公开(公告)号：US20200371050A1

公开(公告)日：2020-11-26

申请号：US16965228

申请日：2018-02-01

Applicant: Hitachi High-Tech Corporation

Inventor： Tomihiro Hashizume ,  Masatoshi Yasutake ,  Tsunenori Nomaguchi ,  Takafumi Miwa

IPC: G01N23/2252

Abstract: To enable evaluation of a shape of a fine particle and a fine particle type, a substrate is set as a substrate on which an isolated fine particle to be measured and an isolated standard fine particle in the vicinity of the isolated fine particle to be measured are disposed, and a scanning electron microscope body including a detector configured to detect secondary charged particles obtained by scanning a surface of the substrate with an electron beam probe, and a computer that processes a detection signal and generates an image of the isolated fine particle to be measured and the isolated standard fine particle are provided. The computer corrects a shape of the isolated fine particle to be measured by using a measurement result of the isolated standard fine particle disposed in the vicinity of the isolated fine particle to be measured. Further, by attaching a fine particle spreading tank equipped with a fine particle suspension dropping device inside the microscope body, automatic measurement including dropping of fine particle suspension onto a surface of a surface-modified substrate is possible.

公开(公告)号：US11143606B2

公开(公告)日：2021-10-12

申请号：US16965228

申请日：2018-02-01

Applicant: Hitachi High-Tech Corporation

Inventor： Tomihiro Hashizume ,  Masatoshi Yasutake ,  Tsunenori Nomaguchi ,  Takafumi Miwa

IPC: G01N23/2252 ,  G01N23/2208 ,  G01N21/95 ,  G01N15/02 ,  G01N15/10 ,  G01N23/2251

Abstract: To enable evaluation of a shape of a fine particle and a fine particle type, a substrate is set as a substrate on which an isolated fine particle to be measured and an isolated standard fine particle in the vicinity of the isolated fine particle to be measured are disposed, and a scanning electron microscope body including a detector configured to detect secondary charged particles obtained by scanning a surface of the substrate with an electron beam probe, and a computer that processes a detection signal and generates an image of the isolated fine particle to be measured and the isolated standard fine particle are provided. The computer corrects a shape of the isolated fine particle to be measured by using a measurement result of the isolated standard fine particle disposed in the vicinity of the isolated fine particle to be measured. Further, by attaching a fine particle spreading tank equipped with a fine particle suspension dropping device inside the microscope body, automatic measurement including dropping of fine particle suspension onto a surface of a surface-modified substrate is possible.

公开(公告)号：US11322329B2

公开(公告)日：2022-05-03

申请号：US17260612

申请日：2018-08-27

Applicant: HITACHI HIGH-TECH CORPORATION

Inventor： Toshiaki Kusunoki ,  Tomihiro Hashizume ,  Keigo Kasuya ,  Noriaki Arai ,  Hiromitsu Seino ,  Minoru Kaneda ,  Takashi Ohshima ,  Soichiro Matsunaga

IPC: H01J37/065 ,  H01J37/10 ,  H01J37/147 ,  H01J37/244 ,  H01J37/28

Abstract: The invention provides an electron source including a columnar chip of a hexaboride single crystal, a metal pipe that holds the columnar chip of the hexaboride single crystal, and a filament connected to the metal pipe at a central portion. The columnar chip of the hexaboride single crystal is formed into a cone shape at a portion closer to a tip than a portion held in the metal pipe, and a tip end portion having the cone shape has a (310) crystal face. Schottky electrons are emitted from the (310) crystal face. According to the invention, it is possible to provide a novel electron source having monochromaticity, long-term stability of an emitter current, and high current density.

公开(公告)号：US10971329B2

公开(公告)日：2021-04-06

申请号：US16074601

申请日：2016-02-05

Applicant: HITACHI HIGH-TECH CORPORATION

Inventor： Shinichi Matsubara ,  Hiroyasu Shichi ,  Tomihiro Hashizume ,  Yoshimi Kawanami

IPC: H01J37/285 ,  H01J37/08 ,  G02B21/00 ,  H01J27/02

Abstract: An H3+ ion is used as an ion beam to achieve improvement in focusing capability influencing observed resolution and machining width, improvement in the beam stability, and a reduction in damage to the sample surface during the beam irradiation, in the process of observation and machining of the sample surface by the ion beam. The H3+ ion can be obtained by use of a probe current within a voltage range 21 around a second peak 23 occurring when an extracted voltage is applied to a needle-shaped emitter tip with an apex terminated by three atoms or less, in an atmosphere of hydrogen gas.

公开(公告)号：US10707046B2

公开(公告)日：2020-07-07

申请号：US16480405

申请日：2017-12-08

Applicant: Hitachi High-Tech Corporation

Inventor： Toshiaki Kusunoki ,  Keigo Kasuya ,  Takashi Ohshima ,  Tomihiro Hashizume ,  Noriaki Arai ,  Yoichi Ose

IPC: H01J37/073 ,  H01J37/20

Abstract: An electron source that can be used stably for a long time even when hexaboride is used, and an electron beam device using the electron source are provided. The invention is directed to an electron source which includes a filament made of a metal, a metal tube that is fixed to the filament and has a plurality of recesses disposed at least in two axial directions so as to surround a central axis at an outer periphery, and a columnar hexaboride tip that emits an electron, is disposed so as to protrude from the inside of the metal tube to a side opposite to the filament, and is in contact with a bottom of each of the plurality of recesses of the metal tube.