公开(公告)号：US11268915B2

公开(公告)日：2022-03-08

申请号：US17053296

申请日：2018-05-15

Applicant: Hitachi High-Tech Corporation

Inventor： Tsunenori Nomaguchi ,  Hiromi Mise

IPC: G01N23/04 ,  G01N23/06 ,  H01J37/20 ,  H01J37/244 ,  H01J37/26

Abstract: To provide, in observation of a sample that requires a movement between various devices, a charged particle beam device, a method for processing the sample, and an observation method which facilitate the movement between the devices. The charged particle beam device that processes an observation target on the sample using a charged particle beam includes: a sample stage on which the sample is placed; an observation unit configured to observe the observation target; and a writing unit configured to write information of the observation target in a writing position of the sample.

公开(公告)号：US11817289B2

公开(公告)日：2023-11-14

申请号：US17725276

申请日：2022-04-20

Applicant: HITACHI HIGH-TECH CORPORATION ,  Japan Fine Ceramics Center

Inventor： Tsunenori Nomaguchi ,  Shunichi Motomura ,  Tadahiro Kawasaki ,  Takeharu Kato ,  Ryuji Yoshida

IPC: H01J37/09 ,  H01J37/10 ,  H01J37/153 ,  H01J37/244

CPC classification number: H01J37/09 ,  H01J37/10 ,  H01J37/153 ,  H01J37/244 ,  H01J2237/0458 ,  H01J2237/1534

Abstract: As a device for correcting positive spherical aberration of an electromagnetic lens for a charged particle beam, a spherical aberration correction device combining a hole electrode and a ring electrode is known. In this spherical aberration correction device, when a voltage is applied between the hole electrode and the ring electrode, the focus of the charged particle beam device changes due to the convex lens effect generated in the hole electrode. Therefore, in a charged particle beam device including a charged particle beam source which generates a charged particle beam, a charged particle beam aperture having a ring shape, and a charged particle beam aperture power supply which applies a voltage to the charged particle beam aperture, the charged particle beam aperture power supply is configured to apply, to the charged particle beam aperture, a voltage having a polarity opposite to a polarity of charges of the charged particle beam.

公开(公告)号：US11067391B2

公开(公告)日：2021-07-20

申请号：US16618835

申请日：2017-06-13

Applicant: Hitachi High-Tech Corporation

Inventor： Takahiro Sato ,  Tsunenori Nomaguchi

IPC: G01B15/02 ,  G01N23/2251 ,  H01J37/244 ,  H01J37/28 ,  H01J37/317 ,  G01N23/2206

Abstract: Provided is a charged particle beam device which includes a storage unit that stores relationship information indicating a relationship between intensity or an intensity ratio of a charged particle signal obtained when a layer disposed on the sample is irradiated with the charged particle beam and a thickness of the layer; and a calculation unit that calculates the thickness of the layer as a thickness of the sample by using the relationship information and the intensity or the intensity ratio of the charged particle signal.

公开(公告)号：US11784022B2

公开(公告)日：2023-10-10

申请号：US17425872

申请日：2019-01-28

Applicant: Hitachi High-Tech Corporation

Inventor： Takashi Ohshima ,  Tatsuro Ide ,  Hideo Morishita ,  Yoichi Ose ,  Tsunenori Nomaguchi ,  Toshihide Agemura

IPC: H01J37/073 ,  G02B3/04 ,  H01J37/147 ,  H01J37/22 ,  H01J37/28

CPC classification number: H01J37/073 ,  G02B3/04 ,  H01J37/1474 ,  H01J37/22 ,  H01J37/28 ,  H01J2237/0473

Abstract: A scanning electron beam apparatus which two-dimensionally scans a sample by an electron beam to achieve high resolution even with a photoexcited electron source. The electron beam apparatus includes a photocathode including a substrate having a refractive index of more than 1.7 and a photoemissive film, a focusing lens configured to focus an excitation light toward the photocathode, an extractor electrode disposed facing the photocathode and configured to accelerate an electron beam generated from the photoemissive film by focusing the excitation light by the focusing lens and emitting the excitation light through the substrate, and an electron optics including a deflector configured to two-dimensionally scan a sample by the electron beam accelerated by the extractor electrode. For a spherical aberration of the focusing lens, a root mean square of the spherical aberration on the photoemissive film is equal to or less than 1/14 of a wavelength of the excitation light.

公开(公告)号：US20220165536A1

公开(公告)日：2022-05-26

申请号：US17425872

申请日：2019-01-28

Applicant: Hitachi High-Tech Corporation

Inventor： Takashi Ohshima ,  Tatsuro Ide ,  Hideo Morishita ,  Yoichi Ose ,  Tsunenori Nomaguchi ,  Toshihide Agemura

IPC: H01J37/073 ,  H01J37/147 ,  H01J37/22 ,  G02B3/04

Abstract: A scanning electron beam apparatus which two-dimensionally scans a sample by an electron beam, to achieve high resolution even with a photoexcited electron source. The electron beam apparatus includes a photocathode including a substrate having a refractive index of more than 1.7 and a photoemissive film, a focusing lens configured to focus an excitation light toward the photocathode, an extractor electrode disposed facing the photocathode and configured to accelerate an electron beam generated from the photoemissive film by focusing the excitation light by the focusing lens and emitting the excitation light through the substrate, and an electron optics including a deflector configured to two-dimensionally scan a sample by the electron beam accelerated by the extractor electrode. For a spherical aberration of the focusing lens, a root mean square of the spherical aberration on the photoemissive film is equal to or less than 1/14 of a wavelength of the excitation light.

公开(公告)号：US10886101B2

公开(公告)日：2021-01-05

申请号：US16494595

申请日：2017-03-29

Applicant: Hitachi High-Tech Corporation

Inventor： Ryo Hirano ,  Hideo Morishita ,  Toshihide Agemura ,  Junichi Katane ,  Tsunenori Nomaguchi

IPC: H01J37/28 ,  H01J37/12 ,  H01J37/145 ,  H01J37/153

Abstract: A charged particle beam device includes: a charged particle source that emits a charged particle beam; a boosting electrode disposed between the charged particle source and a sample to form a path of the charged particle beam and to accelerate and decelerate the charged particle beam; a first pole piece that covers the boosting electrode; a second pole piece that covers the first pole piece; a first lens coil disposed outside the first pole piece and inside the second pole piece to form a first lens; a second lens coil disposed outside the second pole piece to form a second lens; and a control electrode formed between a distal end portion of the first pole piece and a distal end portion of the second pole piece to control an electric field formed between the sample and the distal end portion of the second pole piece.

公开(公告)号：US11335532B2

公开(公告)日：2022-05-17

申请号：US17043560

申请日：2018-03-29

Applicant: Hitachi High-Tech Corporation ,  Japan Fine Ceramics Center

Inventor： Tsunenori Nomaguchi ,  Shunichi Motomura ,  Tadahiro Kawasaki ,  Takeharu Kato ,  Ryuji Yoshida

IPC: H01J37/09 ,  H01J37/10 ,  H01J37/153 ,  H01J37/244

Abstract: As a device for correcting positive spherical aberration of an electromagnetic lens for a charged particle beam, a spherical aberration correction device combining a hole electrode and a ring electrode is known. In this spherical aberration correction device, when a voltage is applied between the hole electrode and the ring electrode, the focus of the charged particle beam device changes due to the convex lens effect generated in the hole electrode. Therefore, in a charged particle beam device including a charged particle beam source which generates a charged particle beam, a charged particle beam aperture having a ring shape, and a charged particle beam aperture power supply which applies a voltage to the charged particle beam aperture, the charged particle beam aperture power supply is configured to apply, to the charged particle beam aperture, a voltage having a polarity opposite to a polarity of charges of the charged particle beam.

公开(公告)号：US11164716B2

公开(公告)日：2021-11-02

申请号：US17040121

申请日：2018-03-29

Applicant: Hitachi High-Tech Corporation ,  Japan Fine Ceramics Center

Inventor： Shunichi Motomura ,  Tsunenori Nomaguchi ,  Tadahiro Kawasaki ,  Takeharu Kato ,  Ryuji Yoshida

IPC: H01J37/00 ,  H01J37/147 ,  H01J37/145 ,  H01J37/244

Abstract: When using a charged particle beam aperture having a ring shape in a charged particle beam device, the charged particle beam with the highest current density immediately above the optical axis, among the charged particle beams is blocked, so that it is difficult to dispose the charged particle beam aperture at the optimal mounting position. Therefore, in addition to the ring-shaped charged particle beam aperture, a hole-shaped charged particle beam aperture is provided, and it is possible to switch between the case where the ring-shaped charged particle beam aperture is disposed on the optical axis of the charged particle beam and the case where the hole-shaped charged particle beam aperture is disposed on the optical axis of the charged particle beam.

公开(公告)号：US11143606B2

公开(公告)日：2021-10-12

申请号：US16965228

申请日：2018-02-01

Applicant: Hitachi High-Tech Corporation

Inventor： Tomihiro Hashizume ,  Masatoshi Yasutake ,  Tsunenori Nomaguchi ,  Takafumi Miwa

IPC: G01N23/2252 ,  G01N23/2208 ,  G01N21/95 ,  G01N15/02 ,  G01N15/10 ,  G01N23/2251

Abstract: To enable evaluation of a shape of a fine particle and a fine particle type, a substrate is set as a substrate on which an isolated fine particle to be measured and an isolated standard fine particle in the vicinity of the isolated fine particle to be measured are disposed, and a scanning electron microscope body including a detector configured to detect secondary charged particles obtained by scanning a surface of the substrate with an electron beam probe, and a computer that processes a detection signal and generates an image of the isolated fine particle to be measured and the isolated standard fine particle are provided. The computer corrects a shape of the isolated fine particle to be measured by using a measurement result of the isolated standard fine particle disposed in the vicinity of the isolated fine particle to be measured. Further, by attaching a fine particle spreading tank equipped with a fine particle suspension dropping device inside the microscope body, automatic measurement including dropping of fine particle suspension onto a surface of a surface-modified substrate is possible.

公开(公告)号：US12176180B2

公开(公告)日：2024-12-24

申请号：US17773433

申请日：2019-11-20

Applicant: Hitachi High-Tech Corporation

Inventor： Atsushi Sawada ,  Tsunenori Nomaguchi

IPC: H01J37/20 ,  H01J37/26 ,  H01J37/30 ,  H01J37/305

Abstract: A lamella 10 including an analysis portion 11 and a cutout portion 12 separated from the analysis portion 11 is produced. When a plurality of the lamellae 10 are transported to a lamella grid 20, the plurality of lamellae 10 are supported by a support portion 22 protruding from a surface of a substrate 21, and are mounted adjacent to each other in a Z direction. At this time, the cutout portion 12 prevents the analysis portion 11 from damage.