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公开(公告)号：US09915524B2
公开(公告)日：2018-03-13
申请号：US14708454
申请日：2015-05-11
Applicant: KLA-Tencor Corporation
Inventor： Noam Sapiens , Kevin A. Peterlinz , Alexander Buettner , Kerstin Purrucker , Andrei V. Shchegrov
IPC: G01N21/21 , G01B11/24 , G03F7/20 , G01N21/956
CPC classification number: G01B11/24 , G01B2210/56 , G01N21/956 , G01N2021/213 , G03F7/70625
Abstract: Methods and systems are presented to reduce the illumination spot size projected onto a measurement target and associated spillover onto area surrounding a measurement target. In one aspect, a spatial light modulator (SLM) is located in the illumination path between the illumination light source and the measurement sample. The SLM is configured to modulate amplitude, phase, or both, across the path of the illumination light to reduce wavefront errors. In some embodiments, the desired state of the SLM is based on wavefront measurements performed in an optical path of the metrology system. In another aspect, an illumination aperture having an image plane tilted at an oblique angle with respect to a beam of illumination light is employed to overcome defocusing effects in metrology systems that employ oblique illumination of the measurement sample. In some embodiments, the illumination aperture, objective lens, and specimen are aligned to satisfy the Scheimpflug condition.
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公开(公告)号：US20160334326A1
公开(公告)日：2016-11-17
申请号：US14708454
申请日：2015-05-11
Applicant: KLA-Tencor Corporation
Inventor： Noam Sapiens , Kevin A. Peterlinz , Alexander Buettner , Kerstin Purrucker , Andrei V. Shchegrov
IPC: G01N21/21
CPC classification number: G01B11/24 , G01B2210/56 , G01N21/956 , G01N2021/213 , G03F7/70625
Abstract: Methods and systems are presented to reduce the illumination spot size projected onto a measurement target and associated spillover onto area surrounding a measurement target. In one aspect, a spatial light modulator (SLM) is located in the illumination path between the illumination light source and the measurement sample. The SLM is configured to modulate amplitude, phase, or both, across the path of the illumination light to reduce wavefront errors. In some embodiments, the desired state of the SLM is based on wavefront measurements performed in an optical path of the metrology system. In another aspect, an illumination aperture having an image plane tilted at an oblique angle with respect to a beam of illumination light is employed to overcome defocusing effects in metrology systems that employ oblique illumination of the measurement sample. In some embodiments, the illumination aperture, objective lens, and specimen are aligned to satisfy the Scheimpflug condition.
Abstract translation: 呈现方法和系统以减少投影到测量目标上的照明光点尺寸和相关联的外溢到测量目标周围的区域。 在一个方面，空间光调制器（SLM）位于照明光源和测量样本之间的照明路径中。 SLM被配置为在照明光的路径上调制幅度，相位或两者以减少波前误差。 在一些实施例中，SLM的期望状态基于在计量系统的光路中执行的波前测量。 在另一方面，采用具有相对于照明光束倾斜倾斜角的图像平面的照明孔，以克服采用测量样品的倾斜照明的度量系统中的散焦效应。 在一些实施例中，照明孔径，物镜和样本被对准以满足Scheimpflug条件。
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公开(公告)号：US09921104B2
公开(公告)日：2018-03-20
申请号：US15344825
申请日：2016-11-07
Applicant: KLA-Tencor Corporation
Inventor： Shankar Krishnan , Alexander Buettner , Kerstin Purrucker , David Y. Wang
CPC classification number: G01J3/189 , G01J3/0289 , G01J3/10 , G01J3/2803 , G01N21/255 , G01N21/27 , G01N33/00 , G01N2033/0095
Abstract: Methods and systems for performing simultaneous spectroscopic measurements of semiconductor structures over a broad range of angles of incidence (AOI), azimuth angles, or both, are presented herein. Spectra including two or more sub-ranges of angles of incidence, azimuth angles, or both, are simultaneously measured over different sensor areas at high throughput. Collected light is linearly dispersed across different photosensitive areas of one or more detectors according to wavelength for each subrange of AOIs, azimuth angles, or both. Each different photosensitive area is arranged on the one or more detectors to perform a separate spectroscopic measurement for each different range of AOIs, azimuth angles, or both. In this manner, a broad range of AOIs, azimuth angles, or both, are detected with high signal to noise ratio, simultaneously. This approach enables high throughput measurements of high aspect ratio structures with high throughput, precision, and accuracy.
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Patent Agency Ranking
公开(公告)号：US20180238814A1
公开(公告)日：2018-08-23
申请号：US15896978
申请日：2018-02-14
Applicant: KLA-Tencor Corporation
Inventor： Noam Sapiens , Shankar Krishnan , David Y. Wang , Alexander Buettner , Kerstin Purrucker , Kevin A. Peterlinz
Abstract: Methods and systems for performing spectroscopic measurements of semiconductor structures including ultraviolet, visible, and infrared wavelengths greater than two micrometers are presented herein. A spectroscopic measurement system includes a combined illumination source including a first illumination source that generates ultraviolet, visible, and near infrared wavelengths (wavelengths less than two micrometers) and a second illumination source that generates mid infrared and long infrared wavelengths (wavelengths of two micrometers and greater). Furthermore, the spectroscopic measurement system includes one or more measurement channels spanning the range of illumination wavelengths employed to perform measurements of semiconductor structures. In some embodiments, the one or more measurement channels simultaneously measure the sample throughout the wavelength range. In some other embodiments, the one or more measurement channels sequentially measure the sample throughout the wavelength range.
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公开(公告)号：US20170356800A1
公开(公告)日：2017-12-14
申请号：US15344825
申请日：2016-11-07
Applicant: KLA-Tencor Corporation
Inventor： Shankar Krishnan , Alexander Buettner , Kerstin Purrucker , David Y. Wang
CPC classification number: G01J3/189 , G01J3/0289 , G01J3/10 , G01J3/2803 , G01N21/255 , G01N21/27 , G01N33/00 , G01N2033/0095
Abstract: Methods and systems for performing simultaneous spectroscopic measurements of semiconductor structures over a broad range of angles of incidence (AOI), azimuth angles, or both, are presented herein. Spectra including two or more sub-ranges of angles of incidence, azimuth angles, or both, are simultaneously measured over different sensor areas at high throughput. Collected light is linearly dispersed across different photosensitive areas of one or more detectors according to wavelength for each subrange of AOIs, azimuth angles, or both. Each different photosensitive area is arranged on the one or more detectors to perform a separate spectroscopic measurement for each different range of AOIs, azimuth angles, or both. In this manner, a broad range of AOIs, azimuth angles, or both, are detected with high signal to noise ratio, simultaneously. This approach enables high throughput measurements of high aspect ratio structures with high throughput, precision, and accuracy.
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公开(公告)号：US10690602B2
公开(公告)日：2020-06-23
申请号：US15896978
申请日：2018-02-14
Applicant: KLA-Tencor Corporation
Inventor： Noam Sapiens , Shankar Krishnan , David Y. Wang , Alexander Buettner , Kerstin Purrucker , Kevin A. Peterlinz
IPC: G01N21/95 , G01B11/06 , G01J3/42 , G01N21/956 , H01L21/66 , G01J3/02 , G01J3/36 , G01J3/10 , G01J3/28 , G01N21/84 , G01N21/21
Abstract: Methods and systems for performing spectroscopic measurements of semiconductor structures including ultraviolet, visible, and infrared wavelengths greater than two micrometers are presented herein. A spectroscopic measurement system includes a combined illumination source including a first illumination source that generates ultraviolet, visible, and near infrared wavelengths (wavelengths less than two micrometers) and a second illumination source that generates mid infrared and long infrared wavelengths (wavelengths of two micrometers and greater). Furthermore, the spectroscopic measurement system includes one or more measurement channels spanning the range of illumination wavelengths employed to perform measurements of semiconductor structures. In some embodiments, the one or more measurement channels simultaneously measure the sample throughout the wavelength range. In some other embodiments, the one or more measurement channels sequentially measure the sample throughout the wavelength range.
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公开(公告)号：US10648796B2
公开(公告)日：2020-05-12
申请号：US15885504
申请日：2018-01-31
Applicant: KLA-Tencor Corporation
Inventor： Noam Sapiens , Kevin A. Peterlinz , Alexander Buettner , Kerstin Purrucker , Andrei V. Shchegrov
IPC: G01B11/24 , G03F7/20 , G01N21/21 , G01N21/956
Abstract: Methods and systems are presented to reduce the illumination spot size projected onto a measurement target and associated spillover onto area surrounding a measurement target. In one aspect, a spatial light modulator (SLM) is located in the illumination path between the illumination light source and the measurement sample. The SLM is configured to modulate amplitude, phase, or both, across the path of the illumination light to reduce wavefront errors. In some embodiments, the desired state of the SLM is based on wavefront measurements performed in an optical path of the metrology system. In another aspect, an illumination aperture having an image plane tilted at an oblique angle with respect to a beam of illumination light is employed to overcome defocusing effects in metrology systems that employ oblique illumination of the measurement sample. In some embodiments, the illumination aperture, objective lens, and specimen are aligned to satisfy the Scheimpflug condition.
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公开(公告)号：US20180180406A1
公开(公告)日：2018-06-28
申请号：US15885504
申请日：2018-01-31
Applicant: KLA-Tencor Corporation
Inventor： Noam Sapiens , Kevin A. Peterlinz , Alexander Buettner , Kerstin Purrucker , Andrei V. Shchegrov
IPC: G01B11/24 , G03F7/20 , G01N21/956 , G01N21/21
CPC classification number: G01B11/24 , G01B2210/56 , G01N21/956 , G01N2021/213 , G03F7/70625
Abstract: Methods and systems are presented to reduce the illumination spot size projected onto a measurement target and associated spillover onto area surrounding a measurement target. In one aspect, a spatial light modulator (SLM) is located in the illumination path between the illumination light source and the measurement sample. The SLM is configured to modulate amplitude, phase, or both, across the path of the illumination light to reduce wavefront errors. In some embodiments, the desired state of the SLM is based on wavefront measurements performed in an optical path of the metrology system. In another aspect, an illumination aperture having an image plane tilted at an oblique angle with respect to a beam of illumination light is employed to overcome defocusing effects in metrology systems that employ oblique illumination of the measurement sample. In some embodiments, the illumination aperture, objective lens, and specimen are aligned to satisfy the Scheimpflug condition.
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