NEAR-INFRARED IMAGING SENSOR
    2.
    发明申请
    NEAR-INFRARED IMAGING SENSOR 有权
    近红外成像传感器

    公开(公告)号:US20100181484A1

    公开(公告)日:2010-07-22

    申请号:US12689550

    申请日:2010-01-19

    IPC分类号: H01L27/146

    摘要: A near-infrared imaging sensor according to the present invention includes a photodiode array sensitive to light with a wavelength of 1.2 to 3 μm and a multiplexer including a signal readout circuit. The near-infrared imaging sensor is contained in a housing and is vacuum-sealed. The housing includes a main body section and a lid covering the main body section. The lid is made of a material transparent to light with a wavelength of 1.2 to 3 μm.

    摘要翻译: 根据本发明的近红外成像传感器包括对波长为1.2至3μm的光敏感的光电二极管阵列和包括信号读出电路的多路复用器。 近红外成像传感器被包含在壳体中并被真空密封。 壳体包括主体部分和覆盖主体部分的盖子。 该盖由对透明至波长为1.2至3μm的光的材料制成。

    PHOTODIODE, PHOTODIODE ARRAY AND IMAGE PICKUP DEVICE
    4.
    发明申请
    PHOTODIODE, PHOTODIODE ARRAY AND IMAGE PICKUP DEVICE 审中-公开
    光电子,光电子阵列和图像拾取器件

    公开(公告)号:US20090295960A1

    公开(公告)日:2009-12-03

    申请号:US12473919

    申请日:2009-05-28

    IPC分类号: H04N5/335 H01J40/00

    摘要: A photodiode that can obtain a clear signal or image in a case in which noise that is not limited to a dark current is high, a photodiode array, and an image pickup device are provided. The photodiode includes a sensor section that is provided on a first semiconductor having a band gap energy which allows input light to be received; a modulated light-emitting section that is positioned behind the sensor section with respect to the input light, and that emits modulated light to the sensor section; and a signal processor that is formed on a second semiconductor which transmits the modulated light, and that is positioned between the sensor section and the modulated light emitting section.

    摘要翻译: 提供了在不限于暗电流的噪声的情况下能够获得清晰的信号或图像的光电二极管,光电二极管阵列和图像拾取装置。 光电二极管包括传感器部分,其设置在具有允许接收输入光的带隙能量的第一半导体上; 调制发光部,其相对于所述输入光定位在所述传感器部的后方,并且向所述传感器部发射调制光; 以及信号处理器,其形成在传输调制光的第二半导体上,并且位于传感器部分和调制发光部分之间。

    PHOTODIODE ARRAY, METHOD FOR MANUFACTURING PHOTODIODE ARRAY, EPITAXIAL WAFER, AND METHOD FOR MANUFACTURING EPITAXIAL WAFER
    6.
    发明申请
    PHOTODIODE ARRAY, METHOD FOR MANUFACTURING PHOTODIODE ARRAY, EPITAXIAL WAFER, AND METHOD FOR MANUFACTURING EPITAXIAL WAFER 有权
    光致抗体阵列,制造光电子阵列的方法,外延波形和制造外延波形的方法

    公开(公告)号:US20120196398A1

    公开(公告)日:2012-08-02

    申请号:US13446621

    申请日:2012-04-13

    IPC分类号: H01L31/18

    摘要: Provided are a photodiode array and its manufacturing method, which maintain the crystalline quality of an absorption layer formed on a group III-V semiconductor substrate to obtain excellent characteristics, and which improve the crystallinity at the surface of a window layer; an epitaxial wafer used for manufacturing the photodiode array; and a method for manufacturing the epitaxial wafer. A method for manufacturing a photodiode array 1 having a plurality of absorption regions 21, includes the steps of: growing an absorption layer 7 on an n-type InP substrate 3; growing an InP window layer on the absorption layer 7; and diffusing a p-type impurity in regions, in the window layer 11, corresponding to the plurality of absorption regions 21. The window layer 11 is grown by MOVPE using only metal-organic sources, at a growth temperature equal to or lower than that of the absorption layer 7.

    摘要翻译: 提供一种光电二极管阵列及其制造方法,其保持形成在III-V族半导体衬底上的吸收层的结晶质量,以获得优异的特性,并提高窗口层表面的结晶度; 用于制造光电二极管阵列的外延晶片; 以及制造外延晶片的方法。 制造具有多个吸收区域21的光电二极管阵列1的方​​法包括以下步骤:在n型InP衬底3上生长吸收层7; 在吸收层7上生长InP窗口层; 并且在窗层11中对应于多个吸收区域21的区域中扩散p型杂质。窗口层11通过仅使用金属有机源的MOVPE生长,生长温度等于或低于 的吸收层7。

    PHOTODIODE ARRAY, METHOD FOR MANUFACTURING PHOTODIODE ARRAY, EPITAXIAL WAFER, AND METHOD FOR MANUFACTURING EPITAXIAL WAFER
    7.
    发明申请
    PHOTODIODE ARRAY, METHOD FOR MANUFACTURING PHOTODIODE ARRAY, EPITAXIAL WAFER, AND METHOD FOR MANUFACTURING EPITAXIAL WAFER 有权
    光致抗体阵列,制造光电子阵列的方法,外延波形和制造外延波形的方法

    公开(公告)号:US20110101306A1

    公开(公告)日:2011-05-05

    申请号:US12916150

    申请日:2010-10-29

    摘要: Provided are a photodiode array and its manufacturing method, which maintain the crystalline quality of an absorption layer formed on a group III-V semiconductor substrate to obtain excellent characteristics, and which improve the crystallinity at the surface of a window layer; an epitaxial wafer used for manufacturing the photodiode array; and a method for manufacturing the epitaxial wafer. A method for manufacturing a photodiode array 1 having a plurality of absorption regions 21, includes the steps of: growing an absorption layer 7 on an n-type InP substrate 3; growing an InP window layer on the absorption layer 7; and diffusing a p-type impurity in regions, in the window layer 11, corresponding to the plurality of absorption regions 21. The window layer 11 is grown by MOVPE using only metal-organic sources, at a growth temperature equal to or lower than that of the absorption layer 7.

    摘要翻译: 提供一种光电二极管阵列及其制造方法,其保持形成在III-V族半导体衬底上的吸收层的结晶质量,以获得优异的特性,并提高窗口层表面的结晶度; 用于制造光电二极管阵列的外延晶片; 以及制造外延晶片的方法。 制造具有多个吸收区域21的光电二极管阵列1的方​​法包括以下步骤:在n型InP衬底3上生长吸收层7; 在吸收层7上生长InP窗口层; 并且在窗层11中对应于多个吸收区域21的区域中扩散p型杂质。窗口层11通过仅使用金属有机源的MOVPE生长,生长温度等于或低于 的吸收层7。