公开(公告)号：US20150203960A1

公开(公告)日：2015-07-23

申请号：US14600915

申请日：2015-01-20

申请人： APPLIED MATERIALS, INC

发明人： SRINIVASA YEDLA ,  SUNDARAPANDIAN REDDY ,  UDAY PAI ,  KIRANKUMAR SAVANDAIAH ,  THANH X. NGUYEN ,  MUHAMMAD M. RASHEED ,  JALLEPALLY RAVI

IPC分类号： C23C14/50 ,  B25B5/08

CPC分类号： H01J37/3435

摘要： Embodiments of target retaining apparatus and substrate processing chambers incorporating same are provided herein. In some embodiments, a target retaining apparatus includes a housing including a first slot and a second slot; a cam movably disposed in the housing, wherein movement of the cam is constrained along the first slot; a retaining arm movably coupled to the cam, wherein movement of the retaining arm is constrained along the second slot; a linking member including a first end rotatably coupled to the cam and a second end rotatably coupled to the retaining arm; and a biasing element biasing the cam towards a first position in which the retaining arm extends away from the housing.

摘要翻译： 本文提供了包含相同的目标保持装置和基板处理室的实施例。 在一些实施例中，目标保持装置包括壳体，其包括第一槽和第二槽; 可移动地设置在所述壳体中的凸轮，其中所述凸轮的运动沿着所述第一狭槽被限制; 可移动地联接到所述凸轮的保持臂，其中所述保持臂的运动沿着所述第二狭槽被限制; 连接构件，其包括可旋转地联接到所述凸轮的第一端和可旋转地联接到所述保持臂的第二端; 以及将所述凸轮偏压到所述保持臂远离所述壳体延伸的第一位置的偏压元件。