Method and apparatus for handling thin semiconductor wafers
    6.
    发明授权
    Method and apparatus for handling thin semiconductor wafers 有权
    用于处理薄半导体晶片的方法和设备

    公开(公告)号:US07157376B1

    公开(公告)日:2007-01-02

    申请号:US10918395

    申请日:2004-08-16

    CPC classification number: H01L21/02008 H01L21/3065 H01L21/6732 Y10T29/41

    Abstract: Cassettes for holding thin semiconductor wafers for safe handling are provided, along with an improved methodology for reducing the thickness of semiconductor wafers. Embodiments include a cassette for holding thin semiconductor wafers, having a plurality of sets of center and edge supports, the sets being spaced from each other a distance greater than a sag amount of the wafers. The thin wafers are supported in a predetermined reference plane, so that tools such as robots or automatic handlers can be programmed to pick them up without damaging them. In another embodiment, a double into single pitch wafer cassette is provided having a wafer entrance section with spacing twice as large between sets of edge supports as a conventional cassette, to accommodate the sag/warp of the thin wafers, and a “flattening section” which guides and flattens the wafers between opposing edge supports as they are pushed into the cassette, such that the wafers are held substantially planar. Because the wafers are held substantially planar, they can be safely removed from the cassette by automatic tools. A methodology is also provided for reducing the thickness of a semiconductor wafer, comprising grinding the back side of the wafer to reduce its initial thickness to an intermediate thickness, and plasma etching the back side of the wafer to reduce the intermediate thickness to a final thickness. The two-step grinding/etching process is faster and less expensive than conventional multi-step grinding/polishing processes, because it requires less steps, each step is accomplished relatively quickly, and it employs standard grinding and etching equipment, rather than expensive dedicated equipment.

    Abstract translation: 提供了用于保持用于安全处理的薄半导体晶片的盒,以及用于减小半导体晶片的厚度的改进的方法。 实施例包括用于保持薄半导体晶片的盒,具有多组中心和边缘支撑件,所述组彼此间隔开大于晶片下垂量的距离。 薄晶片被支撑在预定的参考平面中,使得诸如机器人或自动处理器的工具可以被编程以拾取它们而不损坏它们。 在另一个实施例中,提供双进单节距晶片盒,其具有晶片入口部分,其在传统盒体之间的边缘支撑件之间具有间隔两倍的距离,以适应薄晶片的松弛/翘曲,以及“扁平部分” 当它们被推入盒中时,它们在相对边缘支撑件之间引导和平坦化晶片,使得晶片保持基本上平面。 因为晶片被保持为基本上平面的,它们可以通过自动工具被安全地从盒中移除。 还提供了一种用于减小半导体晶片的厚度的方法,包括研磨晶片的背面以将其初始厚度减小到中间厚度,以及等离子体蚀刻晶片的背面以将中间厚度减小到最终厚度 。 两步磨削/蚀刻工艺比传统的多步磨削/抛光工艺更快,更便宜,因为它需要更少的步骤,每个步骤都相对较快地完成,并且采用标准的研磨和蚀刻设备,而不是昂贵的专用设备 。

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