公开(公告)号：US09922799B2

公开(公告)日：2018-03-20

申请号：US15213781

申请日：2016-07-19

Applicant: Hermes Microvision, Inc.

Inventor： Shuai Li ,  Weiming Ren ,  Xuedong Liu ,  Juying Dou ,  Xuerang Hu ,  Zhongwei Chen

IPC: H01J37/28 ,  H01J37/10 ,  H01J37/20 ,  H01J37/244

CPC classification number: H01J37/28 ,  H01J37/10 ,  H01J37/20 ,  H01J37/244 ,  H01J2237/0453 ,  H01J2237/0492 ,  H01J2237/04924 ,  H01J2237/04926 ,  H01J2237/04928 ,  H01J2237/1205 ,  H01J2237/1501 ,  H01J2237/1502 ,  H01J2237/2446 ,  H01J2237/2448 ,  H01J2237/2806 ,  H01J2237/2817

Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput and in flexibly varying observing conditions is proposed. The apparatus uses a movable collimating lens to flexibly vary the currents of the plural probe spots without influencing the intervals thereof, a new source-conversion unit to form the plural images of the single electron source and compensate off-axis aberrations of the plural probe spots with respect to observing conditions, and a pre-beamlet-forming means to reduce the strong Coulomb effect due to the primary-electron beam.

公开(公告)号：US20170025241A1

公开(公告)日：2017-01-26

申请号：US15213781

申请日：2016-07-19

Applicant: Hermes Microvision, Inc.

Inventor： Shuai Li ,  Weiming Ren ,  Xuedong Liu ,  Juying Dou ,  Xuerang Hu ,  Zhongwei Chen

IPC: H01J37/14 ,  H01J37/20 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/28 ,  H01J37/10 ,  H01J37/20 ,  H01J37/244 ,  H01J2237/0453 ,  H01J2237/0492 ,  H01J2237/04924 ,  H01J2237/04926 ,  H01J2237/04928 ,  H01J2237/1205 ,  H01J2237/1501 ,  H01J2237/1502 ,  H01J2237/2446 ,  H01J2237/2448 ,  H01J2237/2806 ,  H01J2237/2817

Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput and in flexibly varying observing conditions is proposed. The apparatus uses a movable collimating lens to flexibly vary the currents of the plural probe spots without influencing the intervals thereof, a new source-conversion unit to form the plural images of the single electron source and compensate off-axis aberrations of the plural probe spots with respect to observing conditions, and a pre-beamlet-forming means to reduce the strong Coulomb effect due to the primary-electron beam.

Abstract translation: 提出了一种用于以高分辨率和高吞吐量和灵活变化的观察条件观察样品的多光束装置。 该装置使用可移动准直透镜来灵活地改变多个探针点的电流而不影响其间隔，新的源转换单元形成单个电子源的多个图像并补偿多个探针点的离轴像差 以及用于减小由于一次电子束引起的强烈的库仑效应的前束形成装置。

公开(公告)号：US09991147B2

公开(公告)日：2018-06-05

申请号：US14531263

申请日：2014-11-03

Applicant: Hermes Microvision Inc.

Inventor： Yi-Xiang Wang ,  Juying Dou ,  Kenichi Kanai

IPC: H01L21/683 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/20 ,  H01J37/28 ,  H01J37/317

CPC classification number: H01L21/6831 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/20 ,  H01J37/28 ,  H01J37/3174 ,  H01J2237/0044 ,  H01J2237/2008

Abstract: A wafer grounding apparatus and method adaptable to a charged particle beam apparatus is disclosed. A wafer substrate is supported by a wafer mount. A pulse current pin is arranged to be in contact with a backside film formed on a backside of the wafer substrate. A grounding pulse generator provides at least one pulse to drive the pulse current pin such that dielectric breakdown occurring at the backside film leads to establishment of a current path through the backside films. Accordingly, a current flows in the wafer substrate through this current path and then flows out of the wafer substrate via at least one current return path formed from capacitive coupling between the wafer substrate and the wafer mount.