公开(公告)号：US09400176B2

公开(公告)日：2016-07-26

申请号：US14306298

申请日：2014-06-17

Applicant: Hermes Microvision, Inc.

Inventor： Joe Wang ,  Van-Duc Nguyen ,  Yi-Xiang Wang ,  Jack Jau ,  Zhong-Wei Chen

IPC: G01N23/00 ,  G01B11/22 ,  G01N23/04 ,  G01N23/20 ,  H01J37/21 ,  H01J37/28

CPC classification number: G01B11/22 ,  G01N23/04 ,  G01N23/20058 ,  G01N2223/32 ,  G01N2223/3301 ,  G01N2223/3302 ,  G01N2223/646 ,  H01J37/21 ,  H01J37/28 ,  H01J2237/216 ,  H01J2237/2482 ,  H01J2237/2487

Abstract: The present invention generally relates to dynamic focus adjustment for an image system. With the assistance of a height detection sub-system, present invention provides an apparatus and methods for micro adjusting an image focusing according the specimen surface height variation by altering the field strength of an electrostatic lens between objective lens and sample stage/or a bias voltage applied to the sample surface. Merely by way of example, the invention has been applied to a scanning electron inspection system. But it would be recognized that the invention could apply to other system using charged particle beam as observation tool with a height detection apparatus.

Abstract translation: 本发明一般涉及图像系统的动态聚焦调整。 本发明借助于高度检测子系统，提供了一种用于通过改变物镜和样品台之间的静电透镜的场强/或偏置电压来根据样本表面高度变化来微调整图像聚焦的装置和方法 应用于样品表面。 仅作为示例，本发明已经应用于扫描电子检查系统。 但是应当认识到，本发明可以应用于使用带有带电粒子束的其它系统作为具有高度检测装置的观察工具。

公开(公告)号：US09991147B2

公开(公告)日：2018-06-05

申请号：US14531263

申请日：2014-11-03

Applicant: Hermes Microvision Inc.

Inventor： Yi-Xiang Wang ,  Juying Dou ,  Kenichi Kanai

IPC: H01L21/683 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/20 ,  H01J37/28 ,  H01J37/317

CPC classification number: H01L21/6831 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/20 ,  H01J37/28 ,  H01J37/3174 ,  H01J2237/0044 ,  H01J2237/2008

Abstract: A wafer grounding apparatus and method adaptable to a charged particle beam apparatus is disclosed. A wafer substrate is supported by a wafer mount. A pulse current pin is arranged to be in contact with a backside film formed on a backside of the wafer substrate. A grounding pulse generator provides at least one pulse to drive the pulse current pin such that dielectric breakdown occurring at the backside film leads to establishment of a current path through the backside films. Accordingly, a current flows in the wafer substrate through this current path and then flows out of the wafer substrate via at least one current return path formed from capacitive coupling between the wafer substrate and the wafer mount.

公开(公告)号：US09536697B2

公开(公告)日：2017-01-03

申请号：US14716385

申请日：2015-05-19

Applicant: Hermes Microvision Inc.

Inventor： Yi-Xiang Wang ,  Jian Zhang ,  Yan Zhao

IPC: G01N23/00 ,  H01J37/02 ,  H01J37/244 ,  H01J37/26

CPC classification number: H01J37/026 ,  H01J37/244 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/0047 ,  H01J2237/024

Abstract: This invention provides a system and a method for calibrating charge-regulation module in vacuum environment. Means for mounting the charge-regulation module provides motions to the charge-regulation module such that a beam spot, illuminated by the charge-regulation module, on a sample surface can be moved to a pre-determined position which is irradiated by a charged particle beam.

Abstract translation: 本发明提供一种用于在真空环境中校准电荷调节模块的系统和方法。 用于安装充电调节模块的装置向充电调节模块提供运动，使得由样品表面上的充电调节模块照亮的束斑可以移动到由充电微粒照射的预定位置 光束。

公开(公告)号：US20160343534A1

公开(公告)日：2016-11-24

申请号：US14716385

申请日：2015-05-19

Applicant: Hermes Microvision Inc.

Inventor： Yi-Xiang Wang ,  Jian Zhang ,  Yan Zhao

IPC: H01J37/02 ,  H01J37/26 ,  H01J37/244

CPC classification number: H01J37/026 ,  H01J37/244 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/0047 ,  H01J2237/024

Abstract: This invention provides a system and a method for calibrating charge-regulation module in vacuum environment. Means for mounting the charge-regulation module provides motions to the charge-regulation module such that a beam spot, illuminated by the charge-regulation module, on a sample surface can be moved to a pre-determined position which is irradiated by a charged particle beam.

Abstract translation: 本发明提供一种用于在真空环境中校准电荷调节模块的系统和方法。 用于安装充电调节模块的装置向充电调节模块提供运动，使得由样品表面上的充电调节模块照亮的束斑可以移动到由充电微粒照射的预定位置 光束。

公开(公告)号：US09076629B2

公开(公告)日：2015-07-07

申请号：US13939675

申请日：2013-07-11

Applicant: Hermes Microvision Inc.

Inventor： Yi-Xiang Wang ,  Joe Wang ,  Wei-Ming Ren

IPC: H01J37/244 ,  H01J37/28

CPC classification number: H01J37/244 ,  H01J37/28 ,  H01J2237/24435 ,  H01J2237/2444 ,  H01J2237/2449

Abstract: This invention provides a design to process a large range of detection beam current at low noise with a single detector. With such a design, the detection system can generate up to 1010 gain and maximum signal output at more than mini Ampere (mA) level. A condenser lens is configured to increase bandwidth of the detector that scan speed can be enhanced.

Abstract translation: 本发明提供了利用单个检测器处理低噪声的大范围检测光束电流的设计。 通过这样的设计，检测系统可以以超过小于安培（mA）的电平产生多达1010个增益和最大信号输出。 配置聚光透镜以增加检测器的带宽，可以提高扫描速度。