Invention Application
- Patent Title: SUBSTRATE SUPPORT AND SUBSTRATE TABLE
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Application No.: US17798354Application Date: 2021-01-25
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Publication No.: US20230075771A1Publication Date: 2023-03-09
- Inventor: Coen Hubertus Matheus BALTIS , Nicolaas TEN KATE , Marcus Martinus Petrus Adrianus Petrus Adrianus VERMEULEN , Siegfried Alexander TROMP , Frank Pieter Albert VAN DEN BERKMORTEL , Niek Jacobus Johannes ROSET , Gijs KRAMER , Nicolaas Petrus Marcus BRANTJES , Michiel Theodorus Jacobus FONTEYN
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Priority: EP20158919.9 20200224,EP20163571.1 20200317
- International Application: PCT/EP2021/051581 WO 20210125
- Main IPC: G03F7/20
- IPC: G03F7/20
Abstract:
A substrate support for supporting a substrate in a lithographic apparatus, the substrate support including: a support body configured to support the substrate; a main body separate from the support body and configured to support the support body, the main body including a thermal conditioner configured to thermally condition the main body and/or support body and/or substrate; and an extractor body surrounding the main body and the support body, the extractor body having an extraction channel configured to extract fluid from near a peripheral part of the substrate.
Information query
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