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    Phase modulators in alignment to decrease mark size
    2.
    发明授权
    Phase modulators in alignment to decrease mark size 有权

    公开(公告)号：US11803130B2

    公开(公告)日：2023-10-31

    申请号：US17633884

    申请日：2020-08-05

    Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

    Inventor： Franciscus Godefridus Casper Bijnen ,  Muhsin Eralp ,  Simon Reinald Huisman ,  Arie Jeffrey Den Boef

    IPC: G03F9/00

    CPC classification number: G03F9/7049 ,  G03F9/7069 ,  G03F9/7088

    Abstract: An alignment apparatus includes an illumination system configured to direct one or more illumination beams towards an alignment target and receive the diffracted beams from the alignment target. The alignment apparatus also includes a self-referencing Interferometer configured to generate two diffraction sub-beams, wherein the two diffraction sub-beams are orthogonally polarized, rotated 180 degrees with respect to each other around an alignment axis, and spatially overlapped. The alignment apparatus further includes a beam analyzer configured to generate interference between the overlapped components of the diffraction sub-beams and produce two orthogonally polarized optical branches, and a detection system configured to determine a position of the alignment target based on light intensity measurement of the optical branches, wherein the measured light intensity is temporally modulated by a phase modulator.

    Determining position and curvature information directly from a surface of a patterning device
    4.
    发明授权
    Determining position and curvature information directly from a surface of a patterning device 有权
    从图案形成装置的表面直接确定位置和曲率信息

    公开(公告)号：US09377700B2

    公开(公告)日：2016-06-28

    申请号：US14357514

    申请日：2013-05-31

    Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

    Inventor： Mark Josef Schuster ,  Santiago E. Del Puerto ,  Daniel Nathan Burbank ,  Duncan Walter Bromley ,  Franciscus Godefridus Casper Bijnen

    IPC: G03B27/32 ,  G03B27/62 ,  G03F7/20 ,  G03F1/00 ,  G03F1/38

    CPC classification number: G03F7/70775 ,  G03F1/14 ,  G03F1/142 ,  G03F1/38 ,  G03F7/707 ,  G03F7/70708 ,  G03F7/70783 ,  G03F7/7085

    Abstract: Position and curvature information of a patterning device may be determined directly from the patterning device and controlled based on the determined information. In an embodiment, a lithographic apparatus includes a position determining system operative to determine a relative position of the patterning device. The patterning device may be configured to create a patterned radiation beam from a radiation beam incident on a major surface of the patterning device. The patterning device may have a side surface having an edge in common with the major surface. The position determining system may include an interferometer operative to transmit light to the side surface and to receive the transmitted light after the transmitted light has been reflected at the side surface. The position determining system is operative to determine a quantity representative of the relative position of the patterning device from the received reflected transmitted light.

    Abstract translation: 图案形成装置的位置和曲率信息可以直接从图案形成装置确定并基于所确定的信息进行控制。 在一个实施例中，光刻设备包括位置确定系统，其可操作以确定图案形成装置的相对位置。 图案形成装置可以被配置为从入射在图案形成装置的主表面上的辐射束产生图案化的辐射束。 图案形成装置可以具有与主表面共同的边缘的侧表面。 位置确定系统可以包括干涉仪，其操作以将光透射到侧表面，并且在透射光已经在侧表面被反射之后接收透射光。 位置确定系统用于确定代表图案形成装置相对于所接收的反射透射光的相对位置的量。

    METHOD TO DETERMINE THE USEFULNESS OF ALIGNMENT MARKS TO CORRECT OVERLAY, AND A COMBINATION OF A LITHOGRAPHIC APPARATUS AND AN OVERLAY MEASUREMENT SYSTEM
    5.
    发明申请
    METHOD TO DETERMINE THE USEFULNESS OF ALIGNMENT MARKS TO CORRECT OVERLAY, AND A COMBINATION OF A LITHOGRAPHIC APPARATUS AND AN OVERLAY MEASUREMENT SYSTEM 有权
    确定对准标记的有效性以纠正重叠的方法，以及一个平面设备和叠加测量系统的组合

    公开(公告)号：US20150146188A1

    公开(公告)日：2015-05-28

    申请号：US14403577

    申请日：2013-04-23

    Applicant: ASML NETHERLANDS B.V.

    Inventor： Irina Lyulina ,  Franciscus Godefridus Casper Bijnen ,  Remi Daniel Marie Edart ,  Antoine Gaston Marie Kiers ,  Michael Kubis

    IPC: G03F7/20 ,  G01B11/14

    CPC classification number: G03F7/70141 ,  G01B11/14 ,  G03F7/70633 ,  G03F9/7046

    Abstract: A method to determine the usefulness of an alignment mark of a first pattern in transferring a second pattern to a substrate relative to the first pattern already present on the substrate includes measuring the position of the alignment mark, modeling the position of the alignment mark, determining the model error between measured and modeled position, measuring a corresponding overlay error between first and second pattern and comparing the model error with the overlay error to determine the usefulness of the alignment mark. Subsequently this information can be used when processing next substrates thereby improving the overlay for these substrates. A lithographic apparatus and/or overlay measurement system may be operated in accordance with the method.

    Abstract translation: 确定第一图案的对准标记在基板上相对于已经存在于基板上的第一图案的第二图案的有用性的方法包括测量对准标记的位置，对对准标记的位置进行建模，确定 测量和建模位置之间的模型误差，测量第一和第二模式之间的对应覆盖误差，并将模型误差与覆盖误差进行比较，以确定对准标记的有用性。 随后，当处理下一个基板时，可以使用该信息，从而改善这些基板的覆盖层。 可以根据该方法操作光刻设备和/或覆盖测量系统。

    Measurement apparatus
    6.
    发明授权
    Measurement apparatus 有权

    公开(公告)号：US11105619B2

    公开(公告)日：2021-08-31

    申请号：US16629990

    申请日：2018-07-13

    Applicant: ASML NETHERLANDS B.V.

    Inventor： Franciscus Godefridus Casper Bijnen ,  Junichi Kanehara ,  Stefan Carolus Jacobus Antonius Keij ,  Thomas Augustus Mattaar ,  Petrus Franciscus Van Gils

    IPC: G01B11/27

    Abstract: In order to improve the throughput performance and/or economy of a measurement apparatus, the present disclosure provides a metrology apparatus including: a first measuring apparatus; a second measuring apparatus; a first substrate stage configured to hold a first substrate and/or a second substrate; a second substrate stage configured to hold the first substrate and/or the second substrate; a first substrate handler configured to handle the first substrate and/or the second substrate; and a second substrate handler configured to handle the first substrate and/or the second substrate, wherein the first substrate is loaded from a first, second or third FOUP, wherein the second substrate is loaded from the first, second or third FOUP, wherein the first measuring apparatus is an alignment measuring apparatus, and wherein the second measuring apparatus is a level sensor, a film thickness measuring apparatus or a spectral reflectance measuring apparatus.

    DETERMINING POSITION AND CURVATURE INFORMATION DIRECTLY FROM A SURFACE OF A PATTERNING DEVICE
    8.
    发明申请
    DETERMINING POSITION AND CURVATURE INFORMATION DIRECTLY FROM A SURFACE OF A PATTERNING DEVICE 有权
    确定位置和曲线信息直接从图案设备的表面

    公开(公告)号：US20140307246A1

    公开(公告)日：2014-10-16

    申请号：US14357514

    申请日：2013-05-31

    Applicant: ASML HOLDING N.V. ,  ASML NETHERLANDS B.V.

    Inventor： Mark Josef Schuster ,  Santiago E Del Puerto ,  Daniel Nathan Burbank ,  Duncan Walter Bromley ,  Franciscus Godefridus Casper Bijnen

    IPC: G03F7/20

    CPC classification number: G03F7/70775 ,  G03F1/14 ,  G03F1/142 ,  G03F1/38 ,  G03F7/707 ,  G03F7/70708 ,  G03F7/70783 ,  G03F7/7085

    Abstract: Position and curvature information of a patterning device may be determined directly from the patterning device and controlled based on the determined information. In an embodiment, a lithographic apparatus includes a position determining system operative to determine a relative position of the patterning device. The patterning device may be configured to create a patterned radiation beam from a radiation beam incident on a major surface of the patterning device. The patterning device may have a side surface having an edge in common with the major surface. The position determining system may include an interferometer operative to transmit light to the side surface and to receive the transmitted light after the transmitted light has been reflected at the side surface. The position determining system is operative to determine a quantity representative of the relative position of the patterning device from the received reflected transmitted light.

    Abstract translation: 图案形成装置的位置和曲率信息可以直接从图案形成装置确定并基于所确定的信息进行控制。 在一个实施例中，光刻设备包括位置确定系统，其可操作以确定图案形成装置的相对位置。 图案形成装置可以被配置为从入射在图案形成装置的主表面上的辐射束产生图案化的辐射束。 图案形成装置可以具有与主表面共同的边缘的侧表面。 位置确定系统可以包括干涉仪，其操作以将光透射到侧表面，并且在透射光已经在侧表面被反射之后接收透射光。 位置确定系统用于确定代表图案形成装置相对于所接收的反射透射光的相对位置的量。

    Method and apparatus for controlling an industrial process using product grouping
    9.
    发明授权
    Method and apparatus for controlling an industrial process using product grouping 有权

    公开(公告)号：US11054813B2

    公开(公告)日：2021-07-06

    申请号：US15763834

    申请日：2016-09-21

    Applicant: ASML NETHERLANDS B.V.

    Inventor： Alexander Ypma ,  David Frans Simon Deckers ,  Franciscus Godefridus Casper Bijnen ,  Richard Johannes Franciscus Van Haren ,  Weitian Kou

    IPC: G05B19/418 ,  G03F7/20 ,  G03F9/00

    Abstract: In a lithographic process in which a series of substrates are processed in different contexts, object data (such as performance data representing overlay measured on a set of substrates that have been processed previously) is received. Context data represents one or more parameters of the lithographic process that vary between substrates within the set. By principal component analysis or other statistical analysis of the performance data, the set of substrates are partitioned into two or more subsets. The first partitioning of the substrates and the context data are used to identify one or more relevant context parameters, being parameters of the lithographic process that are observed to correlate most strongly with the first partitioning. The lithographic apparatus is controlled for new substrates by reference to the identified relevant context parameters. Embodiments with feedback control and feedforward control are described.

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