公开(公告)号：US11029610B2

公开(公告)日：2021-06-08

申请号：US16650520

申请日：2018-09-04

Applicant: ASML NETHERLANDS B.V.

Inventor： Patricius Aloysius Jacobus Tinnemans ,  Edo Maria Hulsebos ,  Henricus Johannes Lambertus Megens ,  Ahmet Koray Erdamar ,  Loek Johannes Petrus Verhees ,  Willem Seine Christian Roelofs ,  Wendy Johanna Martina Van De Ven ,  Hadi Yagubizade ,  Hakki Ergün Cekli ,  Ralph Brinkhof ,  Tran Thanh Thuy Vu ,  Maikel Robert Goosen ,  Maaike Van T Westeinde ,  Weitian Kou ,  Manouk Rijpstra ,  Matthijs Cox ,  Franciscus Godefridus Casper Bijnen

IPC: G03F7/20 ,  G03F9/00

Abstract: A method for determining one or more optimized values of an operational parameter of a sensor system configured for measuring a property of a substrate. The method includes: determining a quality parameter for a plurality of substrates; determining measurement parameters for the plurality of substrates obtained using the sensor system for a plurality of values of the operational parameter; comparing a substrate to substrate variation of the quality parameter and a substrate to substrate variation of a mapping of the measurement parameters; and determining the one or more optimized values of the operational parameter based on the comparing.