01L2223/54426 , H01L2223/54453 , H01L2223/5446 , H01L2924/0002 , H01L2924/00
Abstract: A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.
Abstract translation: 提出了一种测量两个上覆或隔行周期结构之间的对准误差的方法和系统。 覆盖或隔行的周期性结构被入射辐射照射，并且检测由上覆或隔行的周期性结构引起的入射辐射的衍射辐射以提供输出信号。 然后可以从输出信号确定上覆或隔行周期性结构之间的未对准。
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公开(公告)号：US10649447B2
公开(公告)日：2020-05-12
申请号：US15597098
申请日：2017-05-16
Applicant: KLA-Tencor Corporation
Inventor： Pavel Izikson , John Robinson , Mike Adel , Amir Widmann , Dongsub Choi , Anat Marchelli
Abstract: Various methods and systems for creating or performing a dynamic sampling scheme for a process during which measurements are performed on wafers are provided. One method for creating a dynamic sampling scheme for a process during which measurements are performed on wafers includes performing the measurements on all of the wafers in at least one lot at all measurement spots on the wafers. The method also includes determining an optimal sampling scheme, an enhanced sampling scheme, a reduced sampling scheme, and thresholds for the dynamic sampling scheme for the process based on results of the measurements. The thresholds correspond to values of the measurements at which the optimal sampling scheme, the enhanced sampling scheme, and the reduced sampling scheme are to be used for the process.
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公开(公告)号：US20180100735A1
公开(公告)日：2018-04-12
申请号：US15798041
申请日：2017-10-30
Applicant: KLA-Tencor Corporation
Inventor： Ibrahim Abdulhalim , Mike Adel , Michael Friedmann , Michael Faeyrman
CPC classification number: G01B11/26 , G01B11/14 , G01N21/9501 , G03F7/70633 , H01L22/12 , H01L23/544 , H01L2223/54426 , H01L2223/54453 , H01L2223/5446 , H01L2924/0002 , H01L2924/00
Abstract: A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.
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