公开(公告)号：US20230260820A1

公开(公告)日：2023-08-17

申请号：US18305925

申请日：2023-04-24

Applicant: ASML NETHERLANDS B.V.

Inventor： Andre Bernardus JEUNINK ,  Robby Franciscus Josephus MARTENS ,  Youssef Karel Maria DE VOS ,  Ringo Petrus Cornelis VAN DORST ,  Gerhard Albert TEN BRINKE ,  Dirk Jerome Andre SENDEN ,  Coen Hubertus Matheus BALTIS ,  Justin Johannes Hermanus GERRITZEN ,  Jelmer Mattheüs KAMMINGA ,  Evelyn Wallis PACITTI ,  Thomas POIESZ ,  Arie Cornelis SCHEIBERLICH ,  Bert Dirk SCHOLTEN ,  André SCHREUDER ,  Abraham Alexander SOETHOUDT ,  Siegfried Alexander TROMP ,  Yuri Johannes Gabriël VAN DE VIJVER

IPC: H01L21/683 ,  G03F7/00 ,  H01L21/687 ,  B25B11/00

CPC classification number: H01L21/6838 ,  G03F7/707 ,  G03F7/70733 ,  H01L21/68742 ,  B25B11/005

Abstract: A method for unloading a substrate from a support table configured to support the substrate, the method including: supplying gas to a gap between a base surface of the support table and the substrate via a plurality of gas flow openings in the support table, wherein during an initial phase of unloading the gas is supplied through at least one gas flow opening in an outer region of the support table and not through any gas flow opening in a central region of the support table radially inward of the outer region, and during a subsequent phase of unloading the gas is supplied through at least one gas flow opening in the outer region and at least one gas flow opening in the central region.

公开(公告)号：US20210141312A1

公开(公告)日：2021-05-13

申请号：US17151291

申请日：2021-01-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Günes NAKIBOGLU ,  Coen Hubertus Matheus BALTIS ,  Siegfried Alexander TROMP ,  Yuri Johannes Gabriël VAN DE VIJVER ,  Bert Dirk SCHOLTEN ,  Daan Daniel Johannes Antonius VAN SOMMERE ,  Mark Johannes Hermanus FRENCKEN

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/687

Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder including a main body having a main body surface; a plurality of burls projecting from the main body surface to support the substrate spaced apart from the main body surface; and a liquid control structure provided in a peripheral region of the main body surface and configured to cause liquid to preferentially flow toward the periphery of the main body surface.

公开(公告)号：US20190163066A1

公开(公告)日：2019-05-30

申请号：US16097640

申请日：2017-04-05

Applicant: ASML NETHERLANDS B.V.

Inventor： Gijs KRAMER ,  Martijn HOUBEN ,  Nicholas Peter WATERSON ,  Thibault Simon Mathieu LAURENT ,  Yuri Johannes Gabriël VAN DE VIJVER ,  Marcus Martinus Petrus Adrianus VERMEULEN ,  Simon Karel RAVENSBERGEN ,  Vincentius Fransiscus CLOOSTERMAN ,  Siegfried Alexander TROMP ,  Coen Hubertus Matheus BALTIS ,  Justin Johannes Hermanus GERRITZEN ,  Niek Jacobus Johannes ROSET

IPC: G03F7/20

CPC classification number: G03F7/2041 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70733

Abstract: An extraction body for a support apparatus of a lithographic apparatus. The support apparatus is configured to support an object. The extraction body is formed with an opening at a surface thereof. The opening extends within the extraction body forming a first passageway. The first passageway is configured to fluidly communicate an extraction channel in the extraction body to liquid between the surface and the object. A first pressure in the extraction channel is less than ambient pressure. At least a part of the first passageway is sized and dimensioned such that when the liquid enters the first passageway via the opening, a second pressure in the first passageway associated with surface tension of the liquid is lower than the first pressure such that at least a portion of the liquid is retained in the first passageway.

公开(公告)号：US20240168394A1

公开(公告)日：2024-05-23

申请号：US18398860

申请日：2023-12-28

Applicant: ASML NETHERLANDS B.V.

Inventor： Stef Marten Johan JANSSENS ,  Bert Dirk SCHOLTEN ,  Sjoerd Nicolaas Lambertus DONDERS ,  Teunis VAN DAM ,  Peter Mark OVERSCHIE ,  Theresa Mary SPAAN-BURKE ,  Siegfried Alexander TROMP

IPC: G03F7/00 ,  H01L21/683

CPC classification number: G03F7/70725 ,  G03F7/707 ,  G03F7/70783 ,  G03F7/70816 ,  H01L21/6838 ,  H01L21/67288

Abstract: A system for positioning, a stage system, a lithographic apparatus, a method for positioning and a method for manufacturing a device in which use is made of a stage system that includes a plurality of gas bearing devices. Each gas bearing device includes: a gas bearing body, which has a free surface, a primary channel which extends through the gas bearing body and has an inlet opening in the free surface, a secondary channel system which extends through the gas bearing body and which has a plurality of discharge openings in the free surface. The flow resistance in the secondary channel system is higher than the flow resistance in the primary channel.

公开(公告)号：US20190187571A1

公开(公告)日：2019-06-20

申请号：US16309501

申请日：2017-06-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Stef Marten Johan JANSSENS ,  Bert Dirk SCHOLTEN ,  Sjoerd Nicolaas Lambertus DONDERS ,  Teunis VAN DAM ,  Peter Mark OVERSCHIE ,  Theresa Mary SPAAN-BURKE ,  Siegfried Alexander TROMP

IPC: G03F7/20

CPC classification number: G03F7/70725 ,  G03F7/70625 ,  G03F7/707 ,  H01L21/67288 ,  H01L21/6838

Abstract: A system for positioning, a stage system, a lithographic apparatus, a method for positioning and a method for manufacturing a device in which use is made of a stage system. The stage system has a plurality of air bearing devices. Each air bearing device has: a gas bearing body which has a free surface, a primary channel which extends through the bearing body and has an inlet opening in the free surface, and a secondary channel system which extends through the bearing body and which has a plurality of discharge openings in the free surface. The flow resistance in the secondary channel system can be higher than the flow resistance in the primary channel.

公开(公告)号：US20180267412A1

公开(公告)日：2018-09-20

申请号：US15918478

申请日：2018-03-12

Applicant: ASML Netherlands B.V.

Inventor： Thibault Simon Mathieu LAURENT ,  Johannes Henricus Wilhelmus JACOBS ,  Wilhelmus Franciscus Johannes SIMONS ,  Martijn HOUBEN ,  Raymond Wilhelmus Louis LAFARRE ,  Koen STEFFENS ,  Han Henricus Aldegonda LEMPENS ,  Rogier Hendrikus Magdalena CORTIE ,  Ruud Hendrikus Martinus Johannes BLOKS ,  Gerben PIETERSE ,  Siegfried Alexander TROMP ,  Theodorus Wilhelmus POLET ,  Jim Vincent OVERKAMP ,  Van Vuong VY

IPC: G03F7/20 ,  H01L21/68

CPC classification number: G03F7/70341 ,  G03F7/70716 ,  G03F7/70875 ,  G03F7/7095 ,  H01L21/682

Abstract: An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway.

公开(公告)号：US20210381548A1

公开(公告)日：2021-12-09

申请号：US17407778

申请日：2021-08-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Siegfried Alexander TROMP ,  Antonie Hendrik VERWEIJ ,  Abraham Alexander SOETHOUDT ,  Jan Pieter VAN DE POEL

IPC: F16C32/06 ,  H01L21/683 ,  F16C29/02 ,  G03F7/20

Abstract: A support table for a lithographic apparatus, a method of loading a substrate, a lithographic apparatus and a method for manufacturing a device using a lithographic apparatus. In one arrangement, a support table is configured to support a substrate. The support table has a base surface. The base surface faces a surface of the substrate when the substrate is supported by the support table. One or more gas cushion members are provided above the base surface. Each of the gas cushion members includes a recess. The recess is shaped and configured such that a lowering of the substrate into a position on the support table at which the substrate is supported by the support table causes a localised build-up of pressure within the recess. The localized build-up of pressure provides a localised gas cushioning effect during the lowering of the substrate.

公开(公告)号：US20180259855A1

公开(公告)日：2018-09-13

申请号：US15761245

申请日：2016-08-24

Applicant: ASML Netherlands B.V.

Inventor： Bas Johannes Petrus ROSET ,  Siegfried Alexander TROMP

IPC: G03F7/20

Abstract: A substrate holder (WT) for use in a lithographic apparatus and configured to support a substrate, the substrate holder comprising: a main body (20) having a main body surface; and a plurality of burls (21) projecting from the main body surface; wherein each burl has a distal end configured to engage with the substrate; the distal ends of the burls substantially conform to a support plane whereby a substrate can be supported in a substantially flat state on the burls; and a flow control feature (22, 22c, 22d) configured to form a gas cushion adjacent the periphery of the substrate holder when a substrate is being lowered onto the substrate holder.

公开(公告)号：US20230075771A1

公开(公告)日：2023-03-09

申请号：US17798354

申请日：2021-01-25

Applicant: ASML NETHERLANDS B.V.

Inventor： Coen Hubertus Matheus BALTIS ,  Nicolaas TEN KATE ,  Marcus Martinus Petrus Adrianus Petrus Adrianus VERMEULEN ,  Siegfried Alexander TROMP ,  Frank Pieter Albert VAN DEN BERKMORTEL ,  Niek Jacobus Johannes ROSET ,  Gijs KRAMER ,  Nicolaas Petrus Marcus BRANTJES ,  Michiel Theodorus Jacobus FONTEYN

IPC: G03F7/20

Abstract: A substrate support for supporting a substrate in a lithographic apparatus, the substrate support including: a support body configured to support the substrate; a main body separate from the support body and configured to support the support body, the main body including a thermal conditioner configured to thermally condition the main body and/or support body and/or substrate; and an extractor body surrounding the main body and the support body, the extractor body having an extraction channel configured to extract fluid from near a peripheral part of the substrate.

公开(公告)号：US20230004092A1

公开(公告)日：2023-01-05

申请号：US17778054

申请日：2020-11-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Michael Marinus Anna STEUR ,  Nicolaas TEN KATE ,  Siegfried Alexander TROMP ,  Koen Gerhardus WINKELS ,  Antonius Franciscus Johanne DE GROOT

IPC: G03F7/20 ,  H01L21/687

Abstract: Substrate tables and methods of manufacturing substrate supports for substrate tables. In one arrangement, a plurality of holes are formed through a base member. A burl formation member is joined to the base member. A plurality of burl structures are formed in the burl formation member. Each burl structure includes a distal surface that contacts, in use, a substrate being supported. Each burl structure has an opening to at least one of the holes formed through the base member.