公开(公告)号：US20180151337A1

公开(公告)日：2018-05-31

申请号：US15818169

申请日：2017-11-20

申请人： APPLIED MATERIALS, INC.

发明人： THANH X. NGUYEN ,  WEIMIN ZENG ,  YONG CAO

IPC分类号： H01J37/34 ,  H01L21/02

CPC分类号： H01J37/3441 ,  H01J37/3438 ,  H01J37/3488 ,  H01L21/02266

摘要： Embodiments of process kits for process chambers and methods for processing a substrate are provided herein. In some embodiments, a process kit includes a non-conductive upper shield having an upper portion to surround a sputtering target and a lower portion extending downward from the upper portion; and a conductive lower shield disposed radially outward of the non-conductive upper shield and having a cylindrical body with an upper portion and a lower portion, a lower wall projecting radially inward from the lower portion, and a lip protruding upward from the lower wall. The cylindrical body is spaced apart from the non-conductive upper shield by a first gap. The lower wall is spaced apart from the lower portion of the non-conductive upper shield by a second gap to limit a direct line of sight between a volume within the non-conductive upper shield and the cylindrical body of the conductive lower shield.

公开(公告)号：US20150203960A1

公开(公告)日：2015-07-23

申请号：US14600915

申请日：2015-01-20

申请人： APPLIED MATERIALS, INC

发明人： SRINIVASA YEDLA ,  SUNDARAPANDIAN REDDY ,  UDAY PAI ,  KIRANKUMAR SAVANDAIAH ,  THANH X. NGUYEN ,  MUHAMMAD M. RASHEED ,  JALLEPALLY RAVI

IPC分类号： C23C14/50 ,  B25B5/08

CPC分类号： H01J37/3435

摘要： Embodiments of target retaining apparatus and substrate processing chambers incorporating same are provided herein. In some embodiments, a target retaining apparatus includes a housing including a first slot and a second slot; a cam movably disposed in the housing, wherein movement of the cam is constrained along the first slot; a retaining arm movably coupled to the cam, wherein movement of the retaining arm is constrained along the second slot; a linking member including a first end rotatably coupled to the cam and a second end rotatably coupled to the retaining arm; and a biasing element biasing the cam towards a first position in which the retaining arm extends away from the housing.

摘要翻译： 本文提供了包含相同的目标保持装置和基板处理室的实施例。 在一些实施例中，目标保持装置包括壳体，其包括第一槽和第二槽; 可移动地设置在所述壳体中的凸轮，其中所述凸轮的运动沿着所述第一狭槽被限制; 可移动地联接到所述凸轮的保持臂，其中所述保持臂的运动沿着所述第二狭槽被限制; 连接构件，其包括可旋转地联接到所述凸轮的第一端和可旋转地联接到所述保持臂的第二端; 以及将所述凸轮偏压到所述保持臂远离所述壳体延伸的第一位置的偏压元件。

公开(公告)号：US20150170888A1

公开(公告)日：2015-06-18

申请号：US14182831

申请日：2014-02-18

申请人： APPLIED MATERIALS, INC.

发明人： MARTIN LEE RIKER ,  UDAY PAI ,  WILLIAM FRUCHTERMAN ,  KEITH A. MILLER ,  MUHAMMAD M. RASHEED ,  THANH X. NGUYEN ,  KIRANKUMAR SAVANDAIAH

IPC分类号： H01J37/34

CPC分类号： H01J37/3414 ,  C23C14/3407 ,  H01J37/3411 ,  H01J37/3423 ,  H01J37/3435

摘要： Embodiments of target assemblies for use in substrate processing chambers are provided herein. In some embodiments, a target assembly includes a plate comprising a first side including a central portion and a support portion; a target disposed on the central portion; a plurality of recesses formed in the support portion; and a plurality of pads partially disposed in the plurality of recesses.

摘要翻译： 本文提供了用于基板处理室的目标组件的实施例。 在一些实施例中，目标组件包括板，其包括包括中心部分和支撑部分的第一侧面; 设置在中心部分上的目标; 形成在所述支撑部中的多个凹部; 以及部分地设置在所述多个凹部中的多个垫。

公开(公告)号：US20190189407A1

公开(公告)日：2019-06-20

申请号：US16215769

申请日：2018-12-11

申请人： APPLIED MATERIALS, INC.

发明人： THANH X. NGUYEN ,  ALEXANDER JANSEN ,  YANA CHENG ,  RANDAL SCHMIEDING ,  YONG CAO ,  XIANMIN TANG ,  WILLIAM JOHANSON

IPC分类号： H01J37/34 ,  C23C14/54 ,  C23C14/34

CPC分类号： H01J37/347 ,  C23C14/34 ,  C23C14/545

摘要： A movable substrate support with a top surface for holding a substrate, when present, is used in conjunction with a cover ring that is stationary to adjust for a shadow effect to control substrate edge uniformity during deposition processes. The cover ring is held stationary by an electrically isolated spacer that engages with a grounded shield in the process volume of a semiconductor process chamber. A controller adjusts the substrate support in response to deposition material on a top surface of the cover ring to maintain the shadow effect and substrate edge uniformity.

公开(公告)号：US20160172168A1

公开(公告)日：2016-06-16

申请号：US14616895

申请日：2015-02-09

申请人： APPLIED MATERIALS, INC.

发明人： Keith A. Miller ,  THANH X. NGUYEN ,  ILYA LAVITSKY ,  RANDY SCHMIEDING ,  PRASHANTH KOTHNUR

IPC分类号： H01J37/34

CPC分类号： H01J37/3452 ,  C23C14/345 ,  C23C14/3485 ,  C23C14/352 ,  H01J37/3408 ,  H01J37/3417 ,  H01J37/3467

摘要： Apparatus for physical vapor deposition of dielectric material is provided herein. In some embodiments, a chamber lid of a physical vapor deposition chamber includes an inner magnetron assembly coupled to an inner target assembly, and an outer magnet assembly coupled to an outer target assembly, wherein the inner magnetron assembly and the inner target assembly are electrically isolated from the outer magnet assembly and the outer target assembly.

摘要翻译： 本文提供介电材料的物理气相沉积设备。 在一些实施例中，物理气相沉积室的室盖包括耦合到内部目标组件的内部磁控管组件和联接到外部目标组件的外部磁体组件，其中内部磁控管组件和内部目标组件被电隔离 从外部磁体组件和外部目标组件。