Robotic device for substrate transfer applications
    1.
    发明授权
    Robotic device for substrate transfer applications 有权
    用于衬底转移应用的机器人装置

    公开(公告)号:US08936293B2

    公开(公告)日:2015-01-20

    申请号:US13333688

    申请日:2011-12-21

    CPC classification number: H01L21/67742 H01L21/68707

    Abstract: A device for use in the semiconductor industry includes a robotic arm whose end effector includes electromagnetic means to hold a substrate carrier. A pushing member can move independently of a flat, spatula-like portion of the device and is configured to exert force against the substrate carrier while the spatula-like portion is retracted from the substrate carrier, after the substrate carrier has been brought to its intended position. In this manner, the position of the substrate carrier is maintained at its intended position as the spatula-like portion is retracted.

    Abstract translation: 用于半导体工业的器件包括机器人臂,其末端执行器包括用于保持衬底载体的电磁装置。 推动构件可以独立于装置的平坦的刮铲状部分移动,并且构造成在基板载体已经达到其预期之后,当刮板状部分从基板载体缩回时,向基板载体施加力 位置。 以这种方式,当刮刀状部分缩回时,基板载体的位置保持在其预定位置。

    ROBOTIC DEVICE FOR SUBSTRATE TRANSFER APPLICATIONS
    4.
    发明申请
    ROBOTIC DEVICE FOR SUBSTRATE TRANSFER APPLICATIONS 有权
    用于基板传送应用的机器人设备

    公开(公告)号:US20130164113A1

    公开(公告)日:2013-06-27

    申请号:US13333688

    申请日:2011-12-21

    CPC classification number: H01L21/67742 H01L21/68707

    Abstract: A device for use in the semiconductor industry includes a robotic arm whose end effector includes electromagnetic means to hold a substrate carrier. A pushing member can move independently of a flat, spatula-like portion of the device and is configured to exert force against the substrate carrier while the spatula-like portion is retracted from the substrate carrier, after the substrate carrier has been brought to its intended position. In this manner, the position of the substrate carrier is maintained at its intended position as the spatula-like portion is retracted.

    Abstract translation: 用于半导体工业的器件包括机器人臂,其末端执行器包括用于保持衬底载体的电磁装置。 推动构件可以独立于装置的平坦的刮铲状部分移动,并且构造成在基板载体已经达到其预期之后,当刮板状部分从基板载体缩回时,向基板载体施加力 位置。 以这种方式,当刮刀状部分缩回时,基板载体的位置保持在其预定位置。

    MgO tunnel barriers and method of formation
    5.
    发明授权
    MgO tunnel barriers and method of formation 有权
    MgO隧道障碍及形成方法

    公开(公告)号:US08008097B2

    公开(公告)日:2011-08-30

    申请号:US12554420

    申请日:2009-09-04

    CPC classification number: H01L43/08 H01L43/10 H01L43/12

    Abstract: MgO tunnel barriers are formed by depositing a thin layer of Mg on a suitable underlayer, and then directing oxygen and additional Mg towards the Mg layer. The oxygen reacts with the additional Mg and the Mg in the Mg layer to form a MgO tunnel barrier that enjoys excellent tunneling characteristics. The MgO tunnel barriers so formed may be used in magnetic tunnel junctions having tunneling magnetoresistance (TMR) values of greater than 100%. The highest TMR values are observed for junctions that have been annealed and that have a (100) crystallographic orientation.

    Abstract translation: 通过在合适的底层上沉积薄层的Mg,然后将氧和附加的Mg导向Mg层,形成MgO隧道势垒。 氧与Mg层中的附加Mg和Mg反应形成具有优异隧道特性的MgO隧道势垒。 如此形成的MgO隧道势垒可用于具有大于100%的隧道磁阻(TMR)值的磁隧道结。 观察到已经退火并具有(100)晶体取向的结的最高TMR值。

    Magnetic tunnel barriers and associated magnetic tunnel junctions with high tunneling magnetoresistance
    8.
    发明授权
    Magnetic tunnel barriers and associated magnetic tunnel junctions with high tunneling magnetoresistance 有权
    磁隧道势垒和具有高隧道磁阻的相关磁隧道结

    公开(公告)号:US07906231B2

    公开(公告)日:2011-03-15

    申请号:US11931110

    申请日:2007-10-31

    Abstract: Magnetic tunneling devices are formed from a first body centered cubic (bcc) magnetic layer and a second bcc magnetic layer. At least one spacer layer of bcc material between these magnetic layers exchange couples the first and second bcc magnetic layers. A tunnel barrier in proximity with the second magnetic layer permits spin-polarized current to pass between the tunnel barrier and the second layer; the tunnel barrier may be either MgO and Mg—ZnO. The first magnetic layer, the spacer layer, the second magnetic layer, and the tunnel barrier are all preferably (100) oriented. The MgO and Mg—ZnO tunnel barriers are prepared by first depositing a metallic layer on the second magnetic layer (e.g., a Mg layer), thereby substantially reducing the oxygen content in this magnetic layer, which improves the performance of the tunnel barriers.

    Abstract translation: 磁隧道器件由第一体心立方(bcc)磁性层和第二bcc磁性层形成。 这些磁性层之间的至少一个bcc材料间隔层交换耦合第一和第二bcc磁性层。 靠近第二磁性层的隧道势垒允许自旋极化电流在隧道势垒和第二层之间通过; 隧道势垒可以是MgO和Mg-ZnO。 第一磁性层,间隔层,第二磁性层和隧道势垒都优选为(100)取向。 通过首先在第二磁性层(例如,Mg层)上沉积金属层来制备MgO和Mg-ZnO隧道势垒,从而大大降低该磁性层中的氧含量,这改善了隧道势垒的性能。

    MgO-based tunnel spin injectors
    10.
    发明授权
    MgO-based tunnel spin injectors 有权
    基于MgO的隧道旋转注射器

    公开(公告)号:US07534626B2

    公开(公告)日:2009-05-19

    申请号:US11835037

    申请日:2007-08-07

    CPC classification number: H01L29/66984 Y10S977/933

    Abstract: A MgO tunnel barrier is sandwiched between semiconductor material on one side and a ferri- and/or ferromagnetic material on the other side to form a spintronic element. The semiconductor material may include GaAs, for example. The spintronic element may be used as a spin injection device by injecting charge carriers from the magnetic material into the MgO tunnel barrier and then into the semiconductor. Similarly, the spintronic element may be used as a detector or analyzer of spin-polarized charge carriers by flowing charge carriers from the surface of the semiconducting layer through the MgO tunnel barrier and into the (ferri- or ferro-) magnetic material, which then acts as a detector. The MgO tunnel barrier is preferably formed by forming a Mg layer on an underlayer (e.g., a ferromagnetic layer), and then directing additional Mg, in the presence of oxygen, towards the underlayer.

    Abstract translation: MgO隧道势垒夹在一侧的半导体材料和另一侧的铁和/或铁磁材料之间以形成自旋电子元件。 半导体材料可以包括例如GaAs。 自旋电子元件可以通过将电荷载体从磁性材料注入到MgO隧道势垒中,然后进入半导体中而用作自旋注入装置。 类似地,自旋电子元件可以用作自旋极化电荷载流子的检测器或分析器,这是通过将载流子从半导体层的表面流过MgO隧道屏障并进入(铁或铁)磁性材料 作为检测器。 MgO隧道势垒优选通过在底层(例如铁磁性层)上形成Mg层,然后在氧的存在下将另外的Mg引向底层来形成。

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