WAFER STORAGE CONTAINER
    1.
    发明公开

    公开(公告)号:US20240242992A1

    公开(公告)日:2024-07-18

    申请号:US18623772

    申请日:2024-04-01

    发明人: Bum Je WOO

    IPC分类号: H01L21/673

    摘要: A wafer storage container is connected to an external chamber and has a storage chamber in which wafers received through a front opening are accommodated. The wafer storage container includes a fume removal unit that injects a first gas into the storage chamber and exhausts the first gas, and an outside air blocking unit that injects a second gas from a left side of the front opening and exhausts the second gas from a right side of the front opening.

    Adjustable device and an adjustable storage box

    公开(公告)号:US11972962B2

    公开(公告)日:2024-04-30

    申请号:US17398685

    申请日:2021-08-10

    发明人: Shih Feng Pan

    IPC分类号: H01L21/673 H01L21/677

    摘要: The disclosure provides an adjustable device including plates and at least two adjustable modules connect with two adjacent of the plates. The adjustable module can stretch or shrink to change a distance between plates. The disclosure also provides an adjustable storage box including an upper cover and a lower cover. A storage space is formed by the upper cover and the lower cover and for the accommodating of the adjustable device. When the upper cover moves upward relative to the lower cover, the adjustable modules changes from a compression state to a stretch state and increase a distance between plates. Whereby, it is easy to pick and place object when a distance of two adjacent plates increases. The overall volume of the adjustable device is reduced when a distance of two adjacent plates decrease, thereby saving the working space.

    PURGE GAS SPRAYING PLATE AND FUME REMOVING APPARATUS HAVING THE SAME
    8.
    发明申请
    PURGE GAS SPRAYING PLATE AND FUME REMOVING APPARATUS HAVING THE SAME 审中-公开
    喷雾喷雾板和具有相同功能的FUME去除装置

    公开(公告)号:US20160268148A1

    公开(公告)日:2016-09-15

    申请号:US14725257

    申请日:2015-05-29

    申请人: Bum Je WOO

    发明人: Bum Je WOO

    IPC分类号: H01L21/67 H01L21/687

    摘要: Provided are a purge gas spraying plate and a fume removing apparatus, and more particularly, a purge gas spraying plate capable of spraying a purge gas, which sprays the purge gas along a curvature of a wafer and efficiently removes fumes remaining on the wafer because a concave portion is formed at one side thereof and a spraying hole and a support member configured to support the wafer are formed in the concave portion, and a fume removing apparatus having the same.

    摘要翻译: 提供了一种吹扫气体喷射板和烟雾去除装置,更具体地说,一种能够喷射吹扫气体的吹扫气体喷射板,其沿着晶片的曲率喷射吹扫气体,并有效地除去残留在晶片上的烟雾,因为 凹部形成在其一侧,并且在凹部中形成有用于支撑晶片的喷射孔和支撑构件,以及具有该凹部的除烟装置。

    WAFER LOADERS HAVING BUFFER ZONES
    10.
    发明申请
    WAFER LOADERS HAVING BUFFER ZONES 有权
    具有缓冲区的WAFER装载机

    公开(公告)号:US20150068948A1

    公开(公告)日:2015-03-12

    申请号:US14281880

    申请日:2014-05-19

    IPC分类号: H01L21/673

    摘要: Embodiments of the present inventive concepts provide a wafer loader having one or more buffer zones to prevent damage to a wafer loaded in the wafer loader. The wafer loader may include a plurality of loading sections that protrude from a main body and are configured to be arranged at various locations along an edge of the wafer. Each of the loading sections may include a groove into which the edge of the wafer may be inserted. The loading section may include first and second protrusions having first and second inner sides, respectively, that face each other to define the groove therebetween. At least one of the first and second inner sides may include a recess to define the buffer zone.

    摘要翻译: 本发明构思的实施例提供了具有一个或多个缓冲区的晶片装载器,以防止损坏装载在晶片装载器中的晶片。 晶片装载机可以包括从主体突出的多个装载部分,并被构造成沿着晶片的边缘布置在不同位置。 每个加载部分可以包括槽,其中可以插入晶片的边缘。 装载部分可以包括分别具有彼此面对以限定其间的凹槽的第一和第二内侧的第一和第二突起。 第一和第二内侧中的至少一个可以包括限定缓冲区的凹部。